专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明专利

JP2005126182A Low step roll film 审中-公开
标题翻译： LOW STEP ROLL FILM
公开(公告)号：JP2005126182A
公开(公告)日：2005-05-19
申请号：JP2003362737
申请日：2003-10-23
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： FURUBAYASHI HIROMI , YAMAZAKI HIROSHI , TANAKA HIROYUKI , YAMADA NAOKI , OHARA MASAHARU
IPC分类号： B65H75/00
摘要： PROBLEM TO BE SOLVED: To provide a roll article of a dry film capable of reducing the step due to a resin layer by reducing the step at a winding starting part on a bobbin, securing the reliability of the film thickness, enhancing the working effectiveness of a slitter, and reducing the cost of the roll article.
SOLUTION: The roll film is structured so that a first film is coated with the resin layer and furthermore a second film is laminated, in which the ends of the two films are deviated from each other in the winding staring part when winding is made on the bobbin to fabricate the roll film. This permits reducing the step due to the resin layer.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供能够通过减小线轴上的卷绕起始部分的台阶来减少由树脂层引起的台阶的干膜的膜制品，确保膜厚度的可靠性，增强了分切机的工作效率，降低卷筒成本。解决方案：辊膜被构造成使得第一膜被树脂层涂覆，此外，层叠第二膜，其中两个膜的端部在卷绕期间彼此偏离，当卷绕是在筒管上制造卷膜。这允许减少由树脂层引起的台阶。版权所有（C）2005，JPO＆NCIPI

12. 发明专利

JP2005077624A Photosensitive element, dielectric pattern, and method for producing the dielectric pattern 审中-公开
标题翻译：感光元件，电介质图案，以及制造电介质图案的方法
公开(公告)号：JP2005077624A
公开(公告)日：2005-03-24
申请号：JP2003306686
申请日：2003-08-29
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： TANAKA HIROYUKI , YAMADA NAOKI , OHARA MASAHARU , YAMAZAKI HIROSHI
IPC分类号： G03F7/027 , G03F7/004 , G03F7/40 , H01J9/02 , H01J11/22 , H01J11/34 , H01J11/38 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive element having superior adhesion to a substrate and capable of forming a dielectric layer of a high-precision uniform pattern shape at a high yield rate.
SOLUTION: The photosensitive element has on a support film a photosensitive resin composition layer containing (a) dielectric glass frit, (b) an alkali-soluble resin, (c) a photopolymerizable unsaturated monomer and (d) a photopolymerization initiator, wherein an ethylenically unsaturated monomer having a molecular weight of 100-3,000 and having three or more ethylenically unsaturated groups and one or more hydroxyl groups is contained as the photopolymerizable unsaturated monomer (c), in an amount ≥50 mass%, based on the total mass of the photopolymerizable unsaturated monomer.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种对基片具有优异粘附性的光敏元件，能够以高产率形成高精度均一图案形状的电介质层。光敏元件在支撑膜上具有含有（a）电介质玻璃料，（b）碱溶性树脂，（c）可光聚合不饱和单体和（d）光聚合引发剂）的光敏树脂组合物层，作为光聚合性不饱和单体（c），含有分子量为100〜3000，具有3个以上烯键式不饱和基团和1个以上羟基的烯键式不饱和单体，以总量为基准计，≥50质量％质量的光聚合性不饱和单体。版权所有（C）2005，JPO＆NCIPI

