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11. 发明专利

JP2013060419A Compound, radical polymerization initiator, method for producing the compound, polymer, resist composition and method for forming resist pattern 有权
标题翻译：化合物，自由基聚合引发剂，生产该化合物的方法，聚合物，耐蚀组合物和形成耐蚀图案的方法
公开(公告)号：JP2013060419A
公开(公告)日：2013-04-04
申请号：JP2012173408
申请日：2012-08-03
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： UTSUMI YOSHIYUKI , DAZAI NAOHIRO , MIYASHITA KENICHIRO , MOTOIKE NAOTO
IPC分类号： C07C255/65 , C07C253/30 , C08F4/04 , G03F7/038 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition excellent in lithography characteristic and a pattern shape, a polymer useful in the resist composition, a compound useful as a radical polymerization initiator used in production of the polymer, a method for producing the compound, a radical polymerization initiator made of the compound, and a method for forming a resist pattern using the resist composition.SOLUTION: This compound is expressed by general formula (I), where in the formula (I), Ris a 1-10C hydrocarbon group; Z is a 1-10C hydrocarbon group or cyano group, provided that Rand Z may be bonded mutually to form a ring; X is a single bond or a divalent linking group which may contain -O-C(=O)-, -NH-C(=O)- or -NH-C(=NH)-; Ris a 1-20C hydrocarbon group optionally having a substituent, provided that a part of carbon atoms constituting the hydrocarbon group may be substituted by an atom or atomic group other than carbon atom.
摘要翻译：要解决的问题：为了提供光刻特性和图案形状优异的抗蚀剂组合物，可用于抗蚀剂组合物中的聚合物，用作生产聚合物中的自由基聚合引发剂的化合物，化合物，由化合物制成的自由基聚合引发剂，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。解决方案：该化合物由通式（I）表示，其中在式（I）中，R 1是= 1-10C烃基; Z是1-10C烃基或氰基，条件是R 1可以相互键合形成环; X是单键或可以含有-O-C（= O） - ， - NH-C（= O） - 或-NH-C（= NH） - ）的二价连接基团。任选具有取代基的1-20C烃基，条件是构成烃基的一部分碳原子可以被碳原子以外的原子或原子基团取代。版权所有（C）2013，JPO＆INPIT

12. 发明专利

JP2013001850A Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, method for forming resist pattern 有权
标题翻译：化合物，自由基聚合引发剂，生产化合物的方法，聚合物，电阻组合物，形成耐药性图案的方法
公开(公告)号：JP2013001850A
公开(公告)日：2013-01-07
申请号：JP2011135672
申请日：2011-06-17
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： UTSUMI YOSHIYUKI , DAZAI NAOHIRO , IWASHITA ATSUSHI , KONNO TAKEMICHI
IPC分类号： C08F4/04 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a compound useful as a radical polymerization initiator; to provide a radical polymerization initiator comprising the compound; to provide a method for producing the compound; to provide a polymer useful for resist compositions; to provide a resist composition containing the polymer, and to provide a method for forming a resist pattern using the resist composition.SOLUTION: The compound represented by formula (I), [wherein, Ris a 1-10C hydrocarbon group; Z is a 1-10C hydrocarbon group or cyano; Rand Z may be bound to each other to form a ring; X is a divalent connection group, and has one of -O-C(=O)-, -NH-C(=O)- and -NH-C(=NH)- at a terminal contacting with Q; Ris a single bond, an alkylene which may have one or more substituents, or an arylene group which may have one or more substituents; q and r are each independently 0 or 1; and Ais a metal cation or an organic cation].
摘要翻译：要解决的问题：提供可用作自由基聚合引发剂的化合物; 以提供包含该化合物的自由基聚合引发剂; 以提供化合物的制造方法。以提供可用于抗蚀剂组合物的聚合物; 以提供含有聚合物的抗蚀剂组合物，并提供使用该抗蚀剂组合物形成抗蚀剂图案的方法。解决方案：由式（I）表示的化合物[其中R 1是1〜C 6烃基; Z是1-10C烃基或氰基; R 1 并且Z可以彼此绑定以形成环; X是二价连接基团，在与Q相连的末端具有-O-C（= O） - ， - NH-C（= O） - 和-NH-C（= NH） R 2是单键，可具有一个或多个取代基的亚烷基或可具有一个或多个取代基的亚芳基; q和r各自独立地为0或1; 而A + 是金属阳离子或有机阳离子]。版权所有（C）2013，JPO＆INPIT

