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1. 发明专利

JPH0290524A ULTRASONIC CLEANING DEVICE 失效
公开(公告)号：JPH0290524A
公开(公告)日：1990-03-30
申请号：JP24075788
申请日：1988-09-28
申请人： TOSHIBA CORP , KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO , OTANI TAIICHI , MASHITA NORIYOSHI
IPC分类号： B08B3/12 , H01L21/304
摘要： PURPOSE:To make it possible to remove a vibrator, if necessary, from the wall of a cleaning vessel made of quartz glass, to replace it with new one, and to make repairs on the vessel wall by a method wherein an ultrasonic vibrator, which is detachably pressure-adhered to the circumferential wall or the external surface of the bottom wall of the cleaning vessel, is provided. CONSTITUTION:In order to pressure-adhere a vibrator 2 to the lower surface of the bottom wall of a cleaning vessel, a viscous layer 9 such as high-melting poing silicon grease, vaserine, glycerine and the like is adhered to the upper surface of the vibrator 2, volts 6 and 6 are screwed in. As a result, a fixed stand 7 is pushed up, the reaction force thereof is received by a supporting plate 5 and shelf supports 4 and 4, and the ultrasonic vibrator 2 is firmly pressed against the lower surface of the bottom wall of the cleaning vessel. Through the above-mentioned procedures, the ultrasonic energy generated by the ultrasonic vibrator 2 is transmitted to the silicon wafer in a quartz cleaning vessel 1 without allowing it to escape downward, and the wafer can be washed excellently. When the vibrator 2 is deteriorated, or when cracks are generated in its bottom wall 1b, the bolts 6 and 6 are unscrewed, and the ultrasonic vibrator 2 is pulled out to the outside from between the leg walls 3 and 3 together with the fixing stand 7 and an elastic plate 8, the vibrator is replaced, the cracks in the bottom wall 1b are repaired, and the vibrator 2 is again pressed against the lower surface of the bottom wall of the washing vessel.

2. 发明专利

JPH0290522A WAFER HANDLING DEVICE FOR CLEANING WAFER 失效
公开(公告)号：JPH0290522A
公开(公告)日：1990-03-30
申请号：JP24075988
申请日：1988-09-28
申请人： TOSHIBA CORP , KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI , IMAIZUMI MASABUMI , INAGAKI KIYOHIKO , OTANI TAIICHI , MASHITA NORIYOSHI
IPC分类号： B65H1/28 , B25J15/00 , B65G1/00 , B65G1/07 , H01L21/304
摘要： PURPOSE:To obtain a high cleaning effect, to cut down the time of dipping, and to reduce the flow rate of a cleaning fluid by a method wherein a large number of wafers are held in a line maintaining space in forward and backward directions in an almost exposed condition by the four-point contact using a part of guide arms and a pair of chuck arms. CONSTITUTION:In order to grab up a wafer from an auxiliary means 13, a pair of chuck arms 12a and 12b are opened maximum by moving them in separating direction, the chuck arms and guide arms are lowered, and the pair of guide arms 11a and 11b are brought close to the upper surface of the left and right supporting walls A and B of the auxiliary means. Then, a pusher 14 is lifted up and erected in the auxiliary means 13, all the arranged wafers are pushed up, and when they are placed in the supporting grooves 11 and 11 opposing to the guide arms, the twin guide arms and the chuck arms begin to rise at the same speed as the rising speed of the pusher 14. Then, when the pusher pushed up almost whole of the wafers and its rising is stopped, the rising of the twin guide arms and the chuck arms is also stopped, the chucks 12a and 12b are shifted to approaching direction, And the right and left side edges of the wafer lower than the largest diameter part are inserted into and pinched by the supporting grooves 12 and 12. Then, the pusher is lowered and returned to its original condition, and the wafers are grabbed up above the auxiliary means by the guide arms and the chuck arms.

