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    • 11. 发明专利
    • Light source
    • 光源
    • JP2007109945A
    • 2007-04-26
    • JP2005300237
    • 2005-10-14
    • Fujifilm Holdings Corp富士フイルムホールディングス株式会社
    • MIZUYOSHI AKIRAKUWATA KENICHI
    • F21V8/00F21V29/00F21V29/02F21Y101/02G02F1/13357H01L33/56H01L33/58H01L33/60H01L33/62H01L33/64
    • H01L2224/48091H01L2924/00014
    • PROBLEM TO BE SOLVED: To provide a light source which improves heat dissipation and enables diffusion light of a light emitting element to be effectively used as effective light without causing cost increase. SOLUTION: The light source 11 of a backlight unit 2 of a liquid crystal display unit has a substrate 20; a light emitting element array 22 which is disposed on the substrate 20 and has a plurality of light emitting elements 21 arranged in a line thereon; a lower circuit substrate 23 which is adhered on the substrate 20 in both sides of the light emitting element array 22 with a nonflow type adhesive or a bonding sheet 24, and is electrically connected to the light emitting element 21; and an upper circuit substrate 27 which is provided on the lower circuit substrate 23 and is electrically connected to the lower circuit substrate 23. Driving heat of the light emitting element 21 is dissipated directly to the substrate 20, and can be effectively dissipated to the substrate 20. Light emitted from the side surface of the light emitting element 21 is reflected in a surface of the lower and upper circuit substrates 23, 27 facing both sides of the light emitting element 21, and is projected upward as effective light. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种改善散热并使发光元件的扩散光有效地用作有效光而不引起成本增加的光源。 解决方案:液晶显示单元的背光单元2的光源11具有基板20; 发光元件阵列22,其设置在基板20上,并且具有排列在其上的多个发光元件21; 在发光元件阵列22的两侧以非流动型粘合剂或粘合片24粘结在基板20上的电路基板23,与发光元件21电连接; 以及设置在下部电路基板23上并与下部电路基板23电连接的上部电路基板27.发光元件21的驱动热量直接耗散到基板20上,能够有效地散发到基板 从发光元件21的侧面发射的光在面向发光元件21的两侧的下电路基板23和上电路基板27的表面中被反射,并作为有效的光向上突出。 版权所有(C)2007,JPO&INPIT
    • 12. 发明专利
    • Device for forming image on optical disk
    • 在光盘上形成图像的装置
    • JP2007102857A
    • 2007-04-19
    • JP2005288743
    • 2005-09-30
    • Fujifilm Holdings CorpYamaha Corpヤマハ株式会社富士フイルムホールディングス株式会社
    • YAMADA SEIYAITOGA HISANOBUFUSHIKI TATSUROKUBO YASUSHISHIBATA MICHIHIRO
    • G11B7/0045G11B7/125
    • G11B7/126G11B7/0037G11B7/00736
    • PROBLEM TO BE SOLVED: To provide an optical disk image forming device to form an image uniform in contrast on an optical disk all over its label surface even if tracks are not formed there. SOLUTION: The optical disk image forming device 10 reads the information about the kinds of the dye used in the drawing area 214 from the information written in the information area 212 of an optical disk 200 when forming an image on the optical disk 200. Then, the optical disk image forming device 10 reads, from a table, the laser power intensity information corresponding to the information about the kinds of this dye and to the information of the maximum linear speed (double speed) for forming images and forms the image in the drawing area 214 on the disk 200 by radiating a laser beam of this laser power intensity. Thus, since the color of the dye in the drawing area 214 is always saturated, it can form an image uniform in contrast in the drawing area of an optical disk. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:即使在那里没有形成轨迹,提供一种在其标签表面上的光盘上形成对比度均匀的光盘图像形成装置。 解决方案:当在光盘200上形成图像时,光盘图像形成装置10从写入在光盘200的信息区域212中的信息读取关于绘图区域214中使用的染料种类的信息 然后,光盘图像形成装置10从表中读取与关于该染料的种类的信息对应的激光功率强度信息以及形成图像的最大线速度(双倍速度)的信息,并形成 通过照射该激光功率强度的激光束在盘200上的绘图区域214中的图像。 因此,由于绘图区域214中的染料的颜色总是饱和,因此在光盘的绘图区域中可以形成均匀的图像。 版权所有(C)2007,JPO&INPIT
    • 15. 发明专利
    • Imaging apparatus
    • 成像设备
    • JP2007074364A
    • 2007-03-22
    • JP2005259120
    • 2005-09-07
    • Fujifilm Holdings Corp富士フイルムホールディングス株式会社
    • YAMASHITA HITOSHI
    • H04N5/225H04N5/232H04N101/00
    • PROBLEM TO BE SOLVED: To provide an imaging apparatus which prevents photographing of faulty image data.
