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    • 32. 发明专利
    • METHOD FOR CONTROLLING EVAPORATION AMOUNT OF VACUUM EVAPORATOR
    • JPS62270771A
    • 1987-11-25
    • JP11271486
    • 1986-05-19
    • MITSUBISHI HEAVY IND LTDNISSHIN STEEL CO LTD
    • TAUCHI KUNIAKISEKIGUCHI YASUAKIOHASHI KYOSUKEHANADA TOSHIAKI
    • C23C14/26C23C14/24C23C14/54C23C14/56
    • PURPOSE:To control the evaporation amt. to an appropriate value with high responsiveness by controlling the change in the metal vapor deposition amt. in a vacuum deposition device with the shutter opening and heater power to rapidly change the shutter opening in accordance with the increase and decrease demands in the evaporation amt. CONSTITUTION:Band steel 7 is continuously conveyed by a rolling roller 11, the metal bath 1 of molten Zn, etc., in a metal path vessel 2 is heated by a heater 4, the obtained Zn vapor 3 is passed through a chamber 6, and the thin vapor-deposited film of Zn is formed on the surface of the band steel 7. When the vapor deposition amt. is increased, the heater power difference from the maximum heater power is obtained by an arithmetic unit 18, the difference is inputted to the opening adjusting device 15 for a shutter 8 to increase the opening of the shutter 8, the supply power to the heater 4 is simultaneously increased to increase the evaporation amt., and then the shutter opening is returned to the original value. When the vapor deposition amt. is decreased, the power of the heater 4 is reduced to a minimum to decrease the shutter opening, and then the shutter opening is returned to the original opening when the temp. of the metal bath 1 is lowered. Consequently, the metal vapor 3 is supplied on the surface of the band steel 7 in accordance with the change in the vapor deposition amt.