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181. 发明专利

JP2010058231A Polishing method 有权
标题翻译：抛光方法
公开(公告)号：JP2010058231A
公开(公告)日：2010-03-18
申请号：JP2008227403
申请日：2008-09-04
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： ITOYAMA MITSUNORI , MIYAZAWA FUMIO
IPC分类号： B24B37/00 , B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing method capable of improving planarity of an object to be polished. SOLUTION: A polishing pad 20 includes a polishing sheet 1 having a polishing plane P comprising polyurethane resin as a main component for polishing the object to be polished. Inside the polishing sheet 1, a number of foams 2 are formed. In the polishing sheet 1 except the foams 2, acetyl cellulose is contained. When polishing, the polishing pad 20 is installed on a polishing plate of a polishing machine, and the object to be polished is polished while alkaline slurry capable of deacetylating acetyl cellulose is supplied. During the polishing process, at least part of acetyl cellulose on the side of the polishing plane P is deacetylated by the slurry, while forming a surface layer 1a. The surface layer 1a is higher in hydrophilicity and swelling property than an inner layer 1b of the surface layer 1a. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够提高待抛光对象的平面性的抛光方法。解决方案：抛光垫20包括具有抛光面P的抛光片1，抛光面P包含聚氨酯树脂作为抛光被抛物体的主要部件。在研磨片1内部形成有多个泡沫体2。在除了泡沫2之外的抛光片1中，含有乙酰纤维素。抛光时，将研磨垫20安装在研磨机的研磨板上，对供给脱乙酰化乙酰纤维素的碱性浆料进行抛光。在抛光过程中，抛光平面P一侧的至少部分乙酰纤维素被浆料脱乙酰，同时形成表面层1a。表面层1a的亲水性和溶胀性比表层1a的内层1b高。版权所有（C）2010，JPO＆INPIT

182. 实用新型

JP3156009U 肌着等の柔軟性商品包装用部材失效
标题翻译：灵活性商品包装内衣的构件等
公开(公告)号：JP3156009U
公开(公告)日：2009-12-10
申请号：JP2009006885
申请日：2009-09-29
申请人：富士紡ホールディングス株式会社
发明人：規▲隆▼ 山村 , 規▲隆▼ 山村
IPC分类号： B65D33/25 , B65D33/00
摘要：【課題】肌着等の柔らかい商品を形よく皺にならないように包装するために用いた台紙等の、補助的に用いられていた包装補助部材の使用をなくし、かつ、主たる包装用材として使用した部材も、廃棄することなく、そのまま他の用途に再利用することを可能とする。【解決手段】垂直にした状態でその形状を保持できる強度のある矩形の合成樹脂シートを重ね合わせ、重ね合わせた合成樹脂シートの3辺を一体化し残余の一辺を開口部とした袋体となし、開口部には封緘手段を設けると共に、一方の合成樹脂シートの一面に、前記袋体の底面と一方の側辺とを含んだ範囲にクリアファイルの輪郭線を画いた包装用部材である。輪郭線に鋏を入れ縁部を切り捨て残余をクリアファイルとする。【選択図】図1
摘要翻译：的安装件或用于包装，以便不柔软产品与形状以及褶皱的内衣，消除使用包装已被用作辅助辅助部件的，等等，构件作为主包装材同时，不丢弃，因为它使得在其他应用程序可以重新使用。覆盖具有能够保持它的形状在直立位置的强度的矩形合成树脂片，而合成树脂片材的通过叠加袋得到的积分剩余三个侧面的开口一侧，并，在设置有一密封装置，在合成树脂片的一个表面的一个开口，包括底表面和所述袋的一个侧缘的范围内是一个包装部件Egai透明文件的轮廓。截断残余边把剪刀勾勒出清晰的文件。点域1

