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    • 31. 发明专利
    • Exposure method and apparatus
    • 曝光方法和装置
    • JP2006227148A
    • 2006-08-31
    • JP2005038777
    • 2005-02-16
    • Fuji Photo Film Co Ltd富士写真フイルム株式会社
    • NAKATANI DAISUKE
    • G03F7/20B41J2/445
    • PROBLEM TO BE SOLVED: To improve a work efficiency by shortening a period of time for detecting and controlling the light quantity of light exiting from each exposure head in an exposure method carried out by relatively moving a plurality of exposure heads in a predetermined scanning direction with respect to an exposure face, each exposure head imaging the incident light onto the exposure face through an optical system for exposure. SOLUTION: Each exposure head 30 is provided with a light quantity detecting means 40 which detects the quantity of light exiting from the exposure head 30, and the quantity of light exiting from each exposure head 30 is almost simultaneously detected by the light quantity detecting means 40. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:通过缩短用于检测和控制从每个曝光头出射的光的光量的时间段来提高工作效率,所述曝光方法是通过以预定的方式相对移动多个曝光头而进行的曝光方法 相对于曝光面的扫描方向,每个曝光头通过用于曝光的光学系统将入射光成像到曝光面上。

      解决方案:每个曝光头30设置有光量检测装置40,其检测从曝光头30出射的光量,并且从每个曝光头30射出的光量几乎同时被光量检测 检测手段40.版权所有(C)2006,JPO&NCIPI

    • 32. 发明专利
    • Drawing apparatus and control method of same
    • 绘图装置及其控制方法
    • JP2006093294A
    • 2006-04-06
    • JP2004275118
    • 2004-09-22
    • Fuji Photo Film Co Ltd富士写真フイルム株式会社
    • NAKATANI DAISUKE
    • H01L21/027
    • PROBLEM TO BE SOLVED: To shorten the time taken for drawing by decreasing a line interval of exposure heads, and suppress a component cost by making how to mount onto an apparatus body same for all the exposure heads in the drawing apparatus where the exposure heads are arranged over a plurality of lines. SOLUTION: The exposure heads 30 21 to 30 25 in the second line are mounted in a direction where the exposure heads 30 11 to 30 15 in the first line have been turned 180°, and the exposure heads 30 11 to 30 15 in the first line and the exposure heads 30 21 to 30 25 in the second line are disposed in close vicinity to each other to the utmost. When a control signal input into a spatial light modulation element in the second line exposure heads is generated, image data are read in the order different from that when a control signal is generated into a spatial light modulation element of the first line exposure head, and a control signal is generated according to the direction of a spatial light modulation element. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:通过减少曝光头的间隔来缩短绘制所花费的时间,并且通过如下方式来限制部件成本:通过如何将装置主体安装到与图像装置中的所有曝光头相同的装置主体上, 曝光头布置在多条线上。

      解决方案:第二行中的曝光头30 21 30 25 沿曝光头30 <11>的方向安装到 第一行中的30 15 已经转动180°,第一行中的曝光头30 30 15 和曝光头 第二行中的30 21 至30 25 最大程度地彼此靠近地布置。 当产生输入到第二行曝光头中的空间光调制元件的控制信号时,以与第一行曝光头的空间光调制元件生成控制信号时不同的顺序读取图像数据, 根据空间光调制元件的方向产生控制信号。 版权所有(C)2006,JPO&NCIPI

