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21. 发明专利

JPS6042824A DEVICE AND METHOD FOR DRAWING CONTROL OF CHARGED BEAM EXPOSURE DEVICE 失效
公开(公告)号：JPS6042824A
公开(公告)日：1985-03-07
申请号：JP15100083
申请日：1983-08-19
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： MOROSAWA TETSUO , FUJINAMI AKIHIRA , SHIMAZU NOBUO
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enable the repeated reading and the backward reading of drawing data, by providing the large-capacity memory storing the drawing data, the counter circuit reading repeatedly the data and determining the times, the register controlling a reading direction for the device performing a pattern drawing with using a charged beam while moving a sample continuously. CONSTITUTION:An electron gun 2 and a movable stage 7 carrying the sample to be exposed 6 are arranged with facing in an optoelectronic lens barrel 1 and the electron beam 3 from the electron gun 2 is projected onto the sample 6 through a beam blanker 4 and a deflector 5. The control calculator 8 in which the data from the large-capacity memory medium not shown in the drawing is inputted is provided and a drawing data memory 9, a repeated reading calculating circuit 10 and a direction control register 11 are connected to said calculator 8. Next, the output from the memory 9 is inputted in a compensation calculating circuit 12 and the output from this circuit controls the blanker 4 and the deflector 5. At the same time, the stage 7 is moved by a stage control circuit 13 connected to the calculator 8.

22. 发明专利

JPS5987815A DEFLECTION CONTROLLING FOR THEREOF ELECTRON BEAM AND CIRCUIT 失效
公开(公告)号：JPS5987815A
公开(公告)日：1984-05-21
申请号：JP19707182
申请日：1982-11-10
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIBAYAMA AKINORI , FUJINAMI AKIHIRA , SHIMAZU NOBUO
IPC分类号： H01J37/147 , H01J37/302 , H01J37/305 , H01L21/027
摘要： PURPOSE:To reduce the wasted time produced by every pattern by a method wherein the waiting time, during which an electron beam is off, is changed according to the variation of deflection distance and the beam measure of every pattern. CONSTITUTION:A deflection waiting time generating circuit 8, which generates the deflection waiting time, during which an electron beam is off at every variation of the deflection position, according to the output data of a deflection selection circuit 7, and a measure variation waiting time generating circuit 10, which generates a measure variation waiting time, during which an electron beam is off at the measure variation of the electron beam, according to the output data of a measure selection circuit 9, and a waiting time setting circuit 11, which sets a temporary waiting time, which is the longer one of the bias waiting time and the measure variation waiting time selected by comparison of them and during which an electron beam of every variation of the deflection position off, and alike are provided.

23. 发明专利

JPS57172724A EXPOSING DEVICE FOR ELECTRON BEAM 失效
公开(公告)号：JPS57172724A
公开(公告)日：1982-10-23
申请号：JP5630381
申请日：1981-04-16
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30
摘要： PURPOSE:To utilize the effective beam current to the utmost extent as well as to perform a variable forming beam exposure in which the effect of space charge is reduced for the subject exposing device by a method wherein the control signal for the irradiation angle and the center position of irradiation of the beam is generated on the circuit wherein irradiation information will be processed. CONSTITUTION:The irradiating position is controlled 19 by interpreting the input data pertaining to irradiation and by outputting the information for deflection in accordance with the position of irradiation. At the same time, the angle of irradiation theta for the formation aperture 6 is calculated taking into consideration the size of the beam, the angle theta is controlled 17, and the center position of irradiation is controlled 16. When the voltage of a deflector 13 is controlled 18, the irradiation distribution is converted into a patternings 23 or 24 in proportion to the beam size along the axis of coordinates, and the beam size and the position of irradiation are determined. Subsequently, by controlling 15 the time of irradiation, the formed beam is irradiated on the prescribed position of a sample 11 for the period of time as prescribed. According to this constitution, the position and expansion of the beam distribution is controlled at a point above the surface of the first formation aperture 6 in accordance with the beam size, an effective beam can always be utilized to the utmost extent, and no correction of space charge effect is required, because the change in the total current value of the beam on the sample is very small.

