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11. 发明专利

JPS5940443A Shadow mask and manufacture thereof 失效
标题翻译：阴影掩模及其制造
公开(公告)号：JPS5940443A
公开(公告)日：1984-03-06
申请号：JP14774082
申请日：1982-08-27
申请人： Toshiba Corp
发明人： HIGASHINAKAGAHA EMIKO , SATOU KANEMITSU , INABA MICHIHIKO , OOTAKE YASUHISA , KANTOU MASAHARU , ITOU MASAYUKI
IPC分类号： H01J9/02 , C21D9/46 , C23F1/00 , H01J9/14 , H01J29/07
CPC分类号： H01J9/142 , H01J2229/0733 , H01J2229/0777
摘要： PURPOSE:To form electron beam transmission holes of a shadow mask for television in high density and with high accuracy, by performing etching on the crystal surface of a raw plate wherein the crystal surface of the etching surface is prescribed by specifying rolling conditions. CONSTITUTION:After forging shadow mask material, (100) crystal surfaces are assembled on the rolling surface by hot-rolling. Next, cold-rolling having the rolling ratio not exceeding 50% a time and a heat treatment are performed. Photoetching is performed on the (100) crystal surfaces of the raw plate of said shadow mask in order to form beam transmission holes. Thereby, when not less than 35% of (100) crystal surfaces are assembled on the surface, whereon etching treatment is to be performed, the shadow mask, whereon the electron beam transmission holes are controlled with high accuracy as well as high density, can be obtained.
摘要翻译：目的：通过对规定轧制条件规定蚀刻面的晶面的原料板进行蚀刻，形成高密度，高精度的电视用荫罩的电子束透过孔。构成：锻造荫罩材料后，通过热轧将（100）晶体表面组装在轧制表面上。接下来，进行轧制率不超过50％的时间和热处理的冷轧。在所述荫罩的原板的（100）晶体表面上进行光刻，以形成光束透射孔。因此，当在表面上组装不少于35％的（100）晶体表面时，进行蚀刻处理时，以高精度和高密度控制电子束透射孔的荫罩可以得到。

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