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21. 发明专利

JPS56141154A TARGET FOR X-RAY TUBE AND ITS MANUFACTURE 失效
公开(公告)号：JPS56141154A
公开(公告)日：1981-11-04
申请号：JP4278280
申请日：1980-04-03
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： KOIZUMI HIDEO , KOSEKI ISAMU , FUKUHARA YOSHIO
IPC分类号： H01J9/14 , H01J35/08 , H01J35/10
摘要： PURPOSE:To efficiently generate X-rays throughout a long period, by providing a focal plane layer consisting of rhenium plate on a base plate. CONSTITUTION:Rhenium powder and/or paste agent 2 are applied on to a graphitic base body 1, and on top of that a rhenium plate 3 is piled, and then these are cemented by the method of hot press. Processing work under pressure is performed in such a condition that to prevent oxidation of the base body 1 and rhenium plate 3 at their high temperature, the circumference of work is kept to an ambinence in vacuum or inactive gas at temperature of 1,200-1,500 deg.C and pressure of 200- 500kg/cm .

22. 发明专利

JPS5643730A MANUFACTURE OF TUNGSTEN OR MOLYBDENUM SEMICONDUCTOR ELEMENT SUBSTRATE 失效
公开(公告)号：JPS5643730A
公开(公告)日：1981-04-22
申请号：JP11929679
申请日：1979-09-19
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： SAITOU HIROYUKI , KOIZUMI HIDEO , FUKUHARA YOSHIO
IPC分类号： B24B31/02 , H01L21/304
摘要： PURPOSE:To efficiently manufacture a semiconductor element placing substrate having a high degree of smoothness of surface by a method wherein a tungsten or molybdenum unfinished plate is contacted with abrasive stone grains in a barrel using a wet method. CONSTITUTION:A tungsten or molybdenum unfinished plate of 1-2mm. thick, for example, is put in a barrel (a cylindrical container with both ends closed where desired abrasive stone grains (carborundum, alumina or the like) and water are mixed, and the plate is round by revolving around the axis of the barrel at the rate of 30-300 revolutions per minute, for example. Hereby, the maximum variation in roughness of the surface shows such a small value as about 14mu, for example, and a semiconductor element placing substrate, having a stabilized bonding strength when a semiconductor is joined or an excellent thermal conductivity when it comes into use, can be efficiently manufactured.

23. 发明专利

JPH0563276B2 失效
公开(公告)号：JPH0563276B2
公开(公告)日：1993-09-10
申请号：JP1600684
申请日：1984-02-02
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： FUKUHARA YOSHIO , MATSURA IKUO
IPC分类号： C22C9/00 , B23K1/19 , B23K35/00 , B23K35/32 , C22C27/04

24. 发明专利

JPS6354217B2 失效
公开(公告)号：JPS6354217B2
公开(公告)日：1988-10-27
申请号：JP11065981
申请日：1981-07-17
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： KOIZUMI HIDEO , MORITA TADASHI , FUKUHARA YOSHIO
IPC分类号： H01L21/52 , H01L23/492

25. 发明专利

JPS58147553A MOLYBDENUM ELECTRODE FOR MELTING GLASS 失效
公开(公告)号：JPS58147553A
公开(公告)日：1983-09-02
申请号：JP2892782
申请日：1982-02-26
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： KOIZUMI HIDEO , MORITA TADASHI , TAKAHASHI DEN , FUKUHARA YOSHIO
IPC分类号： C23C16/30 , C23C16/32 , C23C16/34 , H05B3/03
摘要： PURPOSE:To enhance the resistance to consumption due to oxidation by forming a thin film with superior heat and oxidation resistances on the surface of an Mo substrate by a chemical vapor deposition method. CONSTITUTION:A compound having heat and oxidation resistances at the temp. of molten glass and high bonding strength to an Mo substrate, e.g., TiC, SiC, B4C, TiN or SiN is prepared. The surface of the Mo substrate is coated with the compound by chemical vapor deposition or other method to obtain an electrode for melting glass. This electrode has superior resistance to consumption due to oxidation and withstands long-time use.