      SOLUTION: A digital still camera 10 is provided with a normal photographing mode and a macro photographing mode. A subject at a normal distance is photographed by the digital still camera 10 where the macro photographing mode is selected. A face display pixel extraction part 45 extracts pixels showing a width of a face of the subject of image data GD1 obtained by photographing, as the number of face display pixels. A determination part 47 determines whether the distance between the digital still camera 10 and the subject allows macro photographing or not by comparing the number of face display pixels with a reference number of face display pixels preliminarily stored in a ROM 26. In the case that the determination part 47 determines that the number of face display pixels is smaller than the reference number of face display pixels, a warning is given to a user by using a warning means to prompt the user to photograph again.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种防止拍摄故障图像数据的成像装置。 解决方案:数码相机10具有普通拍摄模式和微距拍摄模式。 正常距离的拍摄对象被选择了宏拍摄模式的数码相机10拍摄。 面部显示像素提取部分45提取表示通过拍摄获得的图像数据GD1的被摄体的面部的宽度的像素作为面部显示像素的数量。 确定部分47通过将面部显示像素的数量与预先存储在ROM 26中的面部显示像素的参考数量进行比较来确定数字静态照相机10和被摄体之间的距离是否允许微距拍摄。在 确定部件47确定脸部显示像素的数量小于面部显示像素的参考数量,通过使用警告装置向用户发出警告以提示用户再次拍摄。 版权所有(C)2007,JPO&INPIT
    • 16. 发明专利
    • Polishing solution and polishing method using thereof
    • 抛光方法及其抛光方法
    • JP2007073901A
    • 2007-03-22
    • JP2005262470
    • 2005-09-09
    • Fujifilm Holdings Corp富士フイルムホールディングス株式会社
    • SUGIYAMA SHINICHIYAMASHITA KATSUHIRO
    • H01L21/304B24B37/00C09K3/14C09K13/00
    • PROBLEM TO BE SOLVED: To provide a polishing solution which attains satisfactory dishing performance of a matter to be polished which is used for chemical and mechanical flattening in manufacturing of a semiconductor device, and to provide a chemical and mechanical polishing method excellent in uniformity of polishing using such a polishing solution. SOLUTION: The polishing solution is used for chemical and mechanical flattening in manufacturing of the semiconductor device, and a polishing speed ratio when the temperature of a wafer polishing surface is 40°C and 25°C temperature of a wafer polishing surface ((a polishing speed when the temperature of the wafer polishing surface is 40°C)/(a polishing speed when the temperature of the wafer polishing surface is 25°C)) is not larger than 3. In order to attain the polishing speed ratio, it is desirable to add a compound adsorbed to the wafer polishing surface to set an adsorption amount ratio to the wafer polishing surface of the compound ((adsorption amount to the wafer polishing surface at 40°C)/(adsorption amount to the wafer polishing surface at 25°C)) to be not larger than 0.7. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种在半导体器件的制造中用于化学和机械平坦化的待抛光物质的令人满意的凹陷性能的抛光溶液,并且提供优异的化学和机械抛光方法 使用这种抛光液的抛光均匀性。 解决方案:抛光溶液用于半导体器件的制造中的化学和机械平坦化,以及当晶片抛光表面的温度为40℃和晶片抛光表面的25℃温度时的抛光速度比( (晶片研磨面的温度为40℃时的研磨速度)/(晶片研磨面的温度为25℃时的研磨速度))为3以下。为了得到研磨速度比 需要添加吸附在晶片研磨面上的化合物,从而使化合物的晶片研磨面的吸附量比((40℃时的晶片研磨面的吸附量)/(晶片研磨的吸附量) 表面在25℃))不大于0.7。 版权所有(C)2007,JPO&INPIT
    • 17. 发明专利
    • Automatic developing machine and developing method
    • 自动开发机和开发方法
    • JP2007072160A
    • 2007-03-22
    • JP2005258994
    • 2005-09-07
    • Fujifilm Holdings Corp富士フイルムホールディングス株式会社
    • KOBAYASHI FUMIKAZU
    • G03F7/30G03F7/00
    • PROBLEM TO BE SOLVED: To provide an automatic developing machine for developing a photopolymerization type planographic printing plate exposed in a Violet CTP system (computer-to-plate system by a violet laser), the machine responding to the Violet CTP system that can prevent uneven development but achieve excellent dot reproducibility, and to provide a developing method using the automatic developing machine.
