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11. 发明专利

JP2007334343A Optical path conversion component manufacturing method, optical path conversion component, optoelectric composite substrate using the same, and manufacturing method of such substrate 有权
标题翻译：光路转换部件制造方法，光路转换部件，使用其的光电复合基板以及这种基板的制造方法
公开(公告)号：JP2007334343A
公开(公告)日：2007-12-27
申请号：JP2007133496
申请日：2007-05-18
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： SASAKI ATSUSHI
IPC分类号： G02B6/26 , G02B6/122 , G02B6/42
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of an optical path conversion component that makes high-density mounting or miniaturization possible, that facilitates mounting of an optoelectric element with low coupling loss, and that is thereby applicable to an optoelectric composite substrate, and to provide the optical path conversion component and a multilayered optoelectric composite substrate using the same. SOLUTION: In the optoelectric composite substrate, there are stacked in order a first substrate, an optical wiring layer having a core and a clad, and a second substrate having a through hole formed, with an optoelectric conversion element mounted on the surface of the second substrate. An optical waveguide comprising the core and the clad is a multi-layered optical wiring having a structure in which the core and the clad are stacked in a plurality of layers. The optoelectric composite substrate is characterized in that an optical signal propagating in the multi-layered waveguide is transmitted in the 90° optical path conversion component which is embedded in the through hole of the optical waveguide, provided with a slope and composed of the core and the clad. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：为了提供可以实现高密度安装或小型化的光路转换部件的制造方法，有利于安装具有低耦合损耗的光电元件，并且由此可应用于光电复合材料衬底，并提供光路转换组件和使用其的多层光电复合衬底。解决方案：在光电复合衬底中，按顺序堆叠第一衬底，具有芯和包层的光布线层，以及形成有通孔的第二衬底，安装在表面上的光电转换元件的第二基板。包括芯和包层的光波导是具有其中芯和包层以多层堆叠的结构的多层光布线。光电复合基板的特征在于，在多层波导中传播的光信号在嵌入在光波导的通孔中的90°光路转换部件中传输，该光波导设置有斜面并由芯和包裹。版权所有（C）2008，JPO＆INPIT

12. 发明专利

JP2007148455A Optical waveguide 有权
标题翻译：光波导
公开(公告)号：JP2007148455A
公开(公告)日：2007-06-14
申请号：JP2007066058
申请日：2007-03-15
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： ISHIZAKI MAMORU , HARA HATSUNE , SASAKI ATSUSHI , INOUE SHINICHI , TSUKAMOTO TAKETO
IPC分类号： G02B6/122 , G02B6/13
摘要： PROBLEM TO BE SOLVED: To provide an inexpensive optical waveguide with high use efficiency of a core material and a method for manufacturing the waveguide. SOLUTION: The method for manufacturing the optical waveguide comprises a step of forming a first clad (2) by applying a resin on a substrate (20) and curing the resin, a step of interposing a core material (1') between a recessed mold (10) which has a recess having a shape identical to a shape of the core, and the first clad on the substrate, a step of curing the interposed core material and forming a core pattern (1) having a shape corresponding to the recess on the first clad, and a step of peeling the recessed mold (10) from the core pattern and the first clad. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种芯材的高使用效率的便宜的光波导和制造该波导的方法。解决方案：制造光波导的方法包括通过在基板（20）上施加树脂并固化树脂来形成第一包层（2）的步骤，将芯材（1'）介于具有与芯的形状相同形状的凹部和基板上的第一包层的凹部模具（10），固化插入的芯材的步骤，形成具有对应于所述芯部的形状的芯图案（1）第一包层上的凹部，以及从芯图案和第一包层剥离凹模（10）的步骤。版权所有（C）2007，JPO＆INPIT