13. 发明专利

JP2012220572A Resist composition for negative development and method for forming resist pattern 有权
标题翻译：负面发展的阻力组成和形成耐力图的方法
公开(公告)号：JP2012220572A
公开(公告)日：2012-11-12
申请号：JP2011083799
申请日：2011-04-05
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： UTSUMI YOSHIYUKI , SHIMIZU HIROAKI
IPC分类号： G03F7/039 , C08F20/26 , G03F7/004 , G03F7/038 , H01L21/027
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide a resist composition for negative development, the composition excellent in lithographic characteristics, and to provide a method for forming a resist pattern using the resist composition for negative development.SOLUTION: The resist composition is used for a method for forming a resist pattern including the steps of: forming a resist film on a supporter by using a resist composition including a base component (A) whose solubility in an organic solvent decreases by an action of an acid and an acid generator component (B) that generates an acid by exposure; exposing the resist film; and forming a resist pattern by patterning the resist film by negative development using a developing solution containing the above organic solvent. The acid generator component (B) includes an acid generator (B1) that generates an acid having a logP value of 2.7 or lower and pKa of -3.5 or higher.
摘要翻译：要解决的问题：提供一种用于负显影的抗蚀剂组合物，具有优异的光刻特性的组合物，并提供使用该抗蚀剂组合物形成抗蚀剂图案的方法。解决方案：抗蚀剂组合物用于形成抗蚀剂图案的方法，包括以下步骤：通过使用包含其在有机溶剂中的溶解度降低的基础组分（A）的抗蚀剂组合物在载体上形成抗蚀剂膜通过暴露产生酸的酸和酸发生剂组分（B）的作用; 曝光抗蚀膜; 以及通过使用含有上述有机溶剂的显影液通过负显影图案化抗蚀剂膜来形成抗蚀剂图案。酸产生剂组分（B）包括酸产生剂（B1），其产生logP值为2.7或更低，pKa为-3.5或更高的酸。版权所有（C）2013，JPO＆INPIT

14. 发明专利

JP2011081044A Resist composition, resist pattern forming method, new compound and acid generator 有权
标题翻译：抗菌组合物，抗性图案形成方法，新化合物和酸发生器
公开(公告)号：JP2011081044A
公开(公告)日：2011-04-21
申请号：JP2009230854
申请日：2009-10-02
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： HANEDA HIDEO , UTSUMI YOSHIYUKI
IPC分类号： G03F7/004 , C08F20/10 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new acid generator for a resist composition, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition. SOLUTION: The resist composition contains a base component (A) whose solubility in an alkali developer changes by the action of an acid and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) contains an acid generator (B1) made of a compound represented by general formula (b0), wherein R 1 is an aliphatic cyclic group; R 2 is a single bond or alkylene group which may have a substituent; R 3 is an arylene group which may have a substituent; R 4 is a 4 or 5C alkylene group which may have a substituent; and X - is a counter anion. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于抗蚀剂组合物的新型酸产生剂，含有酸产生剂的抗蚀剂组合物和使用该抗蚀剂组合物的抗蚀剂图案形成方法。抗蚀剂组合物含有在碱性显影剂中的溶解度随酸和酸产生剂组分（B）的作用而变化的碱成分（A），其在曝光时产生酸，其中酸产生剂组分（B ）含有由通式（b0）表示的化合物制成的酸产生剂（B1），其中R 1是脂族环状基团; R 2是单键或可以具有取代基的亚烷基; R 3是可以具有取代基的亚芳基; R 4是具有取代基的4或5个亚烷基; 而X - 是抗衡阴离子。版权所有（C）2011，JPO＆INPIT

