专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明专利

JP2005159294A Method of treating substrate and chemical used therefor 审中-公开
标题翻译：处理基材及其所用化学品的方法
公开(公告)号：JP2005159294A
公开(公告)日：2005-06-16
申请号：JP2004230717
申请日：2004-08-06
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： KIDO SHUSAKU
IPC分类号： G02F1/1333 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , H01L21/312 , H01L21/32 , H01L51/40
CPC分类号： G03F7/425 , G02F1/1303 , H01L21/0273 , H01L21/32139
摘要： PROBLEM TO BE SOLVED: To provide a method of treating substrate by which a process of working an organic film pattern into a new pattern form can be performed smoothly by performing second developing treatment. SOLUTION: In the method of treating substrate, pretreatment performed for removing a damaged layer formed on the surface of the organic film pattern and the second developing treatment performed for contracting at least part of the organic film pattern or removing part of the pattern are performed in this order. Since the developing treatment is performed after the damaged layer is removed by the pretreatment, the second developing treatment can be performed smoothly and highly uniformly. Therefore, the working of a base film into a pattern performed after the developing treatment can be performed highly uniformly. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种处理基板的方法，通过该方法可以通过进行第二显影处理平滑地执行将有机膜图案加工成新图案形式的工艺。解决方案：在处理基板的方法中，进行用于除去形成在有机膜图案的表面上的损伤层的预处理和用于收缩至少部分有机膜图案或去除图案的一部分的第二显影处理按此顺序执行。由于在通过预处理去除损伤层之后进行显影处理，所以可以平滑且高度均匀地进行第二显影处理。因此，可以高度均匀地进行基膜的显影处理后进行的图案的加工。版权所有（C）2005，JPO＆NCIPI

32. 发明专利

JP2004258091A Method for manufacturing liquid crystal display device 有权
公开(公告)号：JP2004258091A
公开(公告)日：2004-09-16
申请号：JP2003045739
申请日：2003-02-24
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： JINNO TAKASHI
IPC分类号： G02F1/13 , G02F1/1341
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display device which uses a mask to prevent scattering of a liquid crystal in evacuating substrates with the liquid crystal material applied thereto in a defoaming step of the liquid crystal material in a laminating method via liquid crystal dropping.
SOLUTION: The liquid crystal display device is manufactured by a step to place and hold the substrate with the liquid crystal material held inside a sealant on a supporting plate in a chamber, a step to place and hold the mask to prevent scattering of the liquid crystal with a ring shaped side wall on the substrate by a member conveying mechanism so as to cover an inner side face and a top face of the sealant, a step to defoam the liquid crystal material by evacuating the inside of the chamber, a step to remove the mask to prevent scattering of the liquid crystal from the substrate by the member conveying mechanism, a step to dispose another substrate on the sealant of the substrate so as to be opposite to the substrate by the member conveying mechanism and a step to stick the another substrate and the substrate to each other by releasing the inside of the chamber into the atmosphere.
COPYRIGHT: (C)2004,JPO&NCIPI

33. 发明专利

JP2004241395A Method of patterning multilayer film and multilayer wiring electrode 有权
公开(公告)号：JP2004241395A
公开(公告)日：2004-08-26
申请号：JP2002375607
申请日：2002-12-25
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： KATO TAKESHI , KIDO SHUSAKU , MAEDA AKIYOSHI
IPC分类号： G02F1/1343 , G02F1/1362 , H01L21/28 , H01L21/3205 , H01L21/3213 , H01L21/336 , H01L21/768 , H01L21/77 , H01L21/84 , H01L23/52 , H01L23/532 , H01L27/12 , H01L29/786
CPC分类号： G02F1/136286 , G02F2001/136295 , H01L27/12 , H01L27/124
摘要： PROBLEM TO BE SOLVED: To avoid an etching obstruction of a Cr film and stripping of photoresist due to too much etching time when a multilayer Al/Cr film is patterned. SOLUTION: A Cr film 2 is deposited on a glass substrate 1 and subjected to O2 plasma processing thus forming a thin oxide film layer 3 on the surface of the Cr film 2. An Al film 4 is then deposited and photoresist 5 is patterned. Subsequently, The Al film 4 is wet etched using the resist 5 as a mask. The taper shape is realized by setting the composition ratio of a mixed acid etching liquid of phosphoric acid, nitric acid, and acetic acid such that the sum of concentration of nitric acid and acetic acid is not smaller than 16 wt%. The photoresist is stripped and removed prior to Cr wet etching and the oxide film layer 3 and the Cr film 2 are wet-etched using the Al film 4. COPYRIGHT: (C)2004,JPO&NCIPI

