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    • 93. 发明专利
    • PRODUCTION OF COMPOUND SEMICONDUCTOR SINGLE CRYSTAL
    • JPH04124089A
    • 1992-04-24
    • JP24190490
    • 1990-09-12
    • NIPPON MINING CO
    • KOHIRO KENJI
    • C30B17/00C30B15/00C30B27/00C30B27/02C30B29/40
    • PURPOSE:To prevent the generation of crack and dislocation in a single crystal in the production of a compound semiconductor single crystal by a liquid-encapsulating Kyropoulos process, etc., by cooling the crystal under the encapsulant using a specific method without pulling up the crystal after the growth of the single crystal. CONSTITUTION:A molten raw material 5 in a crucible 3 placed in a pressure vessel 1 is covered with a liquid encapsulant layer 6, the pressure vessel 1 is filled with high-pressure inert gas atmosphere and the molten raw material 5 is slowly cooled to effect the growth of a compound semiconductor single crystal 9. The grown single crystal 9 is cooled under the encapsulant layer 6 without being pulled out of the crucible and, when the temperature of the encapsulant layer 6 reaches 500-650 deg.C in the cooling process, the inert gas pressure in the pressure vessel 1 is decreased to expand the inert gas, gas of group V element, group VI element, etc., dissolved in the liquid encapsulant layer 6 to foam the encapsulant layer. The contacting area between the encapsulant 6 and the grown crystal 9 is decreased by this process and the crack caused by the difference of thermal expansion coefficients is generated mainly in the encapsulant layer to prevent the generation of cracks in the grown crystal 9.