13. 发明专利

JP2006154231A Phase shift mask 审中-公开
标题翻译：相位移屏蔽
公开(公告)号：JP2006154231A
公开(公告)日：2006-06-15
申请号：JP2004344093
申请日：2004-11-29
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： SASAKI ATSUSHI , KONISHI TOSHIO , KOJIMA YOSUKE , TANAKA KEIJI , OTAKI MASAO
IPC分类号： G03F1/29 , G03F1/34 , G03F1/36 , G03F1/68 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To improve a phase shift effect of a phase shift mask when a substrate is irradiated with light through a shift mask and to obtain a transferred image with high resolution.
SOLUTION: The phase shift mask 1 as one embodiment of this invention includes: a main pattern to form a pattern in an object of exposure; an unresolved peripheral pattern which covers the main pattern when observed in the irradiation direction of exposure light and which inverts the phase of exposure light with respect to the main pattern; and an unresolved auxiliary pattern which is placed in a position separated from the main pattern when observed in the irradiation direction of exposure light and opposing to the main pattern at a corner but not opposing to the main pattern on a side line and which gives nearly the same phase of the exposure light as in the main pattern.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提高通过移位掩模用光照射基板时的相移掩模的相移效果，并获得高分辨率的转印图像。解决方案：作为本发明的一个实施例的相移掩模1包括：形成曝光对象中的图案的主图案; 当在曝光光的照射方向上观察时覆盖主图案并使相对于主图案的曝光光的相位反转的未解决的周边图案; 以及未被解决的辅助图案，其被放置在与曝光光的照射方向观察时与主图案分离的位置，并且在一个角部处与主图案相对而不与主图案相对侧，并且几乎与主图案相同的曝光灯相位。版权所有（C）2006，JPO＆NCIPI

14. 发明专利

JP2005017488A Method for manufacturing phase shift mask, phase shift mask, and method for transferring pattern 审中-公开
标题翻译：用于制造相移片掩模的方法，相移片掩模和用于传送图案的方法
公开(公告)号：JP2005017488A
公开(公告)日：2005-01-20
申请号：JP2003179613
申请日：2003-06-24
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： FURUMIZO TORU , CHIBA KAZUAKI , MORITA MOTOHIKO , TAKAHASHI HIROYUKI , KONISHI TOSHIO , SASAKI ATSUSHI , YOSHII TAKASHI
IPC分类号： G03F1/29 , G03F1/32 , G03F1/36 , G03F1/68 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a phase shift mask for preventing the occurrence of a concave defect in a light transmitting part in the main pattern or in an auxiliary pattern by forming the main pattern and the auxiliary pattern in separated processes, to provide a phase shift mask, and to provide a method for transferring a pattern by using the phase shift mask.
SOLUTION: First, a main pattern 51a comprising an engraved transparent substrate 11 is formed in a phase shift mask blank 10 having a halftone phase shift film 21 consisting of MoSi or the like and a light shielding film 31 comprising a chromium film on a transparent substrate 11 such as a quartz substrate. Further, an auxiliary pattern 61 is formed, a halftone phase shift region 21a and a light shielding region 31 are formed to obtain the phase shift mask 100.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：提供一种制造用于通过将主图案和辅助图案形成在主图案或辅助图案中的光透射部分中发生凹陷缺陷的相移掩模的制造方法提供相移掩模，并提供通过使用相移掩模传送图案的方法。解决方案：首先，将具有雕刻的透明基板11的主图案51a形成在具有由MoSi等构成的半色调相移膜21的相移掩模板10和包含铬膜的遮光膜31上透明基板11，例如石英基板。此外，形成辅助图案61，形成半色调相移区域21a和遮光区域31以获得相移掩模100.版权所有（C）2005，JPO＆NCIPI

15. 发明专利

JP2004062487A Electronic lottery system using non-contact ic tag 有权
公开(公告)号：JP2004062487A
公开(公告)日：2004-02-26
申请号：JP2002219230
申请日：2002-07-29
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： IMAI TAKAYUKI , OGURA YOSHIHIRO , SASAKI ATSUSHI , NAGAYOSHI HISATO
IPC分类号： B42D15/10 , G06K17/00 , G06K19/00 , G06K19/07 , G07C15/00
摘要： PROBLEM TO BE SOLVED: To provide an electronic lottery system which is low in cost and hardly causes an unfair means. SOLUTION: The electronic lottery system is provided with an antenna for receiving and transmitting a signal and a circuit, which receives a question signal from a reader and transmits a responding response signal to the reader. The above system comprises a step, in which a noncontact IC tag, to which a lottery symbol showing the kind which the lottery belongs to is recorded, is prepared; a step in which the reader transmits the question signal to the noncontact IC tag; a step in which the reader receives the response signal, including the lottery symbol from the noncontact IC tag; a step in which the reader transmits a participation signal, informing a server of the participation to the lottery via an telecommunication circuit; and a step, in which the sever transmits an inherent symbol in the lottery symbols to the reader to the participation signal. COPYRIGHT: (C)2004,JPO