34. 发明专利

JP2004198950A Optical film fitting apparatus and optical film fitting method using it 有权
标题翻译：光学贴膜装置和使用它的光学胶片贴装方法
公开(公告)号：JP2004198950A
公开(公告)日：2004-07-15
申请号：JP2002370132
申请日：2002-12-20
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： TAKAHASHI ATSUSHI
IPC分类号： G02B5/30 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a polarizing film fitting apparatus which realizes satisfactory operation efficiency and a high fitting level and produces no waste, and to provide a polarizing film fitting method using it. SOLUTION: The optical film fitting apparatus which fits polarizing films 2, 12 to a liquid crystal panel 6 uses the polarizing films 2, 12 having adhesive surfaces developing adhesive force by heating. A temporary fitting unit 60 has a function of temporarily tacking the polarizing films 2, 12 to the liquid crystal panel 6 for every one panel. A main fitting unit 50 presses/heats a plurality of panels, sticks the polarizing films 2, 12 and deaerates the panels concurrently. Since there is no separator on the adhesive surface of the polarizing film, the failure of glue lacking in the circumference occurring on the stripping of the separator is prevented and, at the same time, generation of a large amount of industrial waste including tapes for separator stripping and the separators is avoided. In addition, the deaeration between the adhesive surface and the liquid crystal panel which has been performed by using an autoclave hitherto can be performed concurrently with the sticking in the main fitting unit. COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供一种实现令人满意的操作效率和高配合水平并且不产生浪费的偏光膜装配装置，并提供使用它的偏光膜配合方法。解决方案：将偏振膜2,12配合到液晶面板6的光学膜装配装置使用具有通过加热而发生粘合力的粘合剂表面的偏振膜2,12。临时装配单元60具有将每个面板的偏振膜2,12临时固定到液晶面板6的功能。主配件单元50按压/加热多个面板，粘贴偏振膜2,12并同时对面板进行脱气。由于在偏光膜的粘合剂表面上没有隔板，因此防止了在隔膜剥离时发生的周边胶水的失效，同时产生大量工业废弃物，包括用于隔膜的带剥离和避免分离器。此外，通过使用高压釜进行的粘合剂表面和液晶面板之间的脱气可以与主配件单元中的粘着同时进行。版权所有（C）2004，JPO＆NCIPI

35. 发明专利

JP2004191500A Liquid crystal display device 审中-公开
标题翻译：液晶显示装置
公开(公告)号：JP2004191500A
公开(公告)日：2004-07-08
申请号：JP2002357052
申请日：2002-12-09
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： YAMAMOTO YUJI
IPC分类号： G02F1/1333 , G02F1/1335
CPC分类号： G02F1/133555 , G02F1/133504
摘要： PROBLEM TO BE SOLVED: To avoid contact between a reflection film composed of Al and a pixel electrode composed of ITO in a reflective or transflective liquid crystal display device with the reflection film composed of aluminum. SOLUTION: A second insulating film 210 as an interlayer insulating film perfectly coats Al constructing the reflection film 209. The pixel electrode 211 is formed on the second insulating film 210. COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：为了避免由反射膜或透反射型液晶显示装置中的由Al组成的反射膜和由ITO构成的像素电极与由铝构成的反射膜接触。解决方案：作为层间绝缘膜的第二绝缘膜210完美地涂覆构成反射膜209的Al。像素电极211形成在第二绝缘膜210上。（C）2004，JPO和NCIPI

36. 发明专利

JP2004127805A Cooling method for plasma display panel in aging and cooling device used for the plasma display panel 审中-公开
公开(公告)号：JP2004127805A
公开(公告)日：2004-04-22
申请号：JP2002292251
申请日：2002-10-04
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： KARIYA KOICHI
IPC分类号： H01J9/44 , H01J11/20 , H01J11/44 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a cooling method and a cooling device for a plasma display panel 20 in aging, which enable an operator to age the plasma display panel 20 without causing cracks in its panel surface.
SOLUTION: A blower 2 is disposed below the plasma display panel 20, and it is moved in parallel with a rear plane of the plasma display panel 20. A partial temperature rise in the plasma display panel is suppressed by blowing uniformly the rear plane of the plasma display panel with air sent by a motor 4 from the blower 2 which is moved in reciprocating directions.
COPYRIGHT: (C)2004,JPO

