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21. 发明专利

JP2001055487A ENCAPSULANT FOR FLIP CHIP TYPE SEMICONDUCTOR DEVICE AND FLIP CHIP TYPE SEMICONDUCTOR DEVICE 失效
公开(公告)号：JP2001055487A
公开(公告)日：2001-02-27
申请号：JP2000165448
申请日：2000-06-02
申请人： SHINETSU CHEMICAL CO
发明人： SUMIDA KAZUMASA , KUMAGAI KIMITAKA , WAKAO MIYUKI , SHIOBARA TOSHIO
IPC分类号： C08L63/00 , C08G59/14 , C08G77/62 , C08K3/00 , C08K9/06 , H01L23/29 , H01L23/31
摘要： PROBLEM TO BE SOLVED: To obtain the subject encapsulant material of high reliability by compounding a liquid epoxy resin, a curing agent, a specific copolymer and specific two kinds of fillers. SOLUTION: The objective encapsulant comprises (A) 100 pts.wt. of a liquid epoxy resin, (B) 0-80 pts.wt. of the curing agent, (C) 1-15 pts.wt. per 100 pts.wt. of the total of the component A and the component B, of a copolymer obtained from an organopolysiloxane of formula I [R is a (substituted) monovalent hydrocarbon group; a is 0.005-0.2; b is 1.8-2.2 where 1.805 =4 m2/g, and is surface-treated with an amino silane or an organosilazene represented by formula II or formula III (R1 is vinyl, phenyl or the like, R2 is H or R1; m is 0-4) where the total of the components D and E is 100-400 pts.wt. per 100 pts.wt. of the total of the components A through C.

22. 发明专利

JP2001011188A AROMATIC SILICON-CONTAINING POLYMER AND ITS PRODUCTION 失效
公开(公告)号：JP2001011188A
公开(公告)日：2001-01-16
申请号：JP18476399
申请日：1999-06-30
申请人： DOW CORNING TORAY SILICONE
发明人： MASATOMI TORU , KOBAYASHI HIDEKI
IPC分类号： H01B3/46 , C08G77/52 , C08G77/54 , C08G77/62 , C08L83/14
摘要： PROBLEM TO BE SOLVED: To obtain the subject polymer having charge transport properties, and useful in uses associated with antistaticity, as a photosensitive sensor, or the like, by including a specific main chain having an aromatic amino group, or the like, and bringing the weight-average molecular weight to a specific value or lower. SOLUTION: This polymer is obtained by including a main chain of formula I [A is a bivalent organic group of formula II, III, or the like; R3 and R4 are each a (substituted) bivalent hydrocarbon, R5 is a (substituted) monovalent hydrocarbon, R6 is a (substituted) trivalent hydrocarbon, and at least one of the Rs is a group having an aromatic hydrocarbon ring and also there exists a total of >=3 aromatic 6 membered-rings in the group A; B is a 2-6C alkylene; R1 is a (halogen-substituted) 1-10C monovalent hydrocarbon with no aliphatic unsaturated bond; R2 is an (alkoxy-substituted) 2-10C bivalent hydrocarbon or the like; (x)is >=1; (y) and (z) are each >=0 and (y+z) is >=2] and bringing the weight-average molecular weight to

23. 发明专利

JP3042537B2 失效
公开(公告)号：JP3042537B2
公开(公告)日：2000-05-15
申请号：JP17136990
申请日：1990-06-30
IPC分类号： C08G77/62 , C08G77/48

24. 发明专利

JPH1160736A AMINE RESIDUE-CONTAINING POLYSILAZANE AND ITS PRODUCTION 失效
公开(公告)号：JPH1160736A
公开(公告)日：1999-03-05
申请号：JP22742097
申请日：1997-08-08
申请人： TONEN CORP
发明人： SHIMIZU YASUO , AOKI TOMOKO , FUNAYAMA TORU
IPC分类号： C08G77/54 , C08G77/62
摘要： PROBLEM TO BE SOLVED: To produce the subject polymer capable of being baked at low temperatures under a low steam partial pressure and forming a high-density silica thin film by baking and useful as an interlayer insulating film of semiconductors by including a specific silazane structure in a molecular chain and restricting the molecular weight within a specified range. SOLUTION: This amine residue-containing polysilazane has 100-100,000 number-average molecular weight and contains a structure represented by formula I [R and R are each H, a hydrocarbon group or a hydrocarbon group- containing silyl; A is a bivalent hydrocarbon group; B is (B1 ) an N-hydrocarbon group-substituted amine residue or (B2 ) a cyclic amine residue; (p) is 1 when B is B1 and 0 or 1 when B is B2 ] or formula II [B is (B 1 ) a bivalent chain amine residue or (B 2) a bivalent cyclic amine residue; (p) and (q) are each 1 when B is B 1 and 0 or 1 when B is B 2 ] in the molecular chain. The polymer is obtained by reacting a polysilazane containing a structure represented by formula III (R is R and at least one of R and R is H) with a compound represented by formula IV or V in an inert organic solvent without any active hydrogen.