15. 发明专利

JP2011053568A Resist composition and resist pattern forming method 有权
标题翻译：电阻组合和电阻形成方法
公开(公告)号：JP2011053568A
公开(公告)日：2011-03-17
申请号：JP2009204132
申请日：2009-09-03
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： UTSUMI YOSHIYUKI , SESHIMO TAKEHIRO , SHIMIZU HIROAKI , MOTOIKE NAOTO
IPC分类号： G03F7/004 , C08F20/18 , G03F7/039 , H01L21/027
CPC分类号： C08F20/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide a resist composition and a resist pattern forming method using the resist composition.
SOLUTION: The resist composition contains a base material component (A) whose solubility for an alkaline developer changes due to action of acid, an acid generating agent component (B) generating acid due to exposure, and a nitrogen-containing organic compound component (D). The nitrogen-containing organic compound component (D) contains a compound denoted by formula (d1). In the formula, R
20 denotes a methylene group, an ethylene group, an oxygen atom or C(CH
3 )
2 , R
21 denotes a hydrogen atom or an organic group, and R
22 denotes an alkoxy group, an alkocarbonyloxy group, a hydroxy group, a halogen atom, C(=O)-O-R
23 , C(=O)-NH-R
23 or a carboxy group. In the formula, R
23 denotes a 1-15C direct chain or branched chain alkyl group, an unsaturated hydrocarbon group, an aliphatic ring group or an aromatic group, a denotes an integer of 0-2.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供使用该抗蚀剂组合物的抗蚀剂组合物和抗蚀剂图案形成方法。解决方案：抗蚀剂组合物包含其碱性显影剂的溶解度由于酸的作用而变化的基材组分（A），由于曝光产生酸的酸产生剂组分（B）和含氮有机化合物组分（D）。含氮有机化合物成分（D）含有式（d1）表示的化合物。在该式中，R SP 20表示亚甲基，亚乙基，氧原子或C（CH 3 SB 3）SB 2，R SP > 21 表示氢原子或有机基团，R 22表示烷氧基，烷羰基氧基，羟基，卤素原子，C（= O） C（= O）-NH-R 15，或羧基。式中，R 30表示1-15C直链或支链烷基，不饱和烃基，脂族环基或芳香族基，a表示0〜2的整数。版权所有（C）2011，JPO＆INPIT

16. 发明专利

JP2011053567A Resist composition, resist pattern forming method, and nitrogen-containing polymer compound 有权
标题翻译：耐蚀组合物，耐蚀图案形成方法和含氮聚合物化合物
公开(公告)号：JP2011053567A
公开(公告)日：2011-03-17
申请号：JP2009204120
申请日：2009-09-03
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： UTSUMI YOSHIYUKI , SESHIMO TAKEHIRO , SHIMIZU HIROAKI , MOTOIKE NAOTO
IPC分类号： G03F7/039 , C08F20/36 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition and a resist pattern forming method superior in lithography characteristics and capable of forming a resist pattern of excellent shape, and to provide a nitrogen-containing polymer compound useful for the resist composition.
SOLUTION: The resist composition contains a base material component (A) whose solubility for an alkaline developer changes due to action of acid and an acid generating agent component (B) generating acid due to exposure, and the base material component (A) contains the nitrogen-containing polymer compound having a composition unit (a0) including groups expressed by formula (a0) wherein R
21 denotes a hydrogen atom or an organic group, R
27 denotes an alkylene group, a bivalent aliphatic ring group or a bivalent aromatic hydrocarbon group, and R
28 denotes an alkyl group, a monovalent aliphatic ring group or a monovalent aromatic hydrocarbon group, where R
27 and R
28 are mutually coupled to form a ring together with N-C(=O) in the formula.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供光刻特性优异且能够形成优异形状的抗蚀剂图案的抗蚀剂组合物和抗蚀剂图案形成方法，并提供可用于抗蚀剂组合物的含氮聚合物化合物。解决方案：抗蚀剂组合物包含其碱性显影剂的溶解度由于酸的作用而变化的基材组分（A）和由于曝光而产生酸的酸产生剂组分（B），并且基材组分（A ）包含具有组成单元（a0）的含氮聚合物化合物，其包含由式（a0）表示的基团，其中R 21为氢原子或有机基团，R SP SP 27 >表示亚烷基，二价脂肪族环基或二价芳香族烃基，R“SP”表示烷基，一价脂肪族环基或一价芳香族烃基，其中R 27 和R 28 在式中与NC（= O）一起形成环。版权所有（C）2011，JPO＆INPIT