24. 发明专利

JPS55102231A METHOD FOR CORRECTING DISTORTION OF ELECTRON BEAM EXPOSURE DEVICE AND CIRCUIT THEREOF 失效
公开(公告)号：JPS55102231A
公开(公告)日：1980-08-05
申请号：JP850479
申请日：1979-01-27
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIBAYAMA AKINORI , SHIMAZU NOBUO
IPC分类号： H01L21/027 , H01J37/304
摘要： PURPOSE:To provide pictures to the sample that moves continuously by adding both the quantity of movement of the sample location from the measurement of distortion to the correction of picturing data and the quantity of compensation of deflection location to the picturing data which is obtained by correcting the distortion of the shape of sample. CONSTITUTION:First, the marks at four corners of the area (1, 1) are detected, previously held correction values 12, 13 are subtracted from the measured values 10, 11 of the sample location to compensate the measured values. On the other hand, the area (1, 1) is divided into the form of a matrix, the quantity of distortion correction corresponding to the central coordinates of each element area is stored 5, read by the signal 3, 4, addition and subtraction are applied to it to compensate the location 1, 2 given by the distortion of the shape of sample. The data, which are obtained by applying the addition and subtraction to the corrected outputs 18-21, are compensated 31, 32 by previously stored deflection location errors that are read by the signals 26, 27. By repeating the operation, the picture can precisely be provided to the desired position of the sample that moves continuously. Also the correction factors can be computed by the circuits 5, 28, the location error of a sample that moves at the speed of about 20mm/sec is 0.02mum per 1mu sec of the operation time.

25. 发明专利

JPS5595325A DETECTING DEVICE OF MARKING POSITION FOR ELECTRON BEAM EXPOSURE APPARATUS 失效
公开(公告)号：JPS5595325A
公开(公告)日：1980-07-19
申请号：JP177379
申请日：1979-01-13
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO , MATSUDA KOREHITO , MORIYA SHIGERU
IPC分类号： H01L21/027 , H01J37/304
摘要： PURPOSE:To detect a marking position of a large-sized chip with superior reproducibility and accuracy at high speed without moving a wafer by deflecting a beam using a large region deflecting power source. CONSTITUTION:Switches 13-16 are first turned off and a base mark 8 is transferred to a place near a light axis for detecting its position, then x coordinates L1+M1 are detected 10 and calculated 22 from the read-out L1 and the quantity of deflection M1 of a length measuring instrument 9. Next the switch 13 is turned on, and a board 6 is moved for approximately -l in an x direction so as to measure 9 the actual volume of transference L2. A beam is deflected 5 by a base voltage 17 by -l. When the deflection volume of the mark is M2, L2+M2-M1 becomes the volume of deflection based on the base voltage 17. In the same manner, the volume of deflection calibrated in reference to basic constant-voltage regulated power sources 18-20 is stored in a calculator 22. For detecting a mark 28, if the switches 13, 16 are turned on, the beam is discovered in the neighborhood of the mark 28. Thus, if the volume of deflection M3, M4 is obtained in the directions of x, y after detecting the mark, mark coordinates can be calculated. According to the construction, it is unnecessary to move the board for each mark, and an inexpensive and highly accurate detecting device can be obtained.

26. 发明专利

JPS5513874A MEASURING METHOD FOR DISTRIBUTION OF ELECTRON BEAM CURRENT DENSITY 失效
公开(公告)号：JPS5513874A
公开(公告)日：1980-01-31
申请号：JP8669978
申请日：1978-07-18
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO
IPC分类号： G01T1/29 , H01L21/027
摘要： PURPOSE:To make measurement under no influence of a noise by intermittently emitting an electron beam modulated by a blanking signal and then by extracting only the same frequency component as the blanking signal from the output of an electron beam detector by using a frequency analyzer. CONSTITUTION:To measure the current density distribution of electron-beam irradiation region 15, movable table 6 is driven first according to the program of information processor 11 to move detection part 5 into the irradiation region of electron beam 12 and deflection unit 4 is used to shift irradiation region 15 according to the steps sectioned in the direction of XY2. The order of this displacement allows the expansion or contraction of each unit section with the displacement in the direction of XY2 and the output of detector 5 at each position is processed by frequency analyzer 10 to extract only the amplitude value of the same frequency component as the blanking signal. Then, the extracted component amplitude value is processed to obtain the variation in beam current of each unit section, thereby forming the two-dimensional electron-beam current density distribution.