183. 发明专利

JP2009279680A Method of manufacturing polishing pad 有权
标题翻译：制造抛光垫的方法
公开(公告)号：JP2009279680A
公开(公告)日：2009-12-03
申请号：JP2008132250
申请日：2008-05-20
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , ITOYAMA MITSUNORI , TAKAHASHI DAISUKE , TAKADA NAOKI
IPC分类号： B24B37/24 , C08J5/14 , C08J9/224 , C08L75/04 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of uniforming foaming structure. SOLUTION: The polishing pad 1 has a polyurethane sheet 2 of the foaming structure. The polyurethane sheet 2 includes an isocyanate-group containing compound as a main component, and has a polishing surface P to abut to a polished object via slurry in the polishing process. Hemispherical particulates 3 with resin shells are approximately regularly and evenly dispersed on the polyurethane sheet 2. A hollow cavity is formed at the center of each shell, and a foaming component is disposed in the cavity of the particulate 3. Pores 6 formed of the foaming component disposed in cavities of the particulates 3 are approximately regularly and evenly formed in the polyurethane sheet 2. The particulates 3 are enclosed in the pores 6. The pores 6 are formed of gases generated from the foaming component. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够均匀发泡结构的抛光垫。解决方案：抛光垫1具有发泡结构的聚氨酯片材2。聚氨酯片2包括含异氰酸酯基的化合物作为主要成分，并且在研磨过程中具有通过浆料与研磨对象物接合的研磨面P. 具有树脂壳的半球形颗粒3近似均匀地分散在聚氨酯片材2上。在每个壳体的中心处形成中空腔，并且在颗粒3的空腔中设置发泡部件。由发泡体形成的孔6 设置在微粒3的空腔中的部件大致规则地均匀地形成在聚氨酯片材2中。微粒3被包封在孔隙6中。孔6由发泡部件产生的气体形成。版权所有（C）2010，JPO＆INPIT

184. 实用新型

JP3155508U 成形衣料失效
标题翻译：成型服装
公开(公告)号：JP3155508U
公开(公告)日：2009-11-19
申请号：JP2009006402
申请日：2009-09-08
申请人：富士紡ホールディングス株式会社
发明人：香衣石井 , 美幸横内 , 美幸横内 , 香衣石井
IPC分类号： A41C1/00
摘要：【課題】下半身成形衣料本体の編成において、編成方法を部分的に変更し、下半身成形衣料本体編地に段差を生ぜしめることなく、腹部を押さえ、ヒップアップ効果を有する成形衣料を構成する。【解決手段】伸び率の低い編地で編成した部片、伸び率の低い編地の編成時に糸を挿入した最も伸び率の低い編地部片、伸び率が高い編地で編成した部片の三段階の伸び率を有する編地部片によって下半身成形衣料本体を構成し、腹部押さえ部、腰部支持部を設けることにより、下半身成形衣料に身体補整効果を持たせた。【選択図】図1
摘要翻译：本发明提供一种针织下半身成型衣服主体，改变编织方法部分，没有台阶下半身使差成形衣服主体针织物压腹部，构成具有提臀效果成形服装。阿片在低生长速率的针织物组织，低针织物片最生长速率，这是在生长速率组织的低针织物的时间插入纱，这是在生长速率高的针织物组织的片由具有通过提供腰部支撑部三步，腹部保持部，的生长速率的针织物片配置下部主体模制衣服主体，并具有体的补偿效果下体成形服装。点域1

185. 发明专利

JP2009248191A Polishing pad and method of manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2009248191A
公开(公告)日：2009-10-29
申请号：JP2008094566
申请日：2008-04-01
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , MORISHITA NOBUYA
IPC分类号： B24B37/00 , B24B37/20 , B24B37/24 , C08J5/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving the flatness of a workpiece by uniformizing a foam structure. SOLUTION: This polishing pad comprises a polyurethane sheet of foam structure. The polyurethane sheet is formed mainly of an isocyanate group-containing compound, and has a polishing surface brought into contact with the workpiece with a slurry interposed therebetween during the polishing. Hemispherical particles 3 are generally evenly and generally uniformly dispersed in the polyurethane sheet. Each particle 3 contains a resin outer shell 3a. The outer shell 3a comprises an opening 6, and a hollow recess 3b is formed at the center thereof. The particle 3 comprises a polishing component 5 in the recess 3b. The polyurethane sheet is subjected to a surface grinding treatment on the polishing surface side, and an opening is formed in the polishing surface. Polishing components 5 are released from the particles 3 of the polyurethane sheet. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够通过使泡沫结构均匀化来提高工件的平坦度的抛光垫。解决方案：该抛光垫包括泡沫结构的聚氨酯片。聚氨酯片材主要由含异氰酸酯基的化合物形成，并且在抛光期间具有与其间插入的浆料与工件接触的研磨表面。半球形颗粒3通常均匀且均匀地分散在聚氨酯片中。每个颗粒3包含树脂外壳3a。外壳3a包括开口6，在其中心形成有中空的凹部3b。颗粒3包括在凹部3b中的抛光组分5。在研磨面侧对聚氨酯片材进行表面研磨处理，在研磨面上形成开口部。抛光部件5从聚氨酯片材的颗粒3释放。版权所有（C）2010，JPO＆INPIT