3. 发明专利

JPS6336890A APPARATUS FOR PRODUCING HIGH-PURITY WATER 失效
公开(公告)号：JPS6336890A
公开(公告)日：1988-02-17
申请号：JP17697586
申请日：1986-07-28
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO , GOTO YUKIO
IPC分类号： C02F1/28 , B01D61/58 , C02F1/44 , C02F9/00
摘要： PURPOSE:To enable long-period and continuous production of high-purity water with only the single system by treating raw water pretreated by activated carbon, etc., to treatments by a 1st reverse osmosis membrane separator, degassing column, 2nd reverse osmosis membrane separator, etc. CONSTITUTION:The raw water pretreated by the activated carbon, etc., is subjected to the reverse osmosis membrane treatment in the 1st reverse osmosis membrane separator 1. The permeated water of the separator 1 is degassed in the ensuing degassing column 2 (e.g., vacuum type degassing column). The treated water of the degassing column 2 is subjected to the reverse osmosis membrane treatment in the 2nd reverse osmosis membrane separator 3. The permeated water of the separator 3 is taken out in a piping 17 and the condensed water of the separator is returned to the raw water supply system of the separator 1 in a piping 18. As a result, the continuous operation for a long period of 3-12 months is permitted only by the single system without juxtaposing the device having the same function as with the ion exchange of the conventional device. The high-degree removal of carbonate components and TOC components is also possible.

4. 发明专利

JPS62110795A DEVICE FOR PRODUCING HIGH-PURITY WATER 失效
公开(公告)号：JPS62110795A
公开(公告)日：1987-05-21
申请号：JP24841385
申请日：1985-11-06
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO , IMAIZUMI MASABUMI , YABE KOICHI
IPC分类号： C02F1/28 , B01D61/58 , B01D65/02 , C02F1/44 , C02F9/00
摘要： PURPOSE:To efficiently produce high-purity water by using a disinfectant, a means for adding a pH regulator, the first reverse osmosis membrane separator, an activated carbon adsorption tower, the second reverse osmosis membrane separator, etc., to treat raw water. CONSTITUTION:A disinfectant and/or a pH regulator are added while raw water pretreated with activated carbon, etc., is supplied to a degasification tower 1 through a pipeline 11. The raw water is treated by the first reverse osmosis membrane separator 2. The permeated water is then treated with activated carbon in the activated carbon adsorption tower 3. The treated water is subsequently treated by the second reverse osmosis membrane separator 4. The permeated water of the reverse osmosis membrane separator 4 is taken out, and the concentrated water of the reverse osmosis membrane separator 4 is returned to the raw water supply system of the reverse osmosis membrane separator 2. Consequently, the troubles in the conventional water purifying device provided with an ion-exchange device are eliminated and high-purity water can be efficiently produced.

5. 发明专利

JPH01307487A TERMINAL STERILIZING DEVICE FOR ULTRA PURE WATER 失效
公开(公告)号：JPH01307487A
公开(公告)日：1989-12-12
申请号：JP13658788
申请日：1988-06-02
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO , IMAIZUMI MASABUMI
IPC分类号： C02F1/44 , B01D65/02 , C02F1/00 , C02F1/02 , C02F1/32 , C02F1/42
摘要： PURPOSE:To enable sterilization by providing a hot water tank just before the use point of a terminal line and supplying hot water to the use point via a filter device. CONSTITUTION:Valves V1, V3 in a bypass line 11 are closed and a valve V4 of the terminal line 11 is opened. The ultra pure water from an ultra pure water supply line is then introduced via the terminal line 11 into the filter device 13, by which the water is filtered. The filtered ultra pure water is supplied to a washing tank 10 where washing of a material 14 to be washed is executed. The sterilization washing is executed by closing the valve V1 and operating a heater 13 after supplying the prescribed volume of the ultra pure water to the hot water tank 12. The hot water in the hot water tank 12 is supplied by the pressure of gaseous nitrogen into the filter device 13 and the washing tank 10 when about 80 deg.C is attained. The ultra-precise washing is executed in this way.

6. 发明专利

JPH01189382A CLEANING APPARATUS 失效
公开(公告)号：JPH01189382A
公开(公告)日：1989-07-28
申请号：JP957088
申请日：1988-01-21
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO
IPC分类号： B08B3/12
摘要： PURPOSE:To carry out efficient cleaning by fitting a quartz diaphragm and an ultrasonic oscillator to a chemical resistant cleaning vessel. CONSTITUTION:A small opