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    • 101. 发明专利
    • WIRE BONDER
    • JPS62115732A
    • 1987-05-27
    • JP25471685
    • 1985-11-15
    • HITACHI LTD
    • OKIKAWA SUSUMUSUZUKI HIROMICHIMIKINO HIROSHI
    • H01L21/60
    • PURPOSE:To apply stable ultrasonic energy to a bonding section at all times even when the surface of a tab is strained by forming a tab support section for a wire bonder in structure in which the height of the tab support section can be adjusted. CONSTITUTION:A bonding stage on which a lead frame, to a tab 13 thereof as a pellet fitting section for a semiconductor pellet 12 the semiconductor pellet 12 is fitted, is placed and fixed is formed to the upper surface of a heat block, and a tab support section 14 shaping one part of the bonding stage is formed by a body separate from the heat block. The tab support section 14 is engaged into a recessed section 1a shaped to the heat block 1, and fastened firmly by a fixed screw 15 screwed to a female screw hole 1b formed at the center of the bottom of the recessed section 1a. In a wire bonder, a tab hanging lead 13a is held down by a jig 17, and projections 14a can be applied accurately to the corner sections of the tab 13.Since the partial height of the tab support section 14 can be adjusted by an adjusting screw in addition to that, height is adjusted previously even when there is minute strain in the tab 13, thus supporting and fixing the tab 13 more precisely.
    • 102. 发明专利
    • Lead frame
    • 领导框架
    • JPS61139050A
    • 1986-06-26
    • JP26074184
    • 1984-12-12
    • Hitachi Ltd
    • OKIKAWA SUSUMUSUZUKI HIROMICHIKITAMURA WAHEIMIKINO HIROSHI
    • H01L23/50H01L23/495
    • H01L23/49582H01L2224/48H01L2224/48247H01L2224/49H01L2224/49171H01L2224/85439H01L2924/01078H01L2924/181H01L2924/00H01L2924/00012
    • PURPOSE:To prevent separation of a resin and a lead frame at an interface due to shearing force at the time of sealing and the like, by forming a Cu oxide film on the surface of the lead frame. CONSTITUTION:Copper (Cu) is plated on the surface of a lead frame part 1, which is sealed by a resin. Or the frame is heated in an oxygen atmosphere after the Cu plating, and a Cu oxide film is formed. The Cu film formed by the Cu plating or the Cu oxide film has excellent adhesion with the resin. Intrusion of moisture through the interface between the lead frame 1 and the resin is prevented. Since the Cu plated film or the Cu oxide film does not impair the solderability of Ag plating and the like, the film can be applied on the entire surface of the lead frame. Since the Cu plating is used, the cost can be made low.
    • 目的:通过在引线框架的表面上形成Cu氧化膜,防止由于密封等时的剪切力而在界面处分离树脂和引线框架。 构成:将铜(Cu)电镀在由树脂密封的引线框架部分1的表面上。 或者在镀铜后在氧气氛中加热框架,形成Cu氧化膜。 由Cu镀层或Cu氧化膜形成的Cu膜与树脂的粘合性优异。 防止了通过引线框架1和树脂之间的界面侵入水分。 由于Cu镀膜或Cu氧化物膜不会损害Ag电镀等的可焊性,因此可以将膜施加在引线框架的整个表面上。 由于使用了Cu电镀,所以可以降低成本。
    • 105. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPS60177637A
    • 1985-09-11
    • JP3243484
    • 1984-02-24
    • HITACHI LTDHITACHI METALS LTD
    • OKIKAWA SUSUMUKITAMURA WAHEISUZUKI HIROMICHIMIKINO HIROSHISAKAMOTO DAIJI
    • H01L21/60C22C21/00H01L23/49
    • PURPOSE:To contrive improve the reliability of products of semiconductor device by a method wherein the breaking strength of the junction wires at a time after the device was sealed in a package is selected to a strength of more than about 6gr per wire of a diameter of 30mum and the breaking of the wires are prevented by the enhanced breaking strength. CONSTITUTION:During the manufacture of a semiconductor device sealed in a ceramic package, junction wires 4 mainly constituting of Al are inevitably performed an annealing for a 10min at 400-500 deg.C and the temperature of the Al wires 4 reaches the recrystallization temperature or a temperature close to it, though the temperature is different according to materials used for making the Al wires 4. Meanwhile, the strength of a wire at a time before an annealing is performed to the wire depends upon the work degree and the material used for making the wire and the strength of the wire at a time after an annealing was performed depends upon the material used for making the wire, but when the wire was subjected to an annealing at a temperature near the recrystallization temperature, the fast that the strength of the wire depends on the past record of the wire is lost. When the breaking strength of a wire is selected to a strength of more than about 20gr per wire of a diameter of 30mum at a time before the semiconductor device is sealed in the package, the breaking strength of the wire can be secured being needed for the wire drawing working, and when the breaking strength of the wire is selected to a strength of more than about 6gr per wire of a diameter of 30mum at a time after the semiconductor device was sealed in the package (after an annealing was performed), the breaking strength of the wire can be ensured in a mechanical strength endurable fully against breaking. As a result, the reliability of products of semiconductor device can be secured.