25. 发明专利

JPH10508637A 失效
公开(公告)号：JPH10508637A
公开(公告)日：1998-08-25
申请号：JP51551196
申请日：1995-11-07
IPC分类号： B05D7/24 , C03C17/00 , C03C17/22 , C03C25/42 , C04B41/45 , C04B41/49 , C04B41/50 , C04B41/81 , C04B41/84 , C04B41/85 , C04B41/87 , C08G77/62 , C09D7/12 , C09D183/16 , C09D201/02

26. 发明专利

JP2754224B2 失效
公开(公告)号：JP2754224B2
公开(公告)日：1998-05-20
申请号：JP32223288
申请日：1988-12-22
申请人： HEKISUTO AG
发明人： CHIRO BAASU , HANSUUIERUKU KURAINERU , MARUSERUSU HOITSUKERUTO , MARUTEIN BURYUTSUKU
IPC分类号： C04B35/58 , C04B35/589 , C08G77/48 , C08G77/60 , C08G77/62 , D01F9/10

27. 发明专利

JP2749883B2 失效
公开(公告)号：JP2749883B2
公开(公告)日：1998-05-13
申请号：JP18485389
申请日：1989-07-19
申请人： HEKISUTO AG
发明人： TOOMASU GERUDAU , HANSUUIERUKU KURAINERU , MARUCHIN BURYUTSUKU , MARUTSUERUSU HOIKERUTO , FURITSUTSU ARUDEINGERU
IPC分类号： C01B21/068 , C04B35/58 , C04B35/589 , C08G77/48 , C08G77/62 , C08L83/16 , D01F9/10
摘要： The invention relates to a process for the production of ceramic material containing silicon nitride, such as fibers, coatings or moldings. In this process, polymeric hydridochlorosilazanes are rendered infusible at a temperature below their softening point by treatment with gaseous NH3 and are then pyrolyzed in an atmosphere containing NH3 at 700 DEG to 1500 DEG C. Fibers, coatings or moldings containing silicon nitride are produced by first producing appropriate structures from a melt of the polymeric hydridochlorosilazane and then rendering them infusible and pyrolyzing them.

28. 发明专利

JP2728843B2 失效
公开(公告)号：JP2728843B2
公开(公告)日：1998-03-18
申请号：JP15357393
申请日：1993-06-24
申请人： MATSUSHITA DENKI SANGYO KK
发明人： NAKAJIMA KEIZO , SONODA NOBUO , TANAKA KAZUYOSHI , YAMABE TOKIO
IPC分类号： C08G77/62 , C08G12/06 , C08G61/12 , C08G73/06 , C08G77/48 , C08G77/60 , C08L61/20 , C08L65/00 , C08L79/04 , C08L83/04 , C08L83/16 , H01B1/12

29. 发明专利

JP2700233B2 失效
公开(公告)号：JP2700233B2
公开(公告)日：1998-01-19
申请号：JP32847288
申请日：1988-12-26
IPC分类号： C08G73/00 , C08G77/48 , C08G77/62

30. 发明专利

JPH09188765A SILICON-CONTAINING COPOLYMER AND ITS PRODUCTION 失效
公开(公告)号：JPH09188765A
公开(公告)日：1997-07-22
申请号：JP35406995
申请日：1995-12-29
申请人： TONEN CORP
发明人： TASHIRO YUJI
IPC分类号： C08G77/62 , C08G77/48
摘要： PROBLEM TO BE SOLVED: To obtain the above polymer having a specific average molecular weight, comprising a specific structural unit, excellent in heat resistance, flexibility and mechanical characteristics, capable of readily producing and useful for heat-resistant coating, coating for heat-resistant electric wires, etc. SOLUTION: This silicon-containing copolymer has 500-1000000 number- average molecular weight and contains at least structural units of formula I [R and R are each a (cyclo)alkyl, an alkenyl, an aryl, an aralkyl, an alkylamino or an alkylsilyl; (p) is a molar ratio], formula II [R is a divalent aromatic group; (q) is a molar ratio], formula III [R to R are each R ; R is R ; (r) is a molar ratio], formula IV [R is R; (s) is a molar ratio] and formula V [(t) is a molar ratio] and the structural units of formula I to formula V are random and (p), (q), (r), (s) and (t) satisfy relationships of the formula (p+s)/(q+t)=0.01-99 and the formula (p+s)/(r)=0.01 to 99.

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