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    • 26. 发明专利
    • Power semiconductor device and inverter device
    • 功率半导体器件和逆变器器件
    • JP2003303939A
    • 2003-10-24
    • JP2002104955
    • 2002-04-08
    • Hitachi Ltd株式会社日立製作所
    • ISHIKAWA KATSUMIIKIMI TAKASHITOYODA EIICHIOKAMATSU SHIGETOSHIKUROSU TOSHIKIMORI MUTSUHIROSAITO RYUICHISEKINE SHIGEKIKATO SHUJI
    • H01L25/07H01L25/18H02M7/48H02M7/483H02M7/5387
    • H01L25/072H01L2924/0002H01L2924/00
    • PROBLEM TO BE SOLVED: To obtain a miniaturized IGBT module, even when a received AC voltage is high, in order to miniaturize an inverter device for driving a motor. SOLUTION: Projected walls made of a resin, which are higher than screws, and recessed parts (grooves), lower than the lower ends of terminals, are provided between neighbored AC terminals and DC terminals or in between neighbored two DC terminals between respective screwed surfaces so as to be continuous with the projected walls. According to this method, the insulation spatial distance between adjacent terminals neighbored by the high projected walls is secured and the insulation creeping distance between terminals neighbored by the recessed and projected parts by the continuation of projected walls and recessed parts, is secured whereby the highly pressure-resistant IGBT module, having a high density and miniaturized, is realized. COPYRIGHT: (C)2004,JPO
    • 要解决的问题:为了获得小型化的IGBT模块,即使接收的交流电压高,为了使用于驱动电动机的逆变器装置小型化。

      解决方案:在相邻的交流电源端子和直流端子之间或相邻的两个直流端子之间,设置有比螺钉高的树脂制成的突出的壁和比端子的下端低的凹陷部分(凹槽) 相应的螺纹表面,以便与突出的壁连续。 根据该方法,确保由高投影壁相邻的相邻端子之间的绝缘空间距离,并且通过延伸的突出壁和凹陷部分由凹入和突出部分邻接的端子之间的绝缘爬电距离被固定,由此高压力 实现了高密度且小型化的IGBT模块。 版权所有(C)2004,JPO

    • 29. 发明专利
    • JPH04206576A
    • 1992-07-28
    • JP32917990
    • 1990-11-30
    • HITACHI LTDHITACHI HARAMACHI DENSHI KOGYO
    • TAKENOCHI HIDEKIKUROSU TOSHIKIHOSOYA HIROMI
    • H01L29/872H01L29/47H01L29/861H01L29/91H01L29/48
    • PURPOSE:To enable a high-speed type diode to be restrained from increasing in forward voltage and enhanced in reverse recovery characteristic by a method wherein the semiconductor substrate of the diode is set an off angle 3-5 degrees. CONSTITUTION:An N -type Si substrate 1 which is sliced at an angle of 4 degrees inclined to a inclination direction and whose primary face is a (100) plane is employed. An N epitaxial layer 2 is provided onto a substrate 1, and a P -type Si layer 3 in deep junction with the N-layer 2 and a P -type Si layer 4 in shallow junction with the N-layer 2 are formed so as to be alternately arranged at an adequate interval. An Al layer 6 is formed taking advantage of the opening of an SiO2 film 5, and a Cr layer 7 is deposited on the N substrate 1. When a reverse voltage is applied to a P-N junction, carriers in a region b small in thickness in the N-layer are quickly lessened in number, and carriers in a region large in thickness are gradually decreased in number. Therefore, a semiconductor device of this design has such characteristics that di/dt is small at a reverse recovery or the device recovers softly at a reverse recovery.