16. 发明专利

JP2003021742A Method for manufacturing polymer optical film and polymer optical film 有权
标题翻译：制造聚合物光学膜和聚合物光学膜的方法
公开(公告)号：JP2003021742A
公开(公告)日：2003-01-24
申请号：JP2001206119
申请日：2001-07-06
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： ISHIZAKI MAMORU , YOTSUI KENTA , TSUKAMOTO TAKETO , SASAKI ATSUSHI , HARA HATSUNE
IPC分类号： G02B6/13 , B29C41/12 , B29K77/00 , B29L7/00 , G02B6/12
摘要： PROBLEM TO BE SOLVED: To relax residual stress without making a polymer optical film undergo abnormal deformation as the first subject and to secondly provide the polymer optical film having no abnormal deformation and little residual stress as the second subject. SOLUTION: The method for manufacturing the polymer optical film includes at least a step to apply a raw material of the polymer optical film on a substrate, a step to obtain the polymer optical film by heat treatment, a step to release the polymer optical film from the substrate and a step to subject the polymer optical film to heat treatment at a temperature not higher than the glass transition temperature of the polymer optical film and not lower than the tilt increasing temperature detected with thermomechanical measurement. In addition, the requisites for the polymer optical film include a fluorinated polyimide. These kinds of heat treatment steps enable the polymer optical film to relax stress and to uniformly shrink.
摘要翻译：要解决的问题：为了在不使聚合物光学膜作为第一被摄体发生异常变形的情况下使残余应力弛豫，其次提供作为第二被摄体的没有异常变形和很小残留应力的聚合物光学膜。解决方案：聚合物光学薄膜的制造方法至少包括在基板上涂布聚合物光学薄膜的原料的步骤，通过热处理获得聚合物光学薄膜的步骤，将聚合物光学薄膜从基板和使聚合物光学膜在不高于聚合物光学膜的玻璃化转变温度的温度下进行热处理的步骤，并且不低于用热机械测量检测到的倾斜增加温度。此外，聚合物光学膜的必要条件包括氟化聚酰亚胺。这些热处理步骤使得聚合物光学膜能够缓和应力并均匀收缩。

17. 发明专利

JP2007079101A Phase shift mask, and method for manufacturing semiconductor integrated circuit 有权
标题翻译：相移屏蔽及制造半导体集成电路的方法
公开(公告)号：JP2007079101A
公开(公告)日：2007-03-29
申请号：JP2005266573
申请日：2005-09-14
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： SASAKI ATSUSHI , KONISHI TOSHIO
IPC分类号： G03F1/29 , G03F1/30 , G03F1/36 , G03F1/68 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain a transfer image with high resolution by enhancing a phase shift effect of a phase shift mask in irradiating a substrate with light via the phase shift mask.
SOLUTION: The phase shift mask is equipped with: a rectangular main pattern 4 to form a pattern on an object to be exposed; a rectangular correction pattern 6 which is separated from the main pattern 4 and is arranged in the vicinity of corners of the main pattern when seen from a direction of irradiation of exposure light; and a peripheral pattern 5 which surrounds the main pattern 4 and the correction pattern 6, between which and the main pattern phases of the exposure light are approximately inverted with respect to each other, and with which no image is resolved when seen from a direction of irradiation of the exposure light, wherein the correction pattern 6 is characterized by being arranged on a position where a straight line bisecting a corner angle of the main pattern 4 is vertical to an edge of the correction pattern and passes through a center of the edge, and being an auxiliary pattern between which and the main pattern 4 phases of the exposure light are approximately identical to each other, and with which no image is resolved.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了通过增强通过相移掩模用光照射衬底的相移掩模的相移效应来获得高分辨率的转印图像。解决方案：相移掩模配备有：矩形主图案4，以在待曝光的物体上形成图案; 矩形校正图案6，其从主图案4分离并且当从曝光光的照射方向观察时布置在主图案的角部附近; 以及周围图案5，其围绕主图案4和校正图案6，其与曝光光的主图案相位之间相对于彼此大致相反，并且当从图案4的方向照射曝光光，其中校正图案6的特征在于布置在将主图案4的角角平分的直线与校正图案的边缘垂直并穿过边缘的中心的位置处，并且作为辅助图案，其与曝光光的主图案4相位彼此大致相同，并且没有图像被解析。版权所有（C）2007，JPO＆INPIT

