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11. 发明专利

JP2007127698A Multilayer film reflection mirror, its regeneration method, and exposure equipment 审中-公开
标题翻译：多层膜反射镜，其再生方法和曝光设备
公开(公告)号：JP2007127698A
公开(公告)日：2007-05-24
申请号：JP2005318300
申请日：2005-11-01
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI
IPC分类号： G02B5/08 , G21K1/06 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a multilayer film reflection mirror in which a multilayer film can be removed without influencing a substrate surface upon reconstructing the multilayer film reflection mirror.
SOLUTION: The surface of a silicon substrate 2 is processed into a paraboloid form with high accuracy. A copper thin film (base layer) 1 is formed on the surface of the silicon substrate 2, and a Mo/Si multilayer film 3 is formed on the copper thin film 1. The area of the region where the Mo/Si multilayer film 3 is formed is smaller than the region where the copper thin film 1 is formed, exposing a part of the copper thin film 1 from the Mo/Si multilayer film 2. The exposed part of the copper thin film 1 is coated with a molybdenum film (base layer protective film) 4 (only partially shown in Fig 1).
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种多层膜反射镜，其中在重构多层膜反射镜时可以去除多层膜而不影响基板表面。解决方案：硅衬底2的表面以高精度被加工成抛物面形式。在硅基板2的表面上形成有铜薄膜（基底层）1，在铜薄膜1上形成有Mo / Si多层膜3，Mo / Si多层膜3 被形成的比形成铜薄膜1的区域小，使得Mo薄膜1的一部分从Mo / Si多层膜2露出。铜薄膜1的露出部分涂覆有钼膜基层保护膜）4（仅部分示于图1）。版权所有（C）2007，JPO＆INPIT

12. 发明专利

JP2007107888A Multilayer film reflector, method for manufacturing same and reduction projection exposure system 审中-公开
标题翻译：多层膜反射器，制造方法和减少投影曝光系统
公开(公告)号：JP2007107888A
公开(公告)日：2007-04-26
申请号：JP2005295897
申请日：2005-10-11
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI , SHIRAISHI MASAYUKI
IPC分类号： G21K1/06 , C23C14/06 , C23C14/14 , G02B5/26 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a multilayer film reflector which has a high-precision face contour. SOLUTION: The multilayer film reflector 2 is composed by being equipped with multilayer films 6a and 6b that have a structure made by making overlie a layer containing Mo and a layer containing Si alternately and periodically overlie the surface of a substrate 4 to form films and by removing the multilayer film 6b in proximity to the surface of the multilayer films 6a and 6b through the generation of the distribution in removal quantities in the surface. In this case, the reflector 2 has a monolayer film 6c which has the in-plane distribution that will offset the deformation caused by stress relief due to the removal of the multilayer film 6b and contains Si or Si on the surface of the multilayer film 6b where the film 6b in proximity to the surface has been removed. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有高精度面轮廓的多层膜反射器。解决方案：多层膜反射体2由具有多层膜6a，6b构成，多层膜6a，6b具有通过使含有Mo的层与包含Si的层交替地周期性地覆盖在基板4的表面上而形成的结构，以形成并且通过产生表面中的去除量的分布，去除多层膜6a和6b的表面附近的多层膜6b。在这种情况下，反射器2具有单层膜6c，其具有面内分布，其将抵消由于去除多层膜6b而引起的应力消除引起的变形，并且在多层膜6b的表面上包含Si或Si 其中靠近表面的膜6b已经被去除。版权所有（C）2007，JPO＆INPIT