13. 发明专利

JP2003315509A Photosensitive resin composition for formation of diffusion reflective base layer and method for manufacturing diffusion reflector by using the same 有权
标题翻译：用于形成扩散反射层的感光性树脂组合物及其使用制造扩散反射器的方法
公开(公告)号：JP2003315509A
公开(公告)日：2003-11-06
申请号：JP2002122698
申请日：2002-04-24
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： MUKAI IKUO , OHARA MASAHARU , YAMAZAKI HIROSHI
IPC分类号： G02B5/02 , G02B5/08 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for the formation of a diffusion reflective base layer having high adhesiveness with a substrate even in a high temperature and high humidity environment, giving excellent reliability as a liquid crystal display device and having high transfer property of the photosensitive resin layer to a transfer substrate with high yield, and to provide a method for manufacturing a diffusion reflector for a reflection type liquid crystal display device by using the above composition. SOLUTION: In the photosensitive element for the formation of a diffusion reflective base layer by depositing a layer of a photosensitive resin composition on a rugged surface of a temporary supporting body having a rugged pattern, the photosensitive resin composition for the formation of a diffusion reflective base layer contains: (I) an unsaturated group-containing acrylic polymer (c) having 0.5 to 1.5 unsaturated groups per 1,000 molecular weight obtained by the reaction of (a) an acrylic resin obtained from methacrylic acid and 5 to 25 wt% of alkylacrylate as the essential component for the copolymer component and (b) a compound having an epoxy group and an unsaturated bond in the molecule; (II) a photopolymerizable compound having at least two ethylenic unsaturated groups; and (III) a photopolymerization initiator. COPYRIGHT: (C)2004,JPO
摘要翻译：解决的问题：即使在高温高湿环境下，也可以提供用于形成与基板粘接性高的扩散反射基层的感光性树脂组合物，作为液晶显示装置具有优异的可靠性，并具有以高收率将感光性树脂层的高转印性能转印到转印基板上，并且提供通过使用上述组成制造用于反射型液晶显示装置的漫反射器的方法。解决方案：在通过在具有凹凸图案的临时支撑体的凹凸表面上沉积感光性树脂组合物层而形成漫反射基底层的感光元件中，形成扩散反射基层包含：（I）通过（a）由甲基丙烯酸获得的丙烯酸树脂和5至25重量％的反应获得的每1,000分子量具有0.5至1.5个不饱和基团的不饱和基团的丙烯酸类聚合物（c）的丙烯酸烷基酯作为共聚物组分的主要组分，和（b）分子中具有环氧基和不饱和键的化合物; （II）具有至少两个烯属不饱和基团的光聚合化合物; 和（III）光聚合引发剂。版权所有（C）2004，JPO

14. 发明专利

JP2003015283A Photosensitive element for forming diffuse reflection underlayer and method for manufacturing diffuse reflection plate using the same 审中-公开
标题翻译：用于形成折射率反射层的感光元件和使用其制造折射板的方法
公开(公告)号：JP2003015283A
公开(公告)日：2003-01-15
申请号：JP2001196316
申请日：2001-06-28
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： MUKAI IKUO , TANAKA HIROYUKI , FURUBAYASHI HIROMI , OHARA MASAHARU , YAMAZAKI HIROSHI
IPC分类号： G03F7/004 , C08F290/12 , G02F1/1335 , G03F7/038 , G03F7/09 , G03F7/34
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive element for forming a diffuse reflection underlayer used for manufacturing a diffuse reflection plate free of partial peeling of a metallic thin film and excellent in adhesion of a diffuse reflection underlayer to a substrate at high temperature and high humidity in a good yield. SOLUTION: In the photosensitive element for forming a diffuse reflection underlayer obtained by disposing a layer of a photosensitive resin composition on the rugged surface of a temporary support, the photosensitive resin composition contains (I) an unsaturated group-containing acrylic polymer (c) obtained by reacting an acrylic resin (a) having carboxyl groups with a compound (b) having both an alicyclic epoxy group and an unsaturated bond in one molecule, (II) a photopolymerizable compound having at least two ethylenically unsaturated groups and (III) a photopolymerization initiator.
摘要翻译：要解决的问题：提供用于形成漫反射底层的光敏元件，用于制造不含金属薄膜的部分剥离的漫反射板，并且在高温高湿下具有优异的漫反射底层与基板的粘附性收益良好。解决方案：在用于形成通过在临时支撑体的凹凸表面上设置感光性树脂组合物层而获得的漫反射底层的感光元件中，感光性树脂组合物含有（I）得到的含不饱和基团的丙烯酸类聚合物（c）通过在一分子中使具有羧基的丙烯酸树脂（a）与具有脂环族环氧基和不饱和键的化合物（b）反应，（II）具有至少两个烯属不饱和基团的光聚合性化合物和（III）光聚合发起人

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式