186. 发明专利

JP2009226543A Polish pad 有权
标题翻译：抛光垫
公开(公告)号：JP2009226543A
公开(公告)日：2009-10-08
申请号：JP2008074932
申请日：2008-03-24
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： KUME TAKAHIRO , TANAKA HISAAKI , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , B24B37/26
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad can suppress aggregation of abrasive particles and improving evenness of a polished object. SOLUTION: The polishing pad 1 has a film formed of polyurethane resin. The film is manufactured by dry type molding, and is manufactured by casting mixed liquid obtained by mixing an isocyanate group containing compound, a polyamine compound as a hardening agent and fine particles serving as a foaming factor and having thermal expansion characteristics to a mold and slicing a hardened foam while pressurizing it. Inside the film, much foaming generated by expansion of the fine particles by hardening reaction heat, etc. is formed. Each foaming has a shape of an ellipse in the same direction by the pressurizing processing during hardening. Multiple opening holes 4 are formed on the polishing face of the film obtained by slicing the foaming. Each of the opening holes 4 is formed to have a shape of an ellipse in the same direction. Retention of slurry in the opening holes 4 is suppressed. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供抛光垫，可以抑制磨料颗粒的聚集和改善抛光物体的均匀性。解决方案：抛光垫1具有由聚氨酯树脂形成的膜。该膜通过干式成型制造，并且通过将通过混合含异氰酸酯基化合物，作为硬化剂的多胺化合物和作为发泡因子并具有热膨胀特性的微粒而得到的混合液制备成模具和切片硬化泡沫，同时加压它。在膜内部，形成了通过使反应热等硬化而使微粒膨胀而产生的大量发泡。通过硬化时的加压处理，每个发泡体都具有相同方向的椭圆形状。在通过切片发泡获得的膜的研磨面上形成多个开孔4。每个开孔4形成为具有相同方向的椭圆形状。抑制开孔4中的浆料的残留。版权所有（C）2010，JPO＆INPIT

187. 发明专利

JP2009202314A Holding tool 有权
标题翻译：控股工具
公开(公告)号：JP2009202314A
公开(公告)日：2009-09-10
申请号：JP2008049178
申请日：2008-02-29
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MOCHIZUKI YOSHIMI , MANDA YOSHIAKI , OZAWA KENZO , OKADA KATSUHIKO
IPC分类号： B24B37/04 , B24B37/30 , B24B37/32
摘要： PROBLEM TO BE SOLVED: To provide a holding tool capable of suppressing peeling of a frame material. SOLUTION: This holding tool 1 includes a polyurethane sheet 2 and a template 4 for suppressing an object to be polished from jumping out due to generation of horizontal deviation in the object to be polished. As the material of the template 4, glass fiber-reinforced epoxy resin is used. In a substantially center part of the template 4, an opening capable of inserting the object to be polished is formed. The template 4 is adhered to a holding surface P side of the polyurethane sheet 2 via thermoplastic adhesive 6. When adhering the template 4 and the polyurethane sheet 2, an adhesion surface S side of the template 4 opposed to the polyurethane sheet 2 is treated with ethyl acetate to be an organic solvent. Remaining components such as mold releasing agent to be used when molding the template 4 are removed. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够抑制框架材料的剥离的保持工具。解决方案：该保持工具1包括聚氨酯片材2和模板4，用于由于产生待抛光对象物的水平偏离而抑制被抛光物体跳出。作为模板4的材料，使用玻璃纤维增强环氧树脂。在模板4的大致中央部分，形成能够插入被抛光物体的开口。模板4通过热塑性粘合剂6粘附到聚氨酯片材2的保持表面P侧。当粘合模板4和聚氨酯片材2时，与聚氨酯片材2相对的模板4的粘合表面S侧被处理乙酸乙酯为有机溶剂。除去模塑模板4时使用的其它成分如脱模剂。版权所有（C）2009，JPO＆INPIT

