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21. 发明专利

JPS58193426A Light detector 失效
标题翻译：光探测器
公开(公告)号：JPS58193426A
公开(公告)日：1983-11-11
申请号：JP7524882
申请日：1982-05-07
申请人： Hitachi Ltd
发明人： ITOU YOSHITOSHI , HASE SHINOBU , MUNAKATA TADASUKE
IPC分类号： G01J1/02 , G01J1/04
CPC分类号： G01J1/04 , G01J1/0403 , G01J1/0425 , G01J1/0451
摘要： PURPOSE:To obtain the accurate output proportional to the amount of received light when the light is received by a plurality of light guides, by expanding the light received by the light guides to the entire surface of a photoelectric plane of a photoelectric multiplier tube and inputting the light in the tube. CONSTITUTION:The light reflected by a sample is received by a plurality of light guides 4-7, and transmitted to a photoelectric multiplier tube 8. For this purpose, a holder 11 supports the light guides 4-7 so that the end surfaces of the light guides 4-7 are located at the points separated from the central part of the photoelectric plane of the photoelectric multiplier tube 8 by an equal distance R. The distance R is determined in such a way that the light emitted from the light guides 4-7 is expanded to the approximately entire surface of the photoelectric plane of the photoelectric multiplier tube 8.
摘要翻译：目的：为了获得与多个光导所接收的光的接收光量成比例的精确输出，通过将光导所接收的光扩大到光电倍增管的光电面的整个表面，并输入光管在管中。构成：由样品反射的光被多个光导4-7接收，并传输到光电倍增管8.为此，保持器11支撑光导4-7，使得光导4-7位于与光电倍增管8的光电面的中心部分相隔相等距离的位置处。距离R以这样的方式确定：从光导4- 7扩展到光电倍增管8的光电面的大致整个表面。

22. 发明专利

JPS58192341A Testing device for defect of pattern 失效
标题翻译：用于图案缺陷的测试装置
公开(公告)号：JPS58192341A
公开(公告)日：1983-11-09
申请号：JP7524782
申请日：1982-05-07
申请人： Hitachi Ltd
发明人： MUNAKATA TADASUKE , SUDA TADASHI , HASE SHINOBU , KONAME KANJI , NAGATOMO HIROTO
IPC分类号： G01B11/24 , G01B11/245 , H01L21/66
CPC分类号： H01L22/00
摘要： PURPOSE:To display a defect image to a picture surface by modulating the brightness of a CRT by a detecting signal of reflection diffraction beams from the defect section of the pattern and synchronizing beams for a picture with scan light-beams. CONSTITUTION:A sample 4 is scanned by laser beams 1, and outputs from diffraction beam detectors 8, 8' arranged in the directions of (2n+1)X22.5 deg. are added 9, amplified 25 and recognized made correspond to a position on the sample as a defect signal in a signal processing system (an electronic calculator) 17. A positional information is decided by the information transfer for the processing system 17 and a drive control section. The defect signal is given to the CRT 23. Reflected beams 30 are detected 20 and used as a second signal in order to grasp the correlation of a normal pattern and the defect, and diffraction beams from the fringe of the normal pattern are detected by eight detectors 26, 26' arranged in the directions of nX45 deg., and outputs are added 27, amplified 28 and used as a scan brightness modulation signal. Second and third signals are selected 21 and used. According to said constitution, the signal by higher diffraction beams is added to the signal of lower diffraction beams (reflected) while being emphasized and a sharp picture is obtained, and the defect is easily extracted.
摘要翻译：目的：通过从图案的缺陷部分的反射衍射光束的检测信号和扫描光束的图像的同步光束来调制CRT的亮度来向图像表面显示缺陷图像。构成：样品4由激光束1扫描，并从沿（2n + 1）×22.5度方向排列的衍射光束检测器8,8'输出。被加上9，被识别的信号与信号处理系统（电子计算器）17中的缺陷信号对应于样本上的位置。位置信息由处理系统17的信息传送和驱动控制部分。将缺陷信号提供给CRT 23.检测反射光束20并将其用作第二信号，以便掌握正常图案与缺陷的相关性，并且通过八次检测来自正常图案的边缘的衍射光束检测器26,26'设置在n×45度的方向上，并且输出被加上27，放大28并用作扫描亮度调制信号。选择第二和第三信号21并使用。根据上述结构，在被强调的同时，通过高衍射光束的信号被加到较低衍射光束（反射）的信号上，并且获得清晰的图像，并且容易地提取缺陷。