      SOLUTION: The automatic developing machine responding to a Violet CTP system develops a photopolymerization type planographic printing plate exposed in a Violet CTP system while conveying the plate in a developing bath, and is characterized in that the machine is equipped with a rubbing member to rub the planographic printing plate in the developing bath, that the rubbing member is composed of a plurality of brush members arranged in the conveying direction of the planographic printing plate, and that the brush bristles of the brush member have diameters of 0.05 to 0.09 mm. The developing method is carried out by using the above automatic developing machine.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供一种用于显影在紫CTP系统(紫外激光的计算机到板系统)中曝光的光聚合型平版印刷版的自动显影机,该机器响应于紫CTP系统, 可以防止不均匀的发展,但是实现优异的点重现性,并且提供使用自动显影机的显影方法。 解决方案:响应于紫CTP系统的自动显影机开发了在紫外CTP系统中暴露的光聚合型平版印刷版,同时在显影浴中输送板,其特征在于该机器配备有摩擦部件 在显影槽中擦拭平版印刷版,摩擦部件由布置在平版印刷版的输送方向上的多个刷部件构成,刷部件的刷毛直径为0.05〜0.09mm 。 显影方法通过使用上述自动显影机进行。 版权所有(C)2007,JPO&INPIT
    • 18. 发明专利
    • Measuring device using total reflection attenuation
    • 使用总反射衰减测量装置
    • JP2007071837A
    • 2007-03-22
    • JP2005262362
    • 2005-09-09
    • Fujifilm Holdings Corp富士フイルムホールディングス株式会社
    • FUJIKURA TATSUO
    • G01N21/27G01N21/05G01N35/10G01N37/00
    • PROBLEM TO BE SOLVED: To prevent inclination of a sensor unit generated when inserting/extracting a pipette. SOLUTION: Inclination prevention members 85a-85d are provided on four spots on the bottom surface of a pressing part 80b of a pressing member. Each inclination prevention member 85a-85d has a wedge-shaped constitution equipped with a surface 86 orthogonal to the bottom surface 80e of the pressing part 80b and a slope 87 inclined toward the orthogonal surface 86. When the sensor unit 12 is set on a measuring position, the pressing member 80 is started to be lowered. Each line contact is generated during a lowering time, between the slope 87 of each inclination prevention member 85a, 85b and a ridgeline 12e of the sensor unit 12, and between the slope 87 of each inclination prevention member 85c, 85d and a ridgeline 12c of the sensor unit 12. Hereby, the sensor unit 12 is held in the pressed state onto a rail 70. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了防止在插入/拔出移液管时产生的传感器单元的倾斜。 解决方案:倾斜防止构件85a-85d设置在按压构件的按压部80b的底面上的四个点上。 每个倾斜防止构件85a-85d具有楔形构造,其具有与按压部80b的底面80e正交的表面86和朝向正交表面86倾斜的斜面87.当传感器单元12设置在测量 位置时,按压部件80开始降低。 每个线接触在下降时间,每个倾斜防止构件85a,85b的斜面87与传感器单元12的脊线12e之间以及各个倾斜防止构件85c,85d的斜面87和脊线12c之间产生 传感器单元12.因此,传感器单元12被保持在按压状态到轨道70上。版权所有:(C)2007,JPO&INPIT
    • 19. 发明专利
    • Measurement method utilizing total reflection attenuation and its program
    • 使用总反射衰减的测量方法及其程序
    • JP2007071648A
    • 2007-03-22
    • JP2005258002
    • 2005-09-06
    • Fujifilm Holdings Corp富士フイルムホールディングス株式会社
    • OGURA NOBUHIKOSHIMIZU HITOSHI
    • G01N35/10G01N21/05G01N21/27G01N35/08G01N37/00
    • PROBLEM TO BE SOLVED: To suppress lowering of measurement accuracy in feeding a liquid through individual flow paths in a measurement domain and in a reference domain while suppressing instrument upsizing and complication. SOLUTION: A sensor unit 10 is provided with a plurality of sensor cells 18 each comprising a metallic film 25 formed on an upper surface of a prism 14 and a flow path 20 for feeding the liquid with the liquid kept in contact with the metallic film 25. An SPR measuring instrument 30 injects a specimen solution into the flow path 20 of each sensor cell 18 by means of a pair of pipets 46a and 46b provided on a liquid feed head 32. During the above process, the specimen solution sucked/held by the pipets 46a and 46b is dispensed by equal amounts to and injected into the flow paths 20 of the respective sensor cells 18. This shortens travel time of the feed head 32 and suppresses the lowering of measurement accuracy owing to a time difference in injection timing. Further, instrument upsizing and complication are suppressed since it is not necessary to provide a pipet for each flow path 20. COPYRIGHT: (C)2007,JPO&INPIT
    • 解决方案:为了抑制在测量范围和参考域中通过各个流路供给液体的测量精度的降低,同时抑制仪器升高和复杂化。 解决方案:传感器单元10设置有多个传感器单元18,每个传感器单元18包括形成在棱镜14的上表面上的金属膜25和用于将液体供给与液体保持接触的液体的流路20 金属膜25.SPR测量仪器30通过设置在液体供给头32上的一对移液管46a和46b将样品溶液注入每个传感器单元18的流路20中。在上述过程中,吸取样品溶液 由移液管46a,46b保持的流量相当于各个传感器单元18的流路20分配并注入到各个传感器单元18的流路20中。这缩短了进给头32的行进时间,并且抑制了由于时间差引起的测量精度的降低 注射时间。 此外,由于不需要为每个流动路径20提供移液管,因此抑制了仪器升高和并发症。版权所有(C)2007,JPO&INPIT