27. 发明专利

JPH10312947A X-RAY EXPOSURE SYSTEM AND METHOD 失效
公开(公告)号：JPH10312947A
公开(公告)日：1998-11-24
申请号：JP11959297
申请日：1997-05-09
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO , SHIMIZU AKIRA , SAKAI TOMOAKI , TSUYUSAKI HARUO , FUKUDA MAKOTO , MATSUO SEITARO
IPC分类号： G21K5/02 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To enable a mask pattern to be transferred conforming to an alignment mark detection result by a method wherein a substrate which holds an X-ray transmitting film that forms the exposure region of an X-ray mask is fixed by the single point, and the fixed substrate is partly regulated in temperature. SOLUTION: A heating holder 101 fixes and holds an X-ray mask 102 by the single point with a vacuum chuck 103, a square opening is provided to the center of the X-ray mask 102. An X-ray transmitting thin film 105 which forms an exposure region is provided to the opening, and an exposure region as an LSI forming mask pattern formed of X-ray shielding material is arranged thereon. A heater 106 is uniformly arranged on the heating holder 101 which is located on a concentric circle in a region positioned out of the thin film. 105 of the X-ray mask 102, the surface of the heater 106 is made to approach the X-ray mask 102 or to come into contact with it, and the heater 106 is regulated in temperature so as not to warp the X-ray mask 102 and to prevent the X-ray mask 102 from being thermally deformed in the directions of X and Y.

28. 发明专利

JPH097538A CHARGED BEAM DRAWING DEVICE 失效
公开(公告)号：JPH097538A
公开(公告)日：1997-01-10
申请号：JP15906395
申请日：1995-06-26
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO , SAITO KENICHI
IPC分类号： H01J37/305 , H01L21/027
摘要： PURPOSE: To reduce coulomb effect to form a fine charged beam image by a high electric current, by dividing a charged beam, emitted from an electron gun, into plural charged beam groups. CONSTITUTION: An electron, emitted from the crossover 11 of an electron gun, becomes a parallel beam by the action of an irradiation lens 14 to be incident into an Einzel lens 15 constituting a multi-charged beam optical system. The lens 15 has plural circular openings arranged in a matrix state, to divide an incident electron beam into plural electron beams. Consequently, the electric current values of the respective electron beam are made small to reduce Coulomb effect and the fading of the electron beam, The electron beam, passed the lens 15, passes a blanking aperture 17 to receive imaging action by an Einzel lens 19, and acceleration action by a rear stage acceleration electrode 20. Then, the electron beam passes an atmospheric takeout part 21 to form the image of the original crossover 11 onto a specimen 22 such as a wafer or a mask.

29. 发明专利

JPH04147642A VACUUM/ELECTROSTATIC CHUCK 失效
公开(公告)号：JPH04147642A
公开(公告)日：1992-05-21
申请号：JP27170690
申请日：1990-10-09
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： KUNIOKA TATSUYA , SHIMAZU NOBUO
IPC分类号： H01L21/683 , H01L21/68
摘要： PURPOSE:To flatly support a wafer with a low impressed voltage by forming an insulating thin film on an electrode for an electrostatic chuck and forming a groove whose depth is less than the thickness of the insulating thin film for a vacuum chuck. CONSTITUTION:An insulating thin film 3 is formed on an electrode 2 for an electrostatic chuck and a groove 1 whose depth is much less than the thickness of the insulating thin film 3 for a vacuum chuck is formed on the surface of the insulating thin film 3. The distance between a wafer 4 and the electrode 2 for the electrostatic chuck becomes the same as the case only the electrostatic chuck is used and enough electrostatic force is obtained with a low impressed voltage.

30. 发明专利

JPH04101341A CHARGED BEAM OPTICAL LENS-BARREL 失效
公开(公告)号：JPH04101341A
公开(公告)日：1992-04-02
申请号：JP21706190
申请日：1990-08-20
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO
IPC分类号： H01J37/147 , H01J37/18
摘要： PURPOSE:To lessen the number of part items and lower the price of an optical lens-barrel by vacuum-sealing a part crossing the beam axis of a polariscope's polar plate rectangularly with an insulating material to compose a polariscope unit. CONSTITUTION:A polariscope unit 1 is equipped with a metal made polariscope's polar plate 2 to deflect a charged beam. The outside part which crosses a beam axis 3 rectangularly of the polariscope's polar plate 2 is vacuum-sealed by an insulating material, for example insulating ceramic 4, which forms the holding part of the polarscope unit 1. In this way, the part, which crosses the beam axis rectangulaly, of the polariscope's plate 2 is vacuum-sealed by an insulating material 4, so that the number of the part items is lessened and vacuum out-put at high temperature becomes possible and lens and wires become possible to be installed in the atmosphere.

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