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    • 16. 发明专利
    • METHOD AND APPARATUS FOR PATTERN TRANSFER
    • JPH0351703A
    • 1991-03-06
    • JP18463289
    • 1989-07-19
    • HITACHI LTD
    • KATAGIRI SOUICHITERASAWA TSUNEOKATAOKA KEIJI
    • G01B11/00G03F7/20G03F9/00H01L21/027H01L21/30
    • PURPOSE:To align a position highly accurately by operating a liquid crystal shutter, transmitting + linear diffraction light and - linear diffraction light, quantitatively obtaining errors in mixing, correcting the errors, and eliminating the effects due to the errors in the alignment of the plane of polarization. CONSTITUTION:At first, a liquid shutter 8a as a space filter 8 is operated, and only + or - linear diffraction light beams on the side of a reticle are transmitted. A beat signal caused by the interference between two waves is detected. The phase difference between the amplitude of said signal and the reference signal of reference light 16 is obtained. Then, the shutter 8a is operated, and only + linear light or - linear light is sequentially transmitted. The phase difference between the amplitude of the light and the reference light 16 is obtained. The same procedure is performed for a wafer mark. The position alignment of a wafer 1 and a reticle 19 is performed based on the respective phase differences. In this way, the errors due to mixing can be quantitatively obtained and corrected. The errors due to the alignment of the plane of polarization are eliminated. Therefore, the highly accurate position alignment can be performed.
    • 17. 发明专利
    • OPTICAL DISK DEVICE
    • JPH01303632A
    • 1989-12-07
    • JP13269188
    • 1988-06-01
    • HITACHI LTD
    • KATAOKA KEIJIYONEZAWA SEIJITSUYOSHI TOSHIAKI
    • G02B7/28G11B7/09
    • PURPOSE:To eliminate difficulty in attaining the positioning accuracy and miniaturization of optical system by executing a side spot formation by a diffraction grating and the focusing control of an objective lens by a reflecting light intensity comparison from a side spot. CONSTITUTION:Two side spots 17a and 17c out of optical spots 17a (c) of three branching lights by a diffraction grating 16 for detecting a focus are used for focus detection. A side spot 17a is at the position of an optical disk 6 closer than a spot 17c, a signal recorded at the optical disk 6 is detected by respective light detecting elements 13a (c), and then, the modulation of a signal detected by a detecting element 13a is larger than that of the spot 17c by the side spot 17a. At this time, the position of a main spot at the intermediate position of the side spot is the one dislocated from an optical disk position. Consequently, when the modulation of the detecting signal by the side spot is made equal, the position of a main spot 17b becomes the focusing condition. Thus, the device is made small and the adjustment is facilitated.
    • 18. 发明专利
    • COHERENT CONTROL EXPOSURE DEVICE
    • JPH01287924A
    • 1989-11-20
    • JP7429388
    • 1988-03-30
    • HITACHI LTD
    • KATAOKA KEIJI
    • G02B19/00G02B27/16G03F7/20H01L21/027H01L21/30H01S3/00H01S3/101
    • PURPOSE:To make it possible to conduct a highly precise light-exposing operation in which the interferential noise caused by coherence is reduced by a method wherein a branching element is composed of a first reflection plate, consisting of the part divided by the prescribed different reflection factor, and a second reflection plate which is formed in such a manner that a light will be made incident on the split having the reflection factor different from the first reflection plate. CONSTITUTION:A branching element 16 consists of two paralleled flat plates 16-1 and 16-2, a laser beam 15 is converted to the branched light 19 which is branched into an alloy state in one-dimentional direction by the branching element 16, and the branched light 19 is made incident into a lens array 17 as an integrator. The lens array 17 forms a pupil surface 10, and a capacitor lens 8 is set in a manner that said pupil surface 10 will be image-formed on the pupil surface 10 of a projection lens 11. Also, when a mask 9 is arranged on the focus surface of the capacitor 8, all the branched lights are brought into the state wherein they illuminate the same place of the mask, a uniform illumination is obtained, and the illuminated mask pattern 13 is image-formed by the lens 11 at the position 14 on a wafer 12. As a result, a highly precise light-exposure, having reduced coherent noise caused by the coherence of the laser beam, can be obtained without mechanically scanning the laser beam.