26. 发明专利

JPS5859547A MANUFACTURE OF ROTARY ANODE FOR X-RAY TUBE 失效
公开(公告)号：JPS5859547A
公开(公告)日：1983-04-08
申请号：JP15741181
申请日：1981-10-05
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： FUKUHARA YOSHIO , KOIZUMI HIDEO , MORITA TADASHI , OKUDA SHINJI
IPC分类号： H01J9/14 , H01J35/10
摘要： PURPOSE:To perform the whole hot work of making a flat complex plate into a disk-like shape highly accurately, and facilitate the following balancing work by performing both the finishing work and the work of making a hole for a revolving shaft with reference to a taper surface. CONSTITUTION:While a taper surface 10 highly accurately formed is firmly held with a holding jig 11a and a lower-surface holding jig 11b so that the holding surface corresponds to the taper surface 10, a hole 9 for a revolving shaft is provided, and parts of central flat surfaces 12a and 12b are subjected to finishing work. After that, finishing work is performed on the taper surface while the hole 9 and the parts of the flat surfaces 12a and 12b which undergo finishing work are firmly supported. Next, balancing work is performed in the same manner as the conventional method.

27. 发明专利

JPS5859545A ROTARY TARGET FOR X-RAY TUBE 失效
公开(公告)号：JPS5859545A
公开(公告)日：1983-04-08
申请号：JP15487781
申请日：1981-10-01
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： FUKUHARA YOSHIO , MORITA TADASHI , KOIZUMI HIDEO
IPC分类号： H01J35/10
摘要： PURPOSE:To obtain a light target which realizes an excellent thermal conductivity between an Mo plate and a W plate, which is located at a focus orbit surface, by making pulverized tungsten or tungsten alloy particles to adhere to the focus orbit surface of a base body made of Mo or an Mo alloy so as to form a thin film of tungsten or a tungsten alloy on the focus orbit surface. CONSTITUTION:Highly pure WF6 charged in a sealed case, and highly pure H2 gas charged in a sealed case are prepared. These gases are mixed in a sealed chamber which contains an Mo plate 1 on which a thin film is to be formed, and the mixed gas is heated so as to make it to undergo the reaction of Wf6+3H2 W+6HF. Since W atoms are produced due to the above reaction, they are introduced and deposited on a given surface of the Mo plate 1. Immediately after that, the Mo plate 1 on which W is deposited is heated at a relatively low temperature of around 1,000 deg.C so as to make a thin W layer 6 closely adhering to the Mo plate 1. When treatments of the above reaction, deposition and heating are repeatedly performed, a W layer 6 with a given thickness is formed on the given surface of the plate 1.

28. 发明专利

JPS5814487A HEATER FOR ELECTRIC FURNACE 失效
公开(公告)号：JPS5814487A
公开(公告)日：1983-01-27
申请号：JP11066181
申请日：1981-07-17
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： KOIZUMI HIDEO , MORITA TADASHI , FUKUHARA YOSHIO , TAKAHASHI DEN
IPC分类号： H05B3/62 , H05B3/12

29. 发明专利

JPS57185964A PRODUCTION OF MO PLATE HAVING ULTRAFLATNESS 失效
公开(公告)号：JPS57185964A
公开(公告)日：1982-11-16
申请号：JP6815481
申请日：1981-05-08
申请人： TOKYO SHIBAURA ELECTRIC CO
发明人： SAITOU HIROYUKI , FUKUHARA YOSHIO , KOIZUMI HIDEO
IPC分类号： B21D1/00 , C22F1/18
摘要： PURPOSE:To produce Mo plates having ultraflatness used for X-ray tomographic devices by subjecting the cleaned Mo plates to a heat treatment in a reducing atmosphere while sandwiching these by pressure with heat resistant rigid plates having flatness higher than the desired flatness. CONSTITUTION:Mo plates rolled to a desired thickness are blanked to prescribed shapes, and further burrs, etc. are removed by machining. These plates are cleaned with a detergent such as an aq. powder soap soln. to remove the foreign matter, oils, etc. stuck on their planes, after which they are dried. The cleaning is accomplished thoroughly so as not to leave foreign matter of about 5mu on the planes. Plural sheets of the cleaned Mo plates 6 are sandwiched by pressure by means of Mo blocks 4, 5 having working planes of about

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