23. 发明专利

JPS58192339A Inspecting device for defect of pattern 失效
标题翻译：检查图案缺陷检测装置
公开(公告)号：JPS58192339A
公开(公告)日：1983-11-09
申请号：JP7524582
申请日：1982-05-07
申请人： Hitachi Ltd
发明人： MUNAKATA TADASUKE , KONAME KANJI , HASE SHINOBU , ITOU YOSHITOSHI , SHIDA HIROYUKI
IPC分类号： G01B11/24 , G01B11/245 , H01L21/66
CPC分类号： H01L22/00
摘要： PURPOSE:To extract a defect signal without being disturbed by a false defect signal by removing a detecting signal based on the reflection diffraction beams from a circular pattern on a sample surface by self-decision. CONSTITUTION:Photodetectors 18a-18d are fitted in the directions of (2n+1)X 45 deg. and outputs are synthesized 20 and amplified and a signal Sn(45) is formed, photodetectors 19a-19d are fitted in directions of 2nX45 deg. and outputs are added 22 and amplified 23 and a signal Sn(90) is formed, and a signal from normal pattern is obtained. Detectors 8a-8e for the diffraction beams of a defect section are fitted in the directions of (2n+1)X22.5 deg. and outputs are added 9 and amplified 10 and a signal Sd is formed. A diffraction signal 16' from the crystal grains 13 of the circular patterns and a defect signal 15'' from patterns 12 are made contain in the signal Sn(45), but the signal 15'' is smaller than a signal 15' in Sd in the patterns normally used. When a level is adjusted properly and a signal Sd-Sn(45) is obtained, only a signal 15''' corresponding to a defect remains, and only a desired defect signal can be drawn correctly from the circular patterns similar to the defect.
摘要翻译：目的：通过自我判断，通过从样品表面上的圆形图案中去除基于反射衍射光束的检测信号，提取缺陷信号而不被伪缺陷信号干扰。构成：光电检测器18a-18d沿（2n + 1）×45度的方向嵌合。并合成输出20并放大并形成信号Sn（45），光电检测器19a-19d沿2nX45°的方向嵌合。并加上输出22并放大23，形成信号Sn（90），得到正常图案的信号。用于缺陷部分的衍射光束的检测器8a-8e沿（2n + 1）×22.5度的方向拟合。并输出9并放大10，形成信号Sd。来自圆形图案的晶粒13的衍射信号16'和来自图案12的缺陷信号15“被包含在信号Sn（45）中，但是信号15”比Sd中的信号15'小在通常使用的图案中。当正确地调整电平并且获得信号Sd-Sn（45）时，仅保留与缺陷相对应的信号15“'，并且可以从类似于缺陷的圆形图案中正确地绘制期望的缺陷信号。

24. 发明专利

JPH01188816A SPECTRAL TYPE SCANNING MICROSCOPE 失效
公开(公告)号：JPH01188816A
公开(公告)日：1989-07-28
申请号：JP1266788
申请日：1988-01-25
申请人： HITACHI LTD
发明人： KIMURA SHIGEJI , MUNAKATA TADASUKE , HASE SHINOBU
IPC分类号： G01N21/64 , G01N21/27 , G02B21/00
摘要： PURPOSE:To easily provide a spectral function at a scanning microscope without changing largely the constitution of the scanning microscope by using a lens having a color aberration and a pin hole to be able to move on a light axis. CONSTITUTION:From the irradiation position of a laser light to a sample 500, light 20 including many wavelengths is radiated and made incident on a lens 100 having a color aberration. Since the lens 100 has the color aberration, a long wavelength light 21 has a focus at the position far away from the lens 100 and on the other hand, a short wavelength light 22 has a focus at the position close by the lens 100. When a pin hole 300 is at the position shown in the figure, the pin hole 300 is at the position of the focus only for the long wavelength light 21, and therefore, only the long wavelength light 21 passes through the pin hole 300 and arrives at a light detector 400. On the other hand, since the short wavelength light 22 is converged on this way of the pin hole 300 and expanded at the position of the pin hole 300, the most part cannot pass through the pin hole 300. Thus, without changing largely the constitution of a conventional scanning microscope, the spectral function can be easily realized.

25. 发明专利

JPS63281438A INSPECTION DEVICE FOR FOREIGN MATTER 失效
公开(公告)号：JPS63281438A
公开(公告)日：1988-11-17
申请号：JP11460187
申请日：1987-05-13
申请人： HITACHI LTD
发明人： KIMURA SHIGEJI , MUNAKATA TADASUKE , HASE SHINOBU
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PURPOSE:To detect a fine foreign matter on a wafer with a pattern, and to improve the yield of a product by introducing a linear polarization board in the optical path of reflected and diffracted light projected to a photodetector and properly adjusting a transmission axis for the linear polarization board. CONSTITUTION:Coherent light 300 is diaphragmed to a fine spot, and can be made to scan on a semiconductor substrate 400 to which a pattern is formed. Photodetectors 602-609 are installed in the direction that intense refrected and diffracted light generated from a normal pattern is avoided, an oblique upper section. Reflected and diffracted light 106-113 directed toward the photodetectors 602-609 are generated by the 'roundness' of the pattern. Linear polarization boards 502-509 are positioned in the optical paths of reflected and diffracted light 106-113 in order to reduce reflected and diffracted light 106-113. Transmission axes for the linear polarization boards are adjusted so that outputs from each photodetector are minimized. A signal processor 700 adds all of signals from the photodetectors, and processes the signal so as to detect the generation of pulse-shaped signals. A computer system 701 memorizes and displays where pulses are generated.

