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11. 发明专利

JPS5770662A Manufacture of laminated decorative board and decorative sheet used for said method 失效
标题翻译：层压装饰板的制造和用于上述方法的装饰板
公开(公告)号：JPS5770662A
公开(公告)日：1982-05-01
申请号：JP14784080
申请日：1980-10-21
申请人： Toppan Printing Co Ltd
发明人： TOIDA TAKESHI , MIHASHI NOBORU
IPC分类号： B32B3/30 , B29C63/00 , B32B21/08 , B32B33/00 , B32B37/00

12. 发明专利

JPH09274323A PATTERN EXPOSING METHOD 失效
公开(公告)号：JPH09274323A
公开(公告)日：1997-10-21
申请号：JP8269596
申请日：1996-04-04
申请人： TOPPAN PRINTING CO LTD
发明人： MIHASHI NOBORU , SUGIURA TAKEO , KUMAMOTO YUICHI , FUKUDA YOICHIRO
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To form a pattern with high efficiency by forming the pattern by means of pattern exposure in a consecutive irradiation state while consecutively feeding a film-like base material where photosensitive resist film is formed. SOLUTION: The base material 1 is fed from a feeding reel at fixed speed and opposed to a mask for exposure 8 at an exposure part. An endless belt 9 is set just above the mask 8 and moves strictly synchronizing with the carrying speed and direction and the parallelism of the base material 1. The belt 9 is made of a metallic thin plate having peripheral length equal to the repetitive cycle of the mask pattern or the integral multiple thereof, and the pattern part is an aperture part in a state where only the outline part of a stripe pattern to be formed is left. A light source 10 and a reflection mirror 15 are positioned in space inside the belt 9, and ultraviolet light is consecutively generated. The coloring stripe pattern is exposed on the resist film of the base material 1 at the exposure part.

13. 发明专利

JPH0862595A PRODUCTION OF ELECTRODE SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE 失效
公开(公告)号：JPH0862595A
公开(公告)日：1996-03-08
申请号：JP20183294
申请日：1994-08-26
申请人： TOPPAN PRINTING CO LTD
发明人： MIHASHI NOBORU
IPC分类号： G02F1/1335 , G02F1/136 , G02F1/1368
摘要： PURPOSE: To eliminate the trouble of transfer at the time of transferring color filters on a transfer sheet to a TFT forming side electrode substrate by making combination use of a heating stage in addition to irradiation with UV rays. CONSTITUTION: A release layer 2 is formed on a base body sheet 1 and color filter layers 3 are successively formed thereon from above. The transfer sheet formed in such a manner is brought into pressurized contact with a glass substrate 4 formed with TFT circuits 5 in alignment thereto by oppositing the color filter forming surface side of the transfer sheet to the surface coated with a UV curing type adhesive layer 6. In addition, the sheet is irradiated with the UV rays from the TFT non-forming surface side of the electrode substrate and is heated on a hot plate. Curing is accelerated and the parts which are heretofore shaded by gate lines, etc., are completely cured as well by making combination use of the heating stage in addition to the irradiation with the UV rays. Even the non-apertures which are not irradiated with the UV rays are completely and tightly contacted and the good transfer state is obtd. and, therefore, the yield in production of the liquid crystal display device is improved and the efficient production of the device is made possible.

14. 发明专利

JPH07301707A TRANSFER SHEET AND PRODUCTION OF COLOR FILTER USING THE SAME 失效
公开(公告)号：JPH07301707A
公开(公告)日：1995-11-14
申请号：JP9522294
申请日：1994-05-09
申请人： TOPPAN PRINTING CO LTD
发明人： NAKAYAMA NAOMI , MIHASHI NOBORU , SUDA HIRONOBU
IPC分类号： G03F7/004 , G02B5/20 , G02F1/1335
摘要： PURPOSE:To obtain a transfer sheet with which a color filter layer of high accuracy comprising plural numbers of color layers can be transferred to a substrate at one time to easily produce a color filter, and to obtain the production method of a color filter using this sheet. CONSTITUTION:The transfer sheet 10 consists of a supporting sheet 1 comprising a nickel-iron alloy, release layer 2 comprising a photosetting water-soluble resin compsn., and color filter layer 4 on the release layer 2. This sheet 10 is used to transfer the color filter layer 4 with an adhesive layer 6 to a substrate 20 to be treated.

