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    • 12. 发明专利
    • MASKING METHOD FOR CHEMICAL GAS PHASE VAPOR DEPOSITION
    • JPH11269646A
    • 1999-10-05
    • JP9074298
    • 1998-03-18
    • KAWASAKI HEAVY IND LTD
    • SUEMITSU TAKESHINISHIO KOJITAKEHARA TAKESHI
    • F01D9/04C04B41/87C23C16/04
    • PROBLEM TO BE SOLVED: To avoid a space formed between the work and a jig due to difference in the coefft. of thermal expansion and to easily obtain an enough shielding effect by using a masking jig having an almost same coefft. of thermal expansion as that of the work to mask a part where formation of a film is not required, and forming a film only in a required part of the work. SOLUTION: For example, relating to a fiber joined part 26 having a structure of assembly of Si3 N4 divided members 20 on which a SiC fiber 22 is wound, a coating by CVD is necessary on the fiber joined part to prevent the SiC fiber 22 from loosening and to improve oxidation resistance. Relating to a part except the fiber joined part 26 it is required to be shield against CVD so as to prevent cracks or the like due to difference in the coefft. of thermal expansion between the divided members 20 and the CVD film. Therefore, a masking jig 28 comprising isotropic graphite having an almost same coefft. of thermal expansion as that of the divided members 20 (SiC) which constitute the joined part 24 is used to shield the part except the fiber joined part 26, and a SiC film is formed by CVD only in the fiber joined part 26.