17. 发明专利

JP2010132601A Resist composition, method of forming resist pattern, new compound, and acid generating agent 有权
标题翻译：耐蚀组合物，形成耐药性图案的方法，新化合物和酸产生剂
公开(公告)号：JP2010132601A
公开(公告)日：2010-06-17
申请号：JP2008309851
申请日：2008-12-04
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SESHIMO TAKEHIRO , UTSUMI YOSHIYUKI , KAWAKAMI AKINARI , MATSUZAWA KENSUKE , SHIMIZU HIROAKI , OSHITA KYOKO
IPC分类号： C07C381/12 , C07C309/06 , C07C309/12 , C07D327/04 , C08F220/26 , C09K3/00 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a compound useful as an acid generating agent for use in a resist composition, an acid generating agent, a resist composition, and a method of forming a resist pattern. SOLUTION: The resist composition includes a base material component (A) that changes its solubility to an alkali developer by the action of an acid, and an acid generating agent component (B) that generates an acid by exposure to light, with the acid generating agent component (B) including an acid generating agent (B1) constituted of a compound represented by formula (b1) [in the formula, R 7íí to R 9íí each independently represents an aryl group or an alkyl group, provided that two of R 7" to R 9" may form a ring in combination with a sulfur atom in the formula by binding to each other, and provided that at least one of R 7" to R 9" is a substituted aryl group with some or all of hydrogen atoms therein substituted with a group represented by formula (b1-01); X - represents an anion; R 20 represents a divalent group comprising an alkali dissociable site; R 30 represents a divalent linking group; and R 40 represents a group comprising an acid dissociable group]. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：提供可用作抗蚀剂组合物，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法的酸产生剂的化合物。解决方案：抗蚀剂组合物包括通过酸的作用改变其对碱显影剂的溶解度的基材成分（A）和通过曝光产生酸的酸产生剂组分（B），与包含由式（b1）表示的化合物[式中R 1，R 3，R 3，R 3，R 6，各自独立地表示芳基或烷基，条件是R“7”“和”R“9”中的两个可以在下式中与硫原子结合形成环并且条件是R“SP”7“至R 9”中的至少一个是取代的芳基，其中一部分或全部氢原子被一个基团取代由式（b1-01）表示; X - 表示阴离子; R 20表示包含碱可离解位点的二价基团; R 30表示二价连接基团; 且R 40 表示包含酸解离基团的基团]。版权所有（C）2010，JPO＆INPIT

18. 发明专利

JP2010116356A Resist composition, resist pattern-forming method, new compound and acid-generating agent 有权
标题翻译：抗蚀剂组合物，抗性图案形成方法，新型化合物和产酸剂
公开(公告)号：JP2010116356A
公开(公告)日：2010-05-27
申请号：JP2008291404
申请日：2008-11-13
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： HANEDA HIDEO , UTSUMI YOSHIYUKI , SESHIMO TAKEHIRO , KAWAKAMI AKINARI
IPC分类号： C07C381/12 , C07C309/19 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a compound useful as an acid-generating agent for a resist composition, to provide the acid-generating agent, to provide the resist composition, and to provide a resist pattern-forming method. SOLUTION: The resist composition contains a base material component (A) changing the solubility in an alkali developing liquid by the action of an acid, and an acid-generating agent component (B) generating the acid by the exposure to light, and containing an acid-generating agent (B1) comprising a compound represented by formula (b1-1) (wherein, R 1 " to R 3 " are each independently aryl or alkyl which may have a substituent, with the proviso that at least one thereof is substituted aryl in which a part of hydrogen is substituted with a group represented by formula (b1-0-01); and W is 2-10C linear or branched alkylene). COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：提供可用作抗蚀剂组合物的酸产生剂的化合物，提供酸产生剂，以提供抗蚀剂组合物，并提供抗蚀剂图案形成方法。解决方案：抗蚀剂组合物含有通过酸的作用改变碱显影液中的溶解度的基材成分（A）和通过曝光产生酸的酸发生剂成分（B）并且含有由式（b1-1）表示的化合物（其中R“SP”1至R“3”）的酸产生剂（B1）各自独立地为芳基或可以具有取代基的烷基，条件是其至少一个是其中一部分氢被一个由式（b1-0-01）表示的基团取代的取代的芳基; W是2-10C直链或支链亚烷基）。版权所有（C）2010，JPO＆INPIT

