专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明专利

JPS60113138A PROBE FOR SOLID HIGH RESOLUTION NUCLEAR MAGNETIC RESONANCE APPARATUS 失效
公开(公告)号：JPS60113138A
公开(公告)日：1985-06-19
申请号：JP22063283
申请日：1983-11-25
申请人： HITACHI LTD
发明人： KOMIYAMA YUZURU , HANIYUU YOSHIAKI , EDAMURA TAKAO
IPC分类号： G01R33/3815 , G01R33/30 , G01R33/31 , G01R33/32
摘要： PURPOSE:To measure accurately a sample temp. by providing a temp. sensor capable of measuring temp. basing on an electric resistance variation between a rotor surface of a spinner packed with a solid sample and a stator surface opposing thereto. CONSTITUTION:A platinum film 22 as the temp. sensor is provided at a surface of a stator 6 opposing to a rotor 4, and lead wires 24 are connected to a notched part 23 at the center part. Several protuberances 21 are provided at the outer circumferential part of the stator 6, and the injury of the film 22 due to close adhesion of the rotor 4 and the stator 6 is prevented when the spinner is not revolved. Gas of a prescribed temp. is blown out from a gas blowing-out hole 7, and is filled between the rotor 4 and the stator 6. The electric resistance of the film 22 is measured under the state in which the thermal equilibrium is attained after 4-5min due to sufficiently small heat capacity of the spinner 2 itself, and the temp. of a solid sample in a sample packing part 5 is known.

32. 发明专利

JPS59230140A DEVICE FOR MEASURING DISTRIBUTION OF CHEMICAL SPECIES 失效
公开(公告)号：JPS59230140A
公开(公告)日：1984-12-24
申请号：JP10411783
申请日：1983-06-13
申请人： HITACHI LTD
发明人： OSADA HISAJIROU , EDAMURA TAKAO
IPC分类号： G01N21/64
摘要： PURPOSE:To measure directly and quickly the three-dimensional concn. distribution of the specific chemical species in plasma with high sensitivity by exciting resonantly the chemical species in the plasma by laser light and measuring spectrally the fluorescence thereof with a prescribed optical system. CONSTITUTION:Light 2 of the resonance wavelength of the specific chemical species in plasma of a device 1 utilizing plasma is emitted from a dye laser generating mechanism 3 and scans the plasma with a movable mirror 5 and a parabolic mirror 6 driven by a control mechanism 11. The flurescence generated from a measuring point 8 is condensed onto an optical fiber 17 provided to a scanning mechanism 6 for photodetection by a condenser lens 5 and is detected via a spectral mechanism 18 by a photoelectric converting mechanism 19. The output voltage thereof is fed to the mechanism 11. The mechanism 11 displays the information on the position of the point 8 together with said voltage value on a display mechanism 20. The three-dimensional concn. distribution of the specific chemical species in the plasma is thus directly and quickly measured with high sensitivity.

33. 发明专利

JPS586450A PLASMA MONITOR 失效
公开(公告)号：JPS586450A
公开(公告)日：1983-01-14
申请号：JP10436781
申请日：1981-07-06
申请人： HITACHI LTD
发明人： EDAMURA TAKAO , OSADA HISAJIROU
IPC分类号： G01N21/64 , G01N21/63 , H05H1/00
摘要： PURPOSE:To grasp a plasma state in high sensitivity and accuracy, by irradiating a laser beam to gas in the plasma state and detecting its exciting luminescence. CONSTITUTION:A wavelength variable laser generating apparatus 1 is provided on a fixing stand 23 movable in parallel to the surface of this paper. A laser beam 2 from the apparatus 1 is made incident to a plasma generating apparatus 3 and a gas 6 in a plasma state is excited by irradiation. Excited light is emitted linearly at the position corresponding to a laser beam passage 2 and this beam 7 is taken out from a window for photodetecting 5 and then, is turned into the narrow width beam 7 passing through a slit 8. This beam 7 is made incident to a rotating paraboloid mirror 12 and is reflected toward its focus and then, is focused on a slit of a spectroscope 14. The beam 7 made incident to the spectroscope 14 is separated into its spectral components and is detected by a photodetector 15.