13. 发明专利

JP2007093404A Multilayer film reflecting mirror and reduced-projection exposure apparatus 审中-公开
标题翻译：多层膜反光镜和减少投影曝光装置
公开(公告)号：JP2007093404A
公开(公告)日：2007-04-12
申请号：JP2005283696
申请日：2005-09-29
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI
IPC分类号： G21K1/06 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a multilayer film reflecting mirror having a high-precision facial shape.
SOLUTION: In this multilayer film reflecting mirror 2 equipped with multilayer films 6a, 6b having a structure wherein a layer including Mo and a layer including Si are formed periodically alternately on the substrate 4 surface, a distribution of removal amount is generated in the plane, and multilayer films 6c of a low-stress structure part provided near the surface of the multilayer films 6a, 6b are removed. In the reflecting mirror 2, the multilayer films 6c of the low-stress structure part has a stress absolute value of 50 MPa or lower.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有高精度面部形状的多层膜反射镜。解决方案：在具有如下结构的多层膜反射镜2的多层膜反射镜2中，其具有包含Mo的层和包含Si的层的结构在基板4表面上周期性交替地形成，在去除设置在多层膜6a，6b表面附近的低应力结构部分的平面和多层膜6c。在反射镜2中，低应力结构部的多层膜6c的应力绝对值为50MPa以下。版权所有（C）2007，JPO＆INPIT

14. 发明专利

JP2006170813A Multilayer reflection mirror, extreme ultraviolet (euv) exposure system and soft x-ray optic equipment 审中-公开
标题翻译：多层反射镜，极紫外（EUV）曝光系统和软X射线光学设备
公开(公告)号：JP2006170813A
公开(公告)日：2006-06-29
申请号：JP2004363914
申请日：2004-12-16
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI , MURAKAMI KATSUHIKO
IPC分类号： G21K1/06 , G02B5/08 , G03F7/20 , G21K5/02 , G21K7/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a multilayer reflection mirror capable of suppressing oxidation of a multilayer film formed by layering materials containing Si and Mo. SOLUTION: On a glass plate 1, Mo layers 11 and Si layers 12 are deposited alternately and the surface of the topmost layer Si layer 12 is made a hydrogen termination processing Si 13. Therefore, the topmost layer Si layer becomes hard to oxidize. When an oxidizing agent is sent for oxidizing removing contamination, the reflection film is oxidized and lowering of reflectivity is suppressed. The hydrogen termination processing of the surface of the Si layer 12 is desired to be done with hydrofluoric acid treatment. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决方案：提供能够抑制通过层压含有Si和Mo的材料形成的多层膜的氧化的多层反射镜。解决方案：在玻璃板1上，Mo层11和Si层12是交替沉积，并且最顶层Si层12的表面被制成氢终止处理Si 13。因此，最顶层Si层变得难以氧化。当氧化剂被氧化除去污染物时，反射膜被氧化并且反射率的降低被抑制。希望通过氢氟酸处理来进行Si层12的表面的氢终止处理。版权所有（C）2006，JPO＆NCIPI

15. 发明专利

JP2012144751A Film deposition apparatus, and film deposition method 审中-公开
标题翻译：薄膜沉积装置和薄膜沉积方法
公开(公告)号：JP2012144751A
公开(公告)日：2012-08-02
申请号：JP2011001500
申请日：2011-01-06
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI
IPC分类号： C23C14/34 , C23C14/06
摘要： PROBLEM TO BE SOLVED: To deposit a thin film on a substrate while preventing interface diffusion.SOLUTION: The film deposition apparatus deposits the thin film on the substrate and includes: a discharge unit for discharging, to the substrate, sputter particles that configures the thin film; a charging unit for electrically charging at least some of the sputter particles thus discharged; and an adjusting unit for adjusting the amount of kinetic energy of the electrically charged sputter particles that reach the substrate.
摘要翻译：要解决的问题：在衬底上沉积薄膜，同时防止界面扩散。解决方案：成膜装置将薄膜沉积在基板上，并包括：放电单元，用于将构成薄膜的溅射颗粒排放到基板; 充电单元，用于对由此排出的至少一些溅射颗粒进行充电; 以及用于调节到达衬底的带电溅射颗粒的动能量的调节单元。版权所有（C）2012，JPO＆INPIT

