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    • 112. 发明专利
    • Communication system, information terminal and communication method
    • 通信系统,信息终端和通信方法
    • JP2003058972A
    • 2003-02-28
    • JP2001248320
    • 2001-08-17
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • KASHIMOTO TAKASHIYAMAMOTO MASAHIROBAN YASUHIRO
    • G08B21/16G08B25/04G08B25/08G08B25/10H04B7/24H04B7/26H04M11/00H04Q9/00
    • PROBLEM TO BE SOLVED: To facilitate judgment in what component an error is generated when the error is generated in a system constituted of an information processing server, an information terminal, a meter, etc., as components. SOLUTION: In the system constituted of an information processing server 3, an information terminal 2, a meter 1, etc., it is constituted so that error information is transmitted to the information processing server 3 together with an identifier of the information terminal 2 and recorded in a user management DB 34 when the error is generated in an information collecting function for the meter 1 due to power interruption of the information terminal 2 and when communication with the meter 1 can not be performed for the regulated number of times based on a fact that a communication state between the information processing terminal 2 and the meter 1 is unstable, etc.
    • 要解决的问题:为了便于在由作为组件的信息处理服务器,信息终端,仪表等构成的系统中产生错误时判断哪个组件产生错误。 解决方案:在由信息处理服务器3,信息终端2,仪表1等构成的系统中,构成为将错误信息与信息终端2的标识符一起发送到信息处理服务器3, 记录在用户管理DB34中,当由于信息终端2的电源中断而在仪表1的信息收集功能中产生错误时,并且当与仪表1的通信不能基于 信息处理终端2和仪表1之间的通信状态不稳定的事实等
    • 113. 发明专利
    • Communication system, communication method and its program
    • 通信系统,通信方法及其程序
    • JP2003051889A
    • 2003-02-21
    • JP2001238514
    • 2001-08-06
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • KASHIMOTO TAKASHIYAMAMOTO MASAHIROBAN YASUHIRO
    • G08B25/10H04M11/00H04Q9/00
    • PROBLEM TO BE SOLVED: To further ensure remote maintenance management for an infrastructure such as gas supply systems.
      SOLUTION: A communication system is provided with an information terminal 2 including at least an information collection section 21 to collect automatic metering information and faulty call information with respect to a meter 1, an information processing server device 3 that can transceive information with the information terminal 2, an information communication channel network 4 and a telephone line network 5 for respectively interconnecting the information terminal 2 and the information processing server device 3. When the system uses the information communication channel network 4 to transmit the information from the information terminal to the information processing server device 3, the system switches the connection to the telephone line network 5 when the connection is disabled even for the prescribed number of times of transmission connection.
      COPYRIGHT: (C)2003,JPO
    • 要解决的问题:进一步确保对供气系统等基础设施进行远程维护管理。 解决方案:通信系统具有信息终端2,信息终端2至少包括信息收集部分21,用于收集关于仪表1的自动计量信息和故障呼叫信息;信息处理服务器装置3,其能够与信息终端收发信息 2,信息通信信道4和电话线网5,用于分别互连信息终端2和信息处理服务器装置3.当系统使用信息通信信道网4将信息从信息终端发送到信息时 处理服务器装置3,即使在规定次数的传输连接的情况下,连接被禁用,系统将连接切换到电话线路网络5。
    • 118. 发明专利
    • MAGNETRON SPUTTERING METHOD AND MAGNETRON SPUTTERING DEVICE
    • JP2000192223A
    • 2000-07-11
    • JP37068998
    • 1998-12-25
    • MATSUSHITA ELECTRIC IND CO LTD
    • YOKOYAMA MASAHIDEYAMAMOTO MASAHIROSUEMITSU TOSHIYUKIMORI TATSUYUKI
    • C23C14/00C23C14/35
    • PROBLEM TO BE SOLVED: To reduce dust generated by the exposure of a film deposited on a deposition preventive board to plasma and to improve the yield of the device by allowing only the part remarkable in the increase of temp. in the deposition preventive board with a jacket structure and introducing high temp. liq. therein. SOLUTION: A deposition preventive board 12 is loaded around a substrate 1 and a planar target 2 in such a manner that a film is not deposited on a chamber 8. The deposition preventive board 12 has a cooling jacket part 16, and in which high temp. liq. can be introduced. Desirably, the lower limit of the temp. of the liq. to be introduced is controlled to 50 deg.C, and the upper limit is controlled to 80 to 85% of the decomposing temp. of the material of the planar target 2. Hot water heated at 70 deg.C is introduced into the cooling jacket part 16, and reactive gas such as argon and oxygen is introduced therein via a valve 7. With zinc sulfate+quartz weak in bonding strength as the planar target 2, discharge is executed by high frequency magnetron sputtering. Since its temp. does not reach the decomposing temp. of the material owing to the cooling effect, the film stuck to the deposition preventive board 12 is not decomposed, the desorption of the film caused by film stress and thermal stress is reduce as well, and dust is reduce.
    • 120. 发明专利
    • MAGNETRON SPUTTERING DEVICE AND SPUTTERING METHOD
    • JP2000045069A
    • 2000-02-15
    • JP21418898
    • 1998-07-29
    • MATSUSHITA ELECTRIC IND CO LTD
    • YOKOYAMA MASAHIDEYAMAMOTO MASAHIROSUEMITSU TOSHIYUKIMORI TATSUYUKI
    • C23C14/34C23C14/54H01L21/203
    • PROBLEM TO BE SOLVED: To improve the uniformity of the thickness of a film on a substrate and to prolong the service life of a target by oppositely arranging a substrate and a planar target in a film forming chamber, placing their centers on the same axis and introducing sputtering gases from plural gas introducing ports therein in such a manner that the amounts thereof to be introduced are respectively controllable. SOLUTION: In a chamber provided with a chimney 16 for preventing sticking and connected to a vacuum pump 8, a circular substrate 1 and a planar target 2 are oppositely arranged, and the respective centers are placed on a center axis C. This chamber 7 is provided with sputtering gas introducing ports 18 at >=3 places, from which sputtering gases are introduced through mass flow controllers 5' and 5" and valves 6' and 6". Then, voltage is applied from a high voltage power source 10 to an electrode 9 provided with a magnet placed with a target 2. In this way, plasma is generated, and the target 2 is sputtered to form a thin film on a substrate 1. At this time, while flow rate set value in the mass flow controllers 5' and 5" is changed from the initial stage of the use of the target 2 to the end of the life, the amounts of the gases to be introduced are controlled.