26. 发明专利

JPS6358369B2 失效
公开(公告)号：JPS6358369B2
公开(公告)日：1988-11-15
申请号：JP9942483
申请日：1983-06-06
申请人： HITACHI LTD
发明人： SUDA TADASHI , HASE SHINOBU , TAKAMI KATSUMI
IPC分类号： G01N21/94 , G01N21/956 , G02B27/42 , H01L21/66

27. 发明专利

JPS63193537A MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPS63193537A
公开(公告)日：1988-08-10
申请号：JP2452587
申请日：1987-02-06
申请人： HITACHI LTD
发明人： KIMURA SHIGEJI , MUNAKATA TADASUKE , HASE SHINOBU
IPC分类号： H01L21/66 , H01L21/304
摘要： PURPOSE:To observe the deepest part of a semiconductor readily without destruction, by forming the rear of a semiconductor substrate as a mirror surface, inputting light, which can be transmitted through the semiconductor substrate, and observing the reflected light from the inside. CONSTITUTION:On the surface of a semiconductor substrate 10, e.g., a silicon oxide film 11 and an aluminum thin film 12 are formed by a semiconductor process. When the rear of the substrate 10 is rough, the fine state of the inside cannot be well observed. Therefore, the rear of the substrate 10 is made to be a mirror surface state. The inside of the substrate 10 is lighted by using a light source 30, a lens 20, a half mirror 22 and a lens 21. The state of the inside is observed by forming the image of the reflected light on an image sensing surface of a TV camera 20 through the lens 21. Thus the deepest part of the semiconductor can be readily observed without destruction.

28. 发明专利

JPS6222530B2 失效
公开(公告)号：JPS6222530B2
公开(公告)日：1987-05-19
申请号：JP16813983
申请日：1983-09-14
申请人： HITACHI LTD
发明人： HASE SHINOBU , SUDA TADASHI , TAKAMI KATSUMI
IPC分类号： G01N21/88 , G01B11/24 , G01N21/94 , G01N21/956 , H01L21/66

29. 发明专利

JPS6167237A Apparatus for detecting defective pattern 失效
标题翻译：检测有缺陷的图案的装置
公开(公告)号：JPS6167237A
公开(公告)日：1986-04-07
申请号：JP18789984
申请日：1984-09-10
申请人： Hitachi Ltd
发明人： SUDA TADASHI , KIMURA SHIGEJI , HASE SHINOBU , MUNAKATA TADASUKE , KONAME KANJI , ITO YOSHITOSHI , NAGATOMO HIROTO , TANIGUCHI YUZO
IPC分类号： G01B11/30 , G01N21/956 , H01L21/26 , H01L21/66
CPC分类号： H01L21/26 , G01N21/956
摘要： PURPOSE:To assure the correct selection of defectively processed patterns, by providing an abnormal direction detecting means comprising a photodetecting system having a large light-receiving surface and a defect judging means for judging if an abnormal direction signal indicates a real defect or not based on a signal from a normal pattern detection means. CONSTITUTION:IF the sum of four signals of abnormal directions is larger than a threshold value equivalent to the signal level relating to the rounding of corners, such pattern is always determined as defective. If the sum is equivalent to the threshold value the second signal eab from the top is selected from the four abnormal direction signals by a first signal selection circuit 47. Among four normal signals, the second signal e' from the bottom is selected by a second signal selection circuit 49. This signal e' is multiplied by (1+alpha) to obtain eno. The signals eab and eno are compared by a value comparing circuit 50. If eab> eno, the pattern is determined as defective. A pulse detected by a pulse detection circuit 46 is allowed to pass through the logic judging circuit 51 and to become a defect signal only when it is judged defective by the adding circuit 48 or the value comparing circuit 50.
摘要翻译：目的：为了确保正确选择缺陷处理的图案，通过提供一种异常方向检测装置，包括具有大的光接收表面的光电检测系统和缺陷判断装置，用于根据来自正常图案检测装置的信号。构成：如果异常方向的四个信号的总和大于等于与角舍入相关的信号电平的阈值，则这种模式总是被确定为有缺陷的。如果和等于阈值，则通过第一信号选择电路47从四个异常方向信号中选出来自顶部的第二信号eab。在四个正常信号中，从第二个信号选择第二信号e' 信号选择电路49.该信号e'乘以（1 +α）以获得eno。信号eab和eno通过值比较电路50进行比较。如果eab> eno，则将图案确定为有缺陷的。由脉冲检测电路46检测到的脉冲被允许通过逻辑判断电路51，并且只有当加法电路48或值比较电路50被判定为有缺陷时才成为缺陷信号。

30. 发明专利

JPS6026174B2 失效
公开(公告)号：JPS6026174B2
公开(公告)日：1985-06-22
申请号：JP5652076
申请日：1976-05-19
申请人： HITACHI LTD
发明人： SUDA TADASHI , HASE SHINOBU , TAKAMI KATSUMI , YONEZAWA SEIJI , SHIONO HIDEKI
IPC分类号： G01N21/88 , G01N21/89 , G01N21/94 , G01N21/956

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