    • 107. 发明专利
    • Semiconductor device
    • 半导体器件
    • JPS5967642A
    • 1984-04-17
    • JP17765982
    • 1982-10-12
    • Hitachi Ltd
    • SUZUKI HIROMICHIMIKINO HIROSHIKITAMURA WAHEI
    • C22C21/00H01L21/60
    • H01L24/73H01L2224/32245H01L2224/45H01L2224/45124H01L2224/48247H01L2224/48465H01L2224/73265H01L2924/01013H01L2924/01014H01L2924/01029H01L2924/01079H01L2924/01082H01L2924/181H01L2924/00012H01L2924/00H01L2924/013
    • PURPOSE:To improve the corrosion resistance of an aluminum group wire while maintaining the low cost property of the wire, and to prevent disconnection due to corrosion by using the wire consisting of aluminum, silicon and copper. CONSTITUTION:The wire 6 contains 1-10% Si and 1-10% Cu besides Al. The range of the content of Si is selected because Si itself is hard, the flexibility of the wire lowers when the content exceeds 10%, and an effect of improving the corrosion resistance of the wire by the mixing of Si is not displayed sufficiently when it is less than 1%. On the other hand, the range of the content of Cu is limited because the corrosion resistance of the wire is not improved sufficiently when the content is less than 1%, and the elongation of the wire lowers and corrosion resistance and stress-resisting property deteriorate when it exceeds 10%. According to the composition, the corrosion resistance of the wire is improved largely, and the disconnection of the wire can be prevented.
    • 目的:提高铝合金线材的耐腐蚀性,同时保持线材的低成本性,并防止使用由铝,硅和铜组成的线材导致的腐蚀断裂。 构成:除了Al之外,电线6还含有1-10%的Si和1-10%的Cu。 选择Si含量的范围是因为Si本身很硬,当含量超过10%时,导线的柔性降低,并且当Si混合时,不能充分显示出通过混合Si来提高导线的耐腐蚀性的效果 小于1%。 另一方面,Cu含量的范围是有限的,因为当含量小于1%时,电线的耐腐蚀性没有得到充分改善,并且电线的伸长率降低,耐腐蚀性和耐应力性能变差 超过10%。 根据构成,电线的耐腐蚀性大大提高,能够防止电线断线。
    • 108. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPS57192037A
    • 1982-11-26
    • JP7652881
    • 1981-05-22
    • HITACHI LTD
    • OKIKAWA SUSUMUSUZUKI HIROMICHI
    • H01L21/52H01L23/495H01L21/58
    • PURPOSE:To obtain the performance of adhesion of a pellet having high reliability at low cost by coating the pellet attaching section of a substrate with a foundation plating layer and successively forming a lead plated layer and a tin plated layer onto the foundation plating layer. CONSTITUTION:A lead frame 1 forming the substrate has a tub 2 for bonding the semiconductor pellet 5 in Si, inner leads 3 for bonding one ends of wires 6 and outer leads 4. A nickel plated layer 7 preventing the diffusion of a lead frame material is shaped onto the tub 2 as the foundation plating layer. The lead plated layer 8 is formed onto the layer 7, and the tin plated layer 9 is shaped successively as another layer. Accordingly, cost can largely be reduced because expensive gold and silver are not used for pellet attaching treatment. The oxidation of the lead plated layer 8 is prevented and reliability is improved because the tin plated layer 9 is formed onto the lead plated layer 8.