16. 发明专利

JP2010199503A Optical element, exposure apparatus, and device manufacturing method 审中-公开
标题翻译：光学元件，曝光装置和装置制造方法
公开(公告)号：JP2010199503A
公开(公告)日：2010-09-09
申请号：JP2009045797
申请日：2009-02-27
申请人： Nikon Corp , 株式会社ニコン
发明人： KOMIYA TAKEHARU , KAMITAKA NORIAKI , TOMOFUJI TETSUYA
IPC分类号： H01L21/027 , G03F7/20 , G21K1/06 , H05G2/00
CPC分类号： G02B5/0891 , G02B5/0816
摘要： PROBLEM TO BE SOLVED: To provide an optical element capable of keeping throughput excellent, to provide an exposure apparatus, and to provide a device manufacturing method using the optical element and the exposure apparatus.
SOLUTION: The optical element includes: a substrate; and a multilayer film in which a plurality of layers are laminated on the substrate so that the ratio of layer thicknesses of each layer becomes constant, and which has a reflection region for reflecting exposure light including at least one of extreme ultraviolet rays and soft X-rays, and in which the distribution of the layer thicknesses is formed in the reflection region in accordance with the distribution of angles of incidence of the exposure light reflected on the reflection region.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供能够保持生产率优异的光学元件，提供曝光装置，并提供使用该光学元件和曝光装置的装置制造方法。光学元件包括：基板; 以及多层膜，其中多个层被层压在基板上，使得各层的层厚比例变得恒定，并且具有用于反射包括至少一种极紫外线和软X-射线的曝光的反射区域，根据在反射区域上反射的曝光光的入射角分布，在反射区域中形成层厚分布。版权所有（C）2010，JPO＆INPIT

17. 发明专利

JP2007101349A Multilayer mirror, its reproducing method and exposure system 审中-公开
标题翻译：多层镜，其复制方法和曝光系统
公开(公告)号：JP2007101349A
公开(公告)日：2007-04-19
申请号：JP2005291177
申请日：2005-10-04
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI
IPC分类号： G21K1/06 , G21K5/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a multilayer mirror having a peel ply consisting of a material with small surface roughness at the time of film formation, on a substrate and not lowering its reflectivity compared with a case without the peel ply. SOLUTION: The multilayer mirror of this invention is constituted of multilayered film which keeps layer pairs (4) consisting of two layers with different refractive indexes overlying a substrate (1). The substrate and the layer pairs are interleaved with a single layer film (3) consisting of a material including molybdenum is formed so that the a part of the single layer film is not covered with the layer pair. As an implementation of this invention, the single layer film and the substrate is interleaved with a film (2) consisting of silicon-dioxide. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种多层反射镜，其具有在成膜时具有小的表面粗糙度的材料的剥离层，在不具有剥离层的情况下，在基板上并且不降低其反射率。解决方案：本发明的多层反射镜由多层薄膜构成，多层薄膜保持层叠对（4），它们由覆盖在基底（1）上的不同折射率的两层组成。衬底和层对与由包括钼的材料组成的单层膜（3）交错，以形成单层膜的一部分不被层对覆盖。作为本发明的实施方案，单层膜和衬底与由二氧化硅组成的膜（2）交错。版权所有（C）2007，JPO＆INPIT

18. 发明专利

JP2007059743A Multilayer film reflector and aligner 审中-公开
标题翻译：多层膜反射器和对准器
公开(公告)号：JP2007059743A
公开(公告)日：2007-03-08
申请号：JP2005245270
申请日：2005-08-26
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI
IPC分类号： H01L21/027 , G02B5/08 , G02B5/26 , G03F7/20 , G21K1/06
摘要： PROBLEM TO BE SOLVED: To provide a multilayer film reflector having a total film stress uniform and minimum over the entire deposited film surface. SOLUTION: The multilayer film reflector has a first light reflector (A1) composed of paired laminated layer each comprising a molybdenum-containing layer (105) and a silicon-containing layer (103), and a second part (B1, B2) composed of layers so constituted as to cancel the stress the first part has on a substrate. The constitution of the layers of the second part is so changed as to cancel the stress of the first part according to the distribution of the stress over a plane parallel to the substrate. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供在整个沉积膜表面上具有总膜应力均匀和最小的多层膜反射器。＆lt; P＆gt;解决方案：多层膜反射体具有由成对层叠层构成的第一光反射体（A1），各层包含含钼层（105）和含硅层（103），第二部分（B1，B2 ）由构成为抵消第一部分在基板上的应力的层构成。第二部分的层的结构发生变化，以根据平行于基板的平面上的应力分布来消除第一部分的应力。版权所有（C）2007，JPO＆INPIT

