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    • 145. 发明专利
    • Method for producing metal oxide film pattern
    • 生产金属氧化膜的方法
    • JP2011207693A
    • 2011-10-20
    • JP2010078485
    • 2010-03-30
    • Central Japan Railway Co東海旅客鉄道株式会社
    • NAKAMURA AKIMASACORDONIER CHRISTOPHERYOSHIOKA DAISUKE
    • C01B13/18C01B13/32C01G19/00C01G23/04C01G33/00G03F7/004G03F7/20G03F7/38G03F7/40H01L21/027
    • PROBLEM TO BE SOLVED: To provide a method for producing a metal oxide film pattern free of complicated processes, which can form proper patterns even when a material quality or film thickness of the metal oxide film differs between the front and back of a substrate.SOLUTION: This method for producing metal oxide film patterns comprises: a first film-forming step of forming a film α containing a metal complex A on one surface of the substrate; a second film-forming step of forming a film β containing a metal complex B on the other surface thereof; a first exposure step of exposing the film α using light including a wavelength region λ; a second exposure step of exposing the film β using light including a wavelength λ; a first development step of developing the film α; a second development step of developing the film β; a conversion step of converting the metal complex A and the metal complex B into metal oxides, respectively. The metal complex B, when irradiated with light of the wavelength region λ, changes in resolvability to the developer larger than the case that the metal complex A is irradiated with light of the wavelength region λ.
    • 要解决的问题:提供一种制造没有复杂工艺的金属氧化物膜图案的方法,即使当金属氧化物膜的材料质量或膜厚度在基板的正面和背面之间不同时,其也可以形成适当的图案。 该金属氧化物膜图案的制造方法包括:在基板的一个面上形成含有金属络合物A的膜α的第一成膜工序; 第二成膜步骤,在其另一个表面上形成含有金属络合物B的膜β; 使用包括波长区域λ的光曝光所述膜α的第一曝光步骤; 第二曝光步骤,使用包括波长λ的光曝光所述胶片β; 开发薄膜α的第一个发展步骤; 开发薄膜β的第二个发展步骤; 分别将金属络合物A和金属络合物B转化为金属氧化物的转化步骤。 当金属络合物B用波长区域λ的光照射时,金属络合物B比金属络合物A用波长区域λ的光照射的情况下的可分解性变化到显影剂的大。
    • 146. 发明专利
    • Filter material and cleaning apparatus
    • 过滤材料和清洁装置
    • JP2011200779A
    • 2011-10-13
    • JP2010069292
    • 2010-03-25
    • Shinshu UnivYamaha Livingtec Corpヤマハリビングテック株式会社国立大学法人信州大学
    • TEJIMA KATSUYAKAMIKAWA HIDEYA
    • B01J39/08B01J20/02B01J47/12C01G23/00C01G23/04C01G33/00C02F1/28C02F1/42
    • PROBLEM TO BE SOLVED: To provide a filter material having the property of removing not only a lead ion from high concentration to extremely low concentration but also various kinds of heavy metal ions, and an aluminum ion over a long period of time.SOLUTION: A filter material removing a metal ion in a solution is a crystalline inorganic material including a layered crystal structure. The crystalline inorganic material contains, between layered crystal structures, a cation component by which an ion exchange is carried out with the metal ion. In the X-ray diffraction pattern, a crystal face corresponding to a first diffraction line is developed from other crystal faces so that the intensity of the diffraction line of the minimum intensity within a high diffraction line group which consists of a diffraction line of 80% or more of the intensity to the first diffraction line of the highest intensity in all diffraction lines may become relative intensity of 1.5 times or more the highest intensity diffraction line within the low diffraction line group which does not belong to the high diffraction line group.
    • 要解决的问题:提供一种具有除了高浓度的铅离子到极低浓度而且能够长时间除去各种重金属离子和铝离子的性质的过滤材料。解决方案:A 除去溶液中的金属离子的过滤材料是包含层状晶体结构的结晶无机材料。 结晶无机材料在层状晶体结构之间含有与金属离子进行离子交换的阳离子成分。 在X射线衍射图中,与其他晶面相对应的晶面相对于由衍射线80%的高衍射线组构成的最小强度的衍射线的强度, 或更多的强度在所有衍射线中具有最高强度的第一衍射线可以变成不属于高衍射线组的低衍射线组内的最高强度衍射线的1.5倍或更多的相对强度。