34. 发明专利

JPS56150327A LIQUID HYDROMETER FOR PROCESS 失效
公开(公告)号：JPS56150327A
公开(公告)日：1981-11-20
申请号：JP5297880
申请日：1980-04-23
申请人： HITACHI LTD
发明人： EDAMURA TAKAO , WATANABE MASAHIRO , ODAJIMA KENJI
IPC分类号： G01N9/18 , G01N9/10
摘要： PURPOSE:To continuously measure the specific gravity of the liquid to be measured with high sensitivity and high responsiveness by connecting the bottom part of a vessel holding prescribed liquid level and the float floating in the vessel by means of a strain gage. CONSTITUTION:The liquid to be measured enters a measuring vessel 3 through an inflow pipe 1, is discharged from an outflow pipe 2, by which is level is maintained constant. A float 4 is connected to the strain gage 6 fixed to the bottom of the vessel 3 by means of a connecting cord 5. Constant voltage is applied to the gage 6 by a measuring and controlling part 8, and the output voltage by the resistance change of the gage 6 caused in correspondence to the buoyancy of the float 4 is amplified and arithmetically processed, whereby the specific gravity is displayed in a display part 9. Thereby, the specific gravity is continuously measured with high sensitivity and high responsiveness.

35. 发明专利

JPS5486367A SIO2 FILM THICKNESS MEASURING APPARATUS 失效
公开(公告)号：JPS5486367A
公开(公告)日：1979-07-09
申请号：JP15364777
申请日：1977-12-22
申请人： HITACHI LTD
发明人： EDAMURA TAKAO , WATANABE MASAHIRO , HIRATSUKA YUTAKA
IPC分类号： G01B15/02 , G01N23/225
摘要： PURPOSE:To enable the thickness of SiO2 thin films in minute regions to be rapidly and readily measured by making use of the changes in the intensity ratios of characteristic X-rays between SiKalpha3 and SiKalpha4 caused by the film thicknesses of the SiO2 films. CONSTITUTION:An electron ray 1 is converged by an electron lens 2 and is scanned over the surface of the sample 4 which is mounted on a sample holder 6 and is placed on a sample drive unit 5, by a deflecting coil 3. The SiKalpha3 spectrum out of the characteristic X-rays respectively radiated from the SiO2 thin film and Si underlayer are separated by spectral crystals 7, 8. At this time, the combinations of the crystal 8 and detector 10, the crystal 7 and detecror 11 are moved on the circumference of a Rowland circle 9 by interlocking mechanisms 14, 15, whereby the peak positions of the SiKalpha3 spectrum and SiKalpha4 spectrum are obtained. The intensities of both spectra are measured with the detectors 10, 11 and the results of measurement are inputted to an arithmetic circuit 12. The SiO2 film thickness is then displayed in a display circuit 13.

36. 发明专利

JPS5424079A VACUUM IMPACT TEST APPARATUS 失效
公开(公告)号：JPS5424079A
公开(公告)日：1979-02-23
申请号：JP8839477
申请日：1977-07-25
申请人： HITACHI LTD
发明人： EDAMURA TAKAO , WATANABE MASAHIRO
IPC分类号： G01N3/34
摘要： PURPOSE:To realize repeated impact tests without breaking the high degree of vacuum by placing a bob to give impact in the vacuum and putting the test apparatus outside thereof.

37. 发明专利

JPS52149193A METHOD OF AND APPARATUS FOR ANALYZING CATHODE LUMINESCENCE 失效
公开(公告)号：JPS52149193A
公开(公告)日：1977-12-12
申请号：JP6554676
申请日：1976-06-07
申请人： HITACHI LTD
发明人： OSADA HISAJIROU , HIRATSUKA YUTAKA , EDAMURA TAKAO
IPC分类号： G01N23/225
摘要： PURPOSE:To provide a method of and apparatus for analyzing cathode luminescence, according to which sample in the air is subjected to irradiation of electron beam from electron transmitting tube and light produced by the irradiation of electron beam is detected, whereby sensitivity can be improved with a simple structure.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式