15. 发明专利

JPH07301706A TRANSFER SHEET FOR COLOR FILTER 失效
公开(公告)号：JPH07301706A
公开(公告)日：1995-11-14
申请号：JP11473294
申请日：1994-04-28
申请人： TOPPAN PRINTING CO LTD
发明人： MIHASHI NOBORU , SUDA HIRONOBU
IPC分类号： G02B5/20
摘要： PURPOSE:To obtain a transfer sheet with which a color filter layer comprising plural numbers of color layers can be transferred to a substrate at one time to easily produce a color filter, and to obtain a lightweight transfer sheet for color filter which can be rolled and does not produce defects in pixels during transfer. CONSTITUTION:The transfer sheet consists of a supporting sheet 1, release layer 2 comprising a photosetting polyvinyl alcohol, and color filter layer 4 having plural color layers 3R, 3G, 3B two-dimensionally arranged. Further, the sheet is coated with a protective sheet 5.

16. 发明专利

JPS6049427B2 失效
公开(公告)号：JPS6049427B2
公开(公告)日：1985-11-01
申请号：JP14784080
申请日：1980-10-21
申请人： TOPPAN PRINTING CO LTD
发明人： TOIDA TAKESHI , MIHASHI NOBORU
IPC分类号： B32B3/30 , B29C63/00 , B32B21/08 , B32B33/00 , B32B37/00

17. 发明专利

JPS5464A PRODUCTION OF DECORATIVE MATERIAL WITH UNEVEN PATTERN 失效
公开(公告)号：JPS5464A
公开(公告)日：1979-01-05
申请号：JP6550277
申请日：1977-06-03
申请人： TOPPAN PRINTING CO LTD
发明人： MIHASHI NOBORU
IPC分类号： B44C1/20 , B29C44/00 , B32B33/00
摘要： PURPOSE:Depressed parts of a base formed by embossing are filled with a foaming resin composition which is then foamed to produce said decorative material with pattern of large uneveness in high and low difference.

18. 发明专利

JPH11167211A PATTERN FORMING BODY 失效
公开(公告)号：JPH11167211A
公开(公告)日：1999-06-22
申请号：JP33613997
申请日：1997-12-05
申请人： TOPPAN PRINTING CO LTD
发明人： ABE TAKAHIKO , MIHASHI NOBORU
IPC分类号： G02F1/1335 , G03F9/00
摘要： PROBLEM TO BE SOLVED: To easily detect the amount of misalignment with the pattern of a photomask and to prevent a defective due to misalignment from being produced by providing plural pattern alignment marks in the long side direction or the diagonal direction of a rectangular substrate. SOLUTION: Relating to this large-sized pattern forming body 1; at least two pattern alignment marks 3 and 4 are formed as marks for aligning the first pattern already formed on the rectangular substrate and the second pattern to be formed next, that is, the pattern of the photomask in the long side direction or the diagnoal direction of the rectangular substrate. Thus, the mutual misalignment between the patterns of the respective photomasks on the rectangular substrate is easily detected, so that the forming body 1 preventing the defective due to the misalignment from being produced at the time of starting production or in the midst of production is obtained. It is the forming body 1 that the delay of measures to specify a cause in a producing device which causes the misalignment is prevented.

19. 发明专利

JPH11143090A IMAGE FORMING METHOD 失效
公开(公告)号：JPH11143090A
公开(公告)日：1999-05-28
申请号：JP30888797
申请日：1997-11-11
申请人： TOPPAN PRINTING CO LTD
发明人： ABE TAKAHIKO , MIHASHI NOBORU
IPC分类号： G02B5/20 , G03F7/30 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an image forming method by which all of a photoresist left at corner parts on a substrate is removed. SOLUTION: Before the development of a photoresist 2 on a substrate 1, the photoresist 2 at corner parts on the substrate is dissolved with a photoresist removing device 21 and then the photoresist 2 on the substrate 1 is developed.

20. 发明专利

JPH1010745A PATTERN EXPOSURE METHOD 失效
公开(公告)号：JPH1010745A
公开(公告)日：1998-01-16
申请号：JP15798896
申请日：1996-06-19
申请人： TOPPAN PRINTING CO LTD
发明人： MIHASHI NOBORU , KUMAMOTO YUICHI , SUGIURA TAKEO , FUKUDA YOICHIRO
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To form stripe patterns of shapes divided into discrete parts with high efficiency by using an endless belt of a shape formed with the inside of pattern parts remaining only the external shape parts of the stripe patterns to be formed as apertures. SOLUTION: The light shieldable endless belt 9 formed with the pattern parts remaining only the external shape parts of the stripe patterns to be formed as apertures is installed right above a mask 8 for exposure. This belt is moved in strict synchronization with the transporting speed, direction and parallelism of a base material 1. The base material 1 under transportation is irradiated with the irradiation light from a light source 10 in the state of strictly synchronizing such endless belt 9 and the base material 1. The irradiation light from the parts where both of the striped patterns of the mask 8 for exposure and the external shapes of the patterns of the endless belt 9 arrives at the base material surface. As a result, the striped patterns divided into discrete parts are formed brightly with high accuracy without the occurrence of unsharpness at the boundaries.

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