18. 发明专利

JP2005084287A Method for manufacturing phase shift mask, phase shift mask and method for manufacturing semiconductor device 有权
标题翻译：用于制造相移片掩模的方法，相移片掩模和制造半导体器件的方法
公开(公告)号：JP2005084287A
公开(公告)日：2005-03-31
申请号：JP2003315097
申请日：2003-09-08
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： KONISHI TOSHIO , SASAKI ATSUSHI , KOJIMA YOSUKE , TANAKA KEIJI
IPC分类号： G03F1/30 , G03F1/36 , G03F1/68 , G03F1/80 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide a photomask and its manufacturing method to obtain a desired pattern with various pitches even when an out-of-focus state is caused, and to provide a method for manufacturing a semiconductor device using the photomask.
SOLUTION: The phase shift mask has a mask pattern obtained in at least steps of: calculating π-0 CD (critical dimension) difference distribution for the initial pattern data; determining a temporary mask structure when a plurality of kinds of pitches are present; calculating the resist CD for the pitch of the temporarily determined structural type; correcting the pattern data on a phase shift mask so as to obtain a desired resist CD on a wafer when the pitch is changed; calculating the π-0 CD difference distribution in the corrected pattern data, determining the structural type, and calculating the phase difference to allow the π-0 CD difference for the defocus quantity in the determined structure to be within the allowance. A method for manufacturing a semiconductor device by using the obtained photomask is also presented.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：即使当引起失焦状态时，提供光掩模及其制造方法以获得具有各种间距的期望图案，并且提供一种使用光掩模制造半导体器件的方法。解决方案：相移掩模具有至少以下步骤获得的掩模图案：计算初始图案数据的π-0CD（临界尺寸）差分布; 当存在多种间距时确定临时掩模结构; 计算暂时确定的结构类型的间距的抗蚀剂CD; 在相移掩模上校正图案数据，以便当间距改变时在晶片上获得期望的抗蚀剂CD; 计算校正图案数据中的π-0CD差分布，确定结构类型，并计算相位差，以使确定结构中的散焦量的π-0CD差异在允许范围内。还提出了通过使用所获得的光掩模来制造半导体器件的方法。版权所有（C）2005，JPO＆NCIPI

19. 发明专利

JP2004114247A Method of manufacturing fine pattern, mold used for the same, and pulling tool 有权
公开(公告)号：JP2004114247A
公开(公告)日：2004-04-15
申请号：JP2002282573
申请日：2002-09-27
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： ISHIZAKI MAMORU , TSUKAMOTO TAKETO , SASAKI ATSUSHI , HARA HATSUNE
IPC分类号： G02B6/13 , B81C99/00 , B81C5/00
摘要： PROBLEM TO BE SOLVED: To provide a method of simply and highly accurately manufacturing a fine pattern, a mold used for the same, and a pulling tool. SOLUTION: In the method of manufacturing the fine pattern such as a core or the mold of the core of an optical waveguide for performing transfer printing using such a mold having a catch part on edge for example, such as the pattern of a structure of roughly flat plate and of the fine pattern, having a protruded part and a recessed part, by applying external force in a pulling direction on the mold, the fine pattern is manufactured performing the transfer printing for the situation of adjusting the mold dimensions or the like. COPYRIGHT: (C)2004,JPO

20. 发明专利

JP2004094070A Optical path converting parts and optical surface mounted waveguide using the parts 审中-公开
公开(公告)号：JP2004094070A
公开(公告)日：2004-03-25
申请号：JP2002257383
申请日：2002-09-03
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： SASAKI ATSUSHI , ISHIZAKI MAMORU , TSUKAMOTO TAKETO
IPC分类号： G02B6/26 , G02B6/122
摘要： PROBLEM TO BE SOLVED: To provide optical path converting parts, in which high density packaging and reduction in the size are achieved, packaging of an optoelectronic element is easily conducted with low coupling loss and reliability is made high, and to provide an optical surface mounted waveguide using the parts. SOLUTION: A core 3 of the transmission path of the optical path converting part has a light beam incident port 5, a light emitting port 6 and a reflection surface 4. The portions excluding the ports 5 and 6 and the surface 4 are covered by clad 2 having a refractive index lower than that of the core 3. An optical path of light beams is converted to have a prescribed angle using reflection at the surface 4. The refractive indexes of the core of the transmission path and the clad are matched with the refractive indexes of the core of the optical wavegudie and the clad. Hole spaces 47 are formed at prescribed positions of the optical waveguide, the optical path converting part is buried and an optoelectronic element is packaged on the top section. COPYRIGHT: (C)2004,JPO

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