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1. 发明专利

JP2005268235A Ion beam irradiation device and ion bean irradiation method 审中-公开
标题翻译：离子束辐照装置和离子束辐射方法
公开(公告)号：JP2005268235A
公开(公告)日：2005-09-29
申请号：JP2005171904
申请日：2005-06-13
申请人： Ulvac Japan Ltd , 株式会社アルバック
发明人： SOTOHANE YOSHIYUKI , HAYASHI TOSHIO , ITO MASAHIRO , OGATA SEIJI , SAKURADA YUZO , UCHIDA TAIJIROU
IPC分类号： H01J27/16 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To provide an ion beam irradiation device capable of drawing out a uniform ion beam as a uniform ion beam by forming a circular magnetic neutral line as a position of zero-magnetic field continuously existing in a vacuum chamber, as a plasma generating source, and by using a magnetic neutral line discharge ion source, made to generate a discharge plasma in the magnetic neutral line by impressing an alternating or high frequency electric field along the magnetic neutral line.
SOLUTION: The plasma generating source comprises a magnetic field generating means for forming the circular magnetic neutral line as a position of zero-magnetic field continuously existing in the vacuum chamber; and an electric field generating means capable of generating a discharge plasma in the magnetic neutral line by impressing an alternating or high frequency electric field along the magnetic neutral line.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：为了提供一种离子束照射装置，其能够通过形成作为连续存在于真空室中的零磁场的位置的圆形磁性中性线，作为均匀的离子束而引出均匀的离子束，作为等离子体发生源，并且通过使用磁性中性线放电离子源，通过沿着磁性中性线施加交变或高频电场，使其在磁性中性线中产生放电等离子体。解决方案：等离子体发生源包括用于形成圆形磁性中性线的磁场产生装置，作为连续存在于真空室中的零磁场的位置; 以及电场产生装置，其能够通过沿着磁性中性线施加交替或高频电场而在磁性中性线中产生放电等离子体。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2004022213A Magnetic neutralline discharge plasma treatment device 有权
公开(公告)号：JP2004022213A
公开(公告)日：2004-01-22
申请号：JP2002172019
申请日：2002-06-12
申请人： Ulvac Japan Ltd , 株式会社アルバック
发明人： UCHIDA TAIJIROU
IPC分类号： H05H1/46 , C23C14/35 , C23C16/507 , H01J37/32 , H05H1/18
CPC分类号： H01J37/32082 , H01J37/32623 , H01J37/3266
摘要： PROBLEM TO BE SOLVED: To provide a magnetic neutralline discharge plasma treatment device in which uniform treatment to the whole area of the large-area rectangular substrate is made possible by applying simultaneously a plurality of linear magnetic neutralline discharge plasma. SOLUTION: In the discharge plasma treatment device, the magnetic field generating means is constructed of at least two linear current bars arranged on the outside of the vacuum chamber in parallel to the treatment surface of the treated object arranged in the vacuum chamber and at least one linear magnetic neutral conductor is formed in the vacuum chamber between the adjoining linear current bars . COPYRIGHT: (C)2004,JPO

3. 发明专利

JP2004022212A Magnetic neutral line electrical discharge plasma treatment device 审中-公开
公开(公告)号：JP2004022212A
公开(公告)日：2004-01-22
申请号：JP2002172017
申请日：2002-06-12
申请人： Ulvac Japan Ltd , 株式会社アルバック
发明人： UCHIDA TAIJIROU , KUNIBE TOSHIHISA
IPC分类号： H05H1/46 , C23C16/505 , C23F4/00
摘要： PROBLEM TO BE SOLVED: To provide a magnetic neutral line discharge plasma treatment device in which the dimensions in longitudinal direction of the vacuum chamber generating plasma is shortened as much as possible and weight saving and simplicity are realized and the cost can be reduced without using a high-cost wall material such as ceramics, while maintaining generation of a low cost, low temperature plasma and time-space and spatial control concerning the size and the location of the generated plasma. SOLUTION: In the discharge plasma treatment device, the magnetic field generating means comprises a cylindrical magnet constructed so that a first end along the axis of the device constitutes N-pole and a second end constitutes S-pole and a constant current coil provided coaxially with the cylindrical magnet on its outside, and by changing the current value flowing to the constant current coil, the diameter of the annular magnetic neutral conductor formed by the cylindrical magnet and the constant current coil can be established freely. The electric field generating means is arranged in the vacuum chamber so that the high frequency electric field may be applied in the inclined direction including right angles to the magnetic neutral conductor generated in the vacuum chamber by the magnetic field generating means. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2004022211A Discharge plasma treatment device 审中-公开
公开(公告)号：JP2004022211A
公开(公告)日：2004-01-22
申请号：JP2002172015
申请日：2002-06-12
申请人： Ulvac Japan Ltd , 株式会社アルバック
发明人： UCHIDA TAIJIROU
IPC分类号： H05H1/46 , B01J3/00 , B01J19/08 , C23C16/505 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a magnetic neutralline discharge plasma treatment device in which a metal such as opaque steel can be used without using a magnetic wall in the vacuum chamber, while generating a low voltage and low temperature high density plasma and maintaining time-space and spatial control concerning the size and the location of the generated plasma, and which is of low cost and has wide applications. SOLUTION: The discharge plasma treatment device comprises a magnetic field generating means that is formed of a link of positions of magnetic field "zero"existing in succession in the vacuum chamber and generates a magnetic neutralline of a shape and size corresponding to the shape and size of the treated object, and an electric field generating means arranged in the vacuum chamber and generates a discharge plasma in the space containing the magnetic neutralline, by impressing a high frequency electric field in the inclined direction including a right angle to the magnetic neutralline generated in the vacuum chamber by the magnetic field generating means. COPYRIGHT: (C)2004,JPO

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