19. 发明专利

JP2010111653A Compound, acid generator, resist composition and resist pattern forming method 有权
标题翻译：化合物，酸产生剂，抗菌组合物和抗性图案形成方法
公开(公告)号：JP2010111653A
公开(公告)日：2010-05-20
申请号：JP2009025102
申请日：2009-02-05
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： HANEDA HIDEO , UTSUMI YOSHIYUKI , MOTOIKE NAOTO , SUZUKI KENTA
IPC分类号： C07C309/17 , C07C381/12 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition containing an acid generator comprising a compound suitable as an acid generator for the resist composition, and a resist pattern forming method to use the resist composition. SOLUTION: The resist composition contains (A) a base material component whose solubility to an alkali developer changes by action of an acid and (B) an acid generator component containing an acid generator (B1) comprising a compound expressed by general formula (b1-1) and generating an acid by light exposure. In the formula, R 7" to R 9" are each independently aryl or alkyl; any two groups among R 7" to R 9" may be bonded together, to form a ring, with a sulfur atom in the formula; at least one of R 7" to R 9" is substituted aryl wherein a part of or all hydrogen atoms are substituted with alkoxyalkyloxy or alkoxycarbonylalkyloxy; R 1 is 4-20C cyclic alkyl having oxygen atom (=O) as a substituent; and n' is 0 or 1. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种含有酸产生剂的抗蚀剂组合物，其包含适合作为抗蚀剂组合物的酸发生剂的化合物，以及使用抗蚀剂组合物的抗蚀剂图案形成方法。解决方案：抗蚀剂组合物含有（A）其对碱性显影剂的溶解度随酸的作用而变化的基材成分，（B）含有酸产生剂（B1）的酸产生剂组分，所述酸产生剂组分包含由通式（b1-1），并通过曝光产生酸。在该式中，R“SP”7“至R 9”各自独立地为芳基或烷基; R 7“至R 9”中的任意两个基团可以键合在一起形成环，其中式中的硫原子; R 7“至R 9”中的至少一个是其中一部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代的取代芳基; R 1是具有氧原子（= O）作为取代基的4-20C环烷基; 而n'为0或1.版权所有（C）2010，JPO＆INPIT

20. 发明专利

JP2010107955A Resist composition, method of forming resist pattern, compound and acid generator comprising the same 有权
标题翻译：抗蚀剂组合物，形成耐药性图案的方法，包含其的化合物和酸生成器
公开(公告)号：JP2010107955A
公开(公告)日：2010-05-13
申请号：JP2009210857
申请日：2009-09-11
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KAWAKAMI AKINARI , UTSUMI YOSHIYUKI , ABE SHO
IPC分类号： G03F7/004 , C07C309/06 , C07C381/12 , G03F7/038 , G03F7/039
CPC分类号： C07C309/10 , C07C309/12 , C07C309/17 , C07C309/19 , C07C309/67 , C07C311/48 , C07C311/51 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for a resist composition, an acid generator composed of the compound, a resist composition including the acid generator, and a method of forming a resist pattern using the resist composition. SOLUTION: The resist composition includes a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种新型化合物，其用作抗蚀剂组合物的酸产生剂，由该化合物组成的酸产生剂，包含酸产生剂的抗蚀剂组合物和使用该抗蚀剂形成抗蚀剂图案的方法组成。解决方案：抗蚀剂组合物包括在酸的作用下在碱性显影溶液中显示改变的溶解度的碱性组分（A）和暴露时产生酸的酸产生剂组分（B），其中酸产生剂组分（B）包括在阳离子部分内由具有碱解离基团的化合物构成的酸发生剂（B1）。版权所有（C）2010，JPO＆INPIT

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