19. 发明专利

JP2005026396A Process and system for depositing multilayer film, multilayer film reflector, and photolithography system 审中-公开
标题翻译：用于沉积多层膜，多层膜反射器和光刻机系统的方法和系统
公开(公告)号：JP2005026396A
公开(公告)日：2005-01-27
申请号：JP2003189316
申请日：2003-07-01
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI
IPC分类号： G02B5/08 , C23C14/54 , G02B5/26 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a process for depositing a multilayer film in which the film thickness distribution can be reduced in the circumferential direction of a reflective multilayer film.
SOLUTION: At first, a target material holder 3a is operated to direct a target material 3b toward an ion beam source 1 and then a substrate 5 is irradiated with an ion beam 2 thus forming one layer of film. Film deposition time per one layer of film is set at 100.5 sec and the substrate 5 is turned about an axis AX by means of a substrate holder rotary driver 7. A rotational angle reading mechanism 8 monitors the rotational speed position of the substrate 5. Subsequently, the target material holder 3a is reversed and the target material being directed toward the ion beam source 1 is switched from molybdenum 3b to silicon 3c. Based on the rotational angular position data of the substrate 5, film deposition is set to start at a position shifted by 4.5° from the rotational angular position at the time of starting film deposition of an immediately preceding layer and a next layer of film is deposited. The process is repeated to deposit forty layers of film.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种沉积多层膜的方法，其中可以在反射性多层膜的圆周方向上减小膜厚分布。解决方案：首先，操作目标材料保持器3a以将靶材3b引向离子束源1，然后用离子束2照射基板5，从而形成一层膜。每层膜的成膜时间设定为100.5秒，基板5通过基板保持器旋转驱动器7绕轴线AX旋转。旋转角读取机构8监视基板5的转速位置。随后，目标材料保持器3a反转，并且朝向离子束源1的靶材料从钼3b切换到硅3c。基于基板5的旋转角度位置数据，将膜沉积设定为开始薄膜沉积之前的旋转角位置偏移4.5°的位置，并且沉积下一层膜。重复该过程以沉积40层薄膜。版权所有（C）2005，JPO＆NCIPI

20. 发明专利

JP2006057119A Film deposition system, film deposition method, optical component, and exposure device 审中-公开
标题翻译：膜沉积系统，膜沉积方法，光学元件和曝光装置
公开(公告)号：JP2006057119A
公开(公告)日：2006-03-02
申请号：JP2004237510
申请日：2004-08-17
申请人： Nikon Corp , 株式会社ニコン
发明人： KAMITAKA NORIAKI
IPC分类号： C23C14/56 , G02B3/00
摘要： PROBLEM TO BE SOLVED: To provide a film deposition system or the like capable of ensuring the high film deposition rate without unreasonably increasing the accuracy required for controlling the moving speed of a shielding plate and adjusting the position.
SOLUTION: Film deposition is performed by operating any one of target units 33-36 while rotating a substrate W by a substrate holder 21 at an adequate speed. A shielding mask 41 having permeability is operated while controlling the speed by a mask holding device 46. The film deposition is performed by alternately and repeatedly changing, for example, the target unit 33 for Mo and, for example, the target unit 34 for Si. A multilayer film ML can be deposited on the substrate W.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够确保高成膜速度的膜沉积系统等，而不会不合理地增加控制屏蔽板的移动速度所需的精度并调整位置。解决方案：通过操作任何一个目标单元33-36，同时以足够的速度用衬底保持器21旋转衬底W来进行膜沉积。在通过掩模保持装置46控制速度的同时操作具有磁导率的屏蔽掩模41.通过交替地和重复地改变例如Mo的目标单元33和例如Si的目标单元34来进行成膜。多层膜ML可以沉积在基片W上。版权所有（C）2006，JPO＆NCIPI

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