    • 34. 发明专利
    • Pattern production system, exposure system, and exposure method
    • 图案生产系统,曝光系统和曝光方法
    • JP2005099739A
    • 2005-04-14
    • JP2004218641
    • 2004-07-27
    • Fuji Photo Film Co Ltd富士写真フイルム株式会社
    • MORITA KIYOTERUNAKATANI DAISUKESAWANO MITSURUSUGANUMA ATSUSHI
    • G03F7/20H01L21/027H05K3/06
    • PROBLEM TO BE SOLVED: To realize precise finishing by forming a pattern by adjusting variance in finishing of the width of a pattern line due to deterioration of an etchant etc. SOLUTION: In a pattern production system, resist coated on copper foil on the substrate is exposed to light, by direct drawing, on the basis of a width of a line forming a pattern and an exposure quantity designated by pattern data 100 for processing, the exposed resist is developed to form a resist pattern, and the copper foil is etched to form an etched pattern. An image of the etched pattern is scanned and image information 200 is obtained. The width of the line forming the pattern represented by the image information 200 and the width of the line forming the pattern of the target etched pattern are compared, and the width of the line forming the pattern designated by the pattern data 100 for processing is adjusted on the basis of the result of the comparison. The resist is exposed to light, by direct drawing, with the adjusted line width. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:通过由于蚀刻剂等的劣化调整图案线的宽度的整理的方差来形成图案来实现精确的精加工。解决方案:在图案生产系统中,涂覆有抗蚀剂的抗蚀剂 基板上的铜箔通过直接拉制,基于形成图案的线的宽度和由用于加工的图案数据100指定的曝光量,曝光的抗蚀剂被显影以形成抗蚀剂图案,并且 铜箔被蚀刻以形成蚀刻图案。 扫描蚀刻图案的图像并获得图像信息200。 比较形成由图像信息200表示的图案的线的宽度和形成目标蚀刻图案的图案的线的宽度,并且调整形成由用于处理的图案数据100指定的图案的线的宽度 在比较结果的基础上。 抗蚀剂通过直接拉制曝光,具有调整的线宽。 版权所有(C)2005,JPO&NCIPI
    • 35. 发明专利
    • Display
    • 显示
    • JP2005091000A
    • 2005-04-07
    • JP2003321220
    • 2003-09-12
    • Fuji Photo Film Co Ltd富士写真フイルム株式会社
    • SHIMIZU ATSUKONAKATANI DAISUKE
    • G01J1/42G01J1/00H01S5/0687
    • PROBLEM TO BE SOLVED: To suppress uneven exposure of photo-sensing material caused by the difference of wave length among a plurality of lights for sensing material for exposure by a light quantity control method and the device.
      SOLUTION: The relation between the output value outputted from a light receiving part 20 when the light receiving part 20 received a light associated with light quantity and wave length leading to a predetermined specific certain exposure level of the sensing material 1, and the wave length is stored in an output wave length memory 40. Also, corresponding relation between the wave length of laser light emitted out of laser light irradiation parts 10A, 10B, ... and each laser light irradiation part 10A, 10B, ... is stored in a light source wave length memory 45. A light quantity controller 30 controls the light quantity of each laser light so that each output value output from the light receiving part 20 individually receiving with the light receiving part 20, each laser light emitted out of each laser light irradiation part 10A, 10B, ... by referring to the output wave length memory 40 and the light source wave length memory 45 fulfills the relation between the output value and the wave length.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:通过光量控制方法和装置来抑制由用于曝光的感测材料的多个光之间的波长差异引起的感光材料的不均匀曝光。 解决方案:当光接收部分20接收到与光量相关的光和导致感测材料1的预定特定曝光水平的波长之间从光接收部分20输出的输出值之间的关系,以及 波长存储在输出波长存储器40中。另外,从激光照射部10A,10B,...发射的激光的波长与各激光照射部10A,10B,...之间的对应关系 存储在光源波长存储器45中。光量控制器30控制每个激光的光量,使得从受光部20输出的各个输出值与光接收部20分别接收,每个激光射出 通过参照输出波长存储器40和光源波长存储器45的每个激光照射部分10A,10B,...满足输出值和 波长。 版权所有(C)2005,JPO&NCIPI
    • 36. 发明专利
    • Image recording method and image recording apparatus
    • 图像记录方法和图像记录装置
    • JP2005022248A
    • 2005-01-27
    • JP2003190433
    • 2003-07-02
    • Fuji Photo Film Co Ltd富士写真フイルム株式会社
    • UEMURA TAKAYUKINAKATANI DAISUKEFUJII TAKESHI
    • B41J2/44B41J2/45B41J2/455G02B26/08H04N1/23
    • PROBLEM TO BE SOLVED: To enhance image quality without making shading remain in energy distribution on a recording medium, even if the shading occurs in energy imparted to the recording medium, in a recording head which is equipped with two-dimensionally arranged recording elements. SOLUTION: When one pixel is expressed by a plurality of dots, in addition to density correction based on a relative positional relationship with a peripheral pixel, data on the respective dots, which serve as final output data, are generated by means of thresholds different depending on a direction crossing a scanning direction, in accordance with information on the shading caused by an optical system and the like. Thus, an image faithful to inputted image data can be recorded. Particularly, when the recording head 162 is constituted by arranging a plurality of recording element units 166, periodical streak-like unevenness in density, which ranges in a direction orthogonal to the scanning direction, can be prevented from being caused by the shading. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提高图像质量而不会在记录介质上的能量分布中保持阴影,即使在施加到记录介质的能量中产生阴影,在配备有二维布置记录的记录头 元素。 解决方案:当通过多个点表示一个像素时,除了基于与周边像素的相对位置关系的浓度校正之外,还可以通过以下方式生成用作最终输出数据的各个点上的数据 根据由光学系统等引起的阴影的信息,根据与扫描方向交叉的方向不同的阈值。 因此,可以记录忠实于输入的图像数据的图像。 特别地,当通过布置多个记录元件单元166来构成记录头162时,可以防止由于阴影引起的与扫描方向正交的方向上的周期性条纹状的密度不均匀性。 版权所有(C)2005,JPO&NCIPI