188. 发明专利

JP2009172698A Finishing abrasive pad and its manufacturing method 有权
标题翻译：整理磨石及其制造方法
公开(公告)号：JP2009172698A
公开(公告)日：2009-08-06
申请号：JP2008012174
申请日：2008-01-23
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： ITOYAMA MITSUNORI , ASAHINA DAISUKE , TAKADA NAOKI , KAWAMURA YOSHIHIDE , TAKAHASHI DAISUKE
IPC分类号： B24B37/24 , C08G18/20 , C08G101/00
摘要： PROBLEM TO BE SOLVED: To provide a finishing abrasive pad having improved dressing ability while making a dispersion state of foams uniform and softening the foams. SOLUTION: The abrasive pad 1 has a polyurethane sheet 2. The polyurethane sheet is formed by slicing a polyurethane foam dry-pressed from a mixture liquid prepared by mixing pre-polymer, a dispersion liquid containing a triol-compound-containing polyol compound dispersively diluted with water and an aromatic tertiary amine compound. The foams 3 are approximately uniformly dispersively formed by the water at the inside of the polyurethane sheet. The polyol compound containing the triol compound reduces viscosity of polyurethane resin, and the aromatic tertiary amine compound accelerates reaction between the pre-polymer and the polyol compound to shorten pot life. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有改善的敷料能力的精加工磨料垫，同时使泡沫的分散状态均匀并软化泡沫。研磨垫1具有聚氨酯片2.通过将预混合物混合制备的混合液，包含含三醇化合物的多元醇的分散液，用水和芳族叔胺化合物分散稀释的化合物。泡沫体3大致均匀地由聚氨酯片材内部的水分散地形成。包含三醇化合物的多元醇化合物降低了聚氨酯树脂的粘度，芳香族叔胺化合物加速了预聚物和多元醇化合物之间的反应，从而缩短了使用寿命。版权所有（C）2009，JPO＆INPIT

189. 发明专利

JP2009101504A Polishing cloth 有权
标题翻译：抛光布
公开(公告)号：JP2009101504A
公开(公告)日：2009-05-14
申请号：JP2008149142
申请日：2008-06-06
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： IWASE RITSU , IWAO TOMOHIRO
IPC分类号： B24B37/26
CPC分类号： B24B37/26 , B24D3/32 , Y10T428/249978 , Y10T428/249979
摘要： PROBLEM TO BE SOLVED: To provide polishing cloth capable of preventing the occurrence of thickness unevenness and improving its service life. SOLUTION: This polishing pad 1 includes a polyurethane sheet 2. In the polyurethane sheet 2, foams 3 having lengths of about 1/2 in its thickness direction and elongated foams 4 having lengths of 70% or more in the thickness direction are formed. The foams 3 and the elongated foams 4 are opened by buffing processing so that opened pores 5 and opened pores 6 are formed at a polishing face P, respectively. Regarding the opened pores 5, 6, the opened pores having opened pore diameters falling in a range of from 30 to 50 μm occupy 50% or more of the total opened pores. The number of the opened pores 5, 6 per 1 mm 2 of the polishing face P is set in a range of from 50 to 100 in total. The average value of ratio of an opened pore diameter D1 of the opened pore 6 of the elongated foam 4 relative to an opened pore diameter D2 at a depth position of at least 200 μm from the polishing face P is set in a range of from 0.65 to 0.95. This suppresses enlargement of the opened pore diameter, and prevents a change in ratio of a gap. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够防止发生厚度不均匀并提高其使用寿命的抛光布。＆lt; P＆gt;解决方案：该抛光垫1包括聚氨酯片2.在聚氨酯片2中，厚度方向的长度为约1/2的泡沫3和厚度方向上长度为70％以上的细长的泡沫4为形成。通过抛光处理打开泡沫3和细长泡沫4，使得在抛光面P分别形成开孔5和开孔6。关于打开的孔5,6，打开的孔径为30〜50μm的开口孔占总开孔的50％以上。研磨面P的每1mm 2 SP×2的打开孔5,6的数量总共设定在50〜100的范围内。细长泡沫体4的开孔6的打开孔径D1与在研磨面P的深度位置至少为200μm的开孔数D2的平均值的平均值设定在0.65 至0.95。这抑制了开放的孔径的扩大，并且防止了间隙比的变化。版权所有（C）2009，JPO＆INPIT

190. 发明专利

JP4117614B2 Artificial hair 有权
公开(公告)号：JP4117614B2
公开(公告)日：2008-07-16
申请号：JP2003176586
申请日：2003-06-20
申请人：富士紡ホールディングス株式会社
发明人：大輔朝比奈 , 諭細井
IPC分类号： A41G3/00 , D01F8/12

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