37. 发明专利

JP2004077955A Liquid crystal display device 审中-公开
公开(公告)号：JP2004077955A
公开(公告)日：2004-03-11
申请号：JP2002240174
申请日：2002-08-21
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： FUKUWAKI TAKEHIRO
IPC分类号： G02F1/1333 , G02F1/13 , G06F1/16
CPC分类号： G02F1/133308 , G02F2001/13332 , G02F2001/133325 , G02F2201/465 , G06F1/1601 , G06F2200/1612
摘要： PROBLEM TO BE SOLVED: To reduce operations in a complicated semi-product state and to improve productivity of assemblage, in a liquid crystal display device. SOLUTION: In the liquid crystal display device, constituent members are loaded on a base plate 100, the base plate 100 and the constituent members are slid and inserted into the inner part of a casing 800 from an aperture part of the side surface of the casing 800 and the aperture part of the side surface of the casing 800 is closed up by using a part of the casing 800. COPYRIGHT: (C)2004,JPO

38. 发明专利

JP2004070196A Substrate for liquid crystal display, its manufacturing method, and liquid crystal display 审中-公开
公开(公告)号：JP2004070196A
公开(公告)日：2004-03-04
申请号：JP2002232542
申请日：2002-08-09
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： ISHINO TAKAYUKI
IPC分类号： G02F1/1333 , G02F1/1335 , G02F1/1343 , G02F1/1362 , G02F1/1368 , H01L21/336 , H01L29/786
CPC分类号： G02F1/136227 , G02F2001/136222
摘要： PROBLEM TO BE SOLVED: To improve display quality of a liquid crystal display by suppressing level difference in the contact part between a source electrode and a pixel electrode to improve flatness of the outermost surface and reducing the area of the contact part. SOLUTION: A protruding pattern 115 is formed as protruding to near the outermost surface 121 on a TFT array substrate 100 in each pixel on a transparent substrate 101 so as to raise the source electrode 107 of the TFT 120 to near the outermost surface 121. A flattening film (a color filter 109 and a transparent organic interlayer insulating film 111) making the outermost surface 121 are formed to cover the TFT 120 as well as to make the outermost surface 121 in almost equal height to the top face of the protruding pattern 115. The pixel electrode 112 is connected to the source electrode 107 at the top of the protruding pattern 115 through a contact hole 105. COPYRIGHT: (C)2004,JPO

39. 发明专利

JP2004047258A Color plasma display panel 有权
公开(公告)号：JP2004047258A
公开(公告)日：2004-02-12
申请号：JP2002202619
申请日：2002-07-11
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： KURODA TOMOYOSHI
IPC分类号： H01J11/22 , H01J11/34 , H01J11/36 , H01J11/38 , H01J11/42 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a color plasma display panel capable of suppressing discharge failure by limiting interfacial polarization of forming materials in a discharge cell space.
SOLUTION: A front face side dielectric layer 13 including a transparent electrode and a bus electrode is formed on a front face board 11. A back face side dielectric layer 15 including an address electrode is on a back face board 12 and barrier ribs 16 and phosphor layers 17R, 17G and 17B are formed on the back face side dielectric layer 15. The front face side dielectric layer 13, the back face side dielectric layer 15, the barrier ribs 16 and phosphor layers 17R, 17G and 17B for forming a discharge cell has an equal dielectric constant. Hence, even if a structure 22a fallen apart from a chipped part 23a attaches to a surface of the front face side dielectric layer 13 or a structure 22b fallen apart from a chipped part 23b attaches to the phosphor layer 17, unnecessary charges are not generated as these has the equal dielectric constant and thus erroneous discharge can be prevented from generating.
COPYRIGHT: (C)2004,JPO

40. 发明专利

JP2004046114A Method for forming color layer, and color filter obtained by the method 审中-公开
公开(公告)号：JP2004046114A
公开(公告)日：2004-02-12
申请号：JP2003134346
申请日：2003-05-13
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： ISHINO TAKAYUKI
IPC分类号： G03F7/004 , G02B5/20 , G03F7/40
摘要： PROBLEM TO BE SOLVED: To provide a color layer forming method which can drastically shorten a manufacturing time and is high in productivity.
SOLUTION: Repeated are a resist coating process of coating a washed substrate with respective coloring resists, a pressure-reduced drying and temporary baking process of volatizing solvents that the resists contain, an exposing process of printing a pattern, a developing process of developing the printed pattern, and a photosetting and temporary postbaking process of setting a resist surface part with light and heat up to a level where a coloring resist pattern having been developed has no defect in a resist coating process and a developing process which are carried out later. In the final coloring resist formation, a primary baking process of setting all coloring resist patterns having been developed together at a time is carried out instead of the photosetting and temporary postbaking process.
COPYRIGHT: (C)2004,JPO

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式