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    • 31. 发明专利
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • JPS6358982A
    • 1988-03-14
    • JP20437286
    • 1986-08-29
    • FUJITSU LTD
    • TANAKA KAZUHIROKIHARA KATSUHIRO
    • H01S5/00H01S5/026H01S5/042
    • PURPOSE:To take out an interference light as a frequency variation monitor and facilitate keeping an oscillation frequency by a method wherein an optical waveguide which has a branching region in the middle to provide two light paths with different path lengths is coupled with a semiconductor laser device of a distributed feedback (DFB) type or a distributed reflection (DBR) type. CONSTITUTION:For instance, an N-type InP cladding layer 2 is formed by epitaxial growth on an N-type InP semiconductor substrate 1 and then an InGaAsP guide layer 4 and an InGaAsP active layer 5 are successively grown. The semiconductor substrate of a zone B is selectively etched as deep as the InP cladding layer 2 and an InGaAsP guide layer 8 is grown and further an N-type InP cladding layer 9 is grown on it. In the zone B where the guide layer 8 is grown, an optical waveguide 11a which starts from a DFB laser device 10 and reaches a photodetector 12a with two-way branching part in the middle and an optical waveguide 11b which starts from the DFB laser device 10 and reaches a photodetector 11b are provided. A required light output is taken out from the end surface of the laser device 10 side and, in addition to taking out a light intensity monitor output from the optical waveguide 11b, an interference light produced by the light path length difference is taken out from the optical waveguide 11a as a frequency variation monitor.
    • 32. 发明专利
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • JPS62199086A
    • 1987-09-02
    • JP4240586
    • 1986-02-26
    • FUJITSU LTD
    • TANAKA KAZUHIRO
    • H01S5/00
    • PURPOSE:To output highly efficient high-power laser light, by forming a lightguide having one output end, which is coupled with an active layer with light, at the side surface of said active layer, thereby providing a laser structure. CONSTITUTION:On the entire surface of an n-InP substrate 8, an n-InP clad layer 9, a non-doped InGaAsP layer 10, a p-InP clad layer 12, and a p -InGaAsP contact layer 13 are epitaxially grown. Then, an SiO2 film 18 and the like are laminated as etching masks. Patterning is performed by an ordinary lithography method. The active layer and a lightguide layer 11 are made to remain in a mesa shape and the other parts thereof are etched away until reaching the n-InP layer 9. Then the mesa parts are embedded as high resistance layers 14 by using a non-doped InP layer or Fe doped InP layer. The SiO2 film 18 is once removed, and an insulating SiO2 film 15 is newly laminated. a window is opened at a laser active region part. An (n) electrode 16 and a (p) electrode 17 are formed. Thus the highly efficient, high power laser is obtained, and the required monitoring light can be secured.
    • 35. 发明专利
    • SEMICONDUCTOR LASER CONTROL METHOD AND DEVICE THEREOF
    • JPH08111554A
    • 1996-04-30
    • JP24321194
    • 1994-10-06
    • FUJITSU LTD
    • TANAKA KAZUHIRO
    • H01S5/042H01S5/068H01S3/096
    • PURPOSE: To obtain a current value approximate to a threshold value as much as possible even when the threshold value made a change by a method wherein the detected differential resistance value and the prescribed reference resistance value, which is set in advance, are compared based on the comparison signal, and a bias current is controlled in such a manner that the differential resistance value and the reference resistance value are made equal. CONSTITUTION: In a bias current controlling process, a bias current is controlled by a bias current controller 6 in such a manner that a differential resistance value Rd becomes equal to the reference value RF based on a comparison resistance value. Accordingly, the bias current is controlled in such a manner that the differential resistance value Rd is brought close to the value corresponding to its line of discontinuity or to the higher value of the value corresponding to its line of discontinuity. Consequently, the bias current becomes equal to the threshold value of a semiconductor laser 1 which makes a change corresponding to the change of operational environment, or becomes a value lower than the threshold current becomes the value corresponding to the oscillation delay time of the semiconductor layer 1 which is allowed in design.
    • 39. 发明专利
    • SEMICONDUCTOR LASER DEVICE
    • JPH06152046A
    • 1994-05-31
    • JP29407492
    • 1992-11-02
    • FUJITSU LTD
    • TANAKA KAZUHIRO
    • H01S5/00H01S3/18
    • PURPOSE:To reduce a threshold current by returning natural emission light projected wastefully to an active layer by simply changing a structure of a semiconductor laser device. CONSTITUTION:The title device is provided with a repetitive laminated multilayer film 23 composed of a combination of two kinds of semiconductor films having different refractive indexes inserted between a substrate 21 and an active layer 25 such as a combination of an InGaAsP film and an InP film and a p-side electrode 32 which covers a side of a mesa formed to cross at least the repetitive laminated multilayer film 23 from a front side through an insulating film 31 and functions as an optical reflection film consisting of a metal covering a top. An optical length of approximately 1/4 a wavelength at a short wavelength side of a laser oscillation wavelength is selected for the repetitive laminated multilayer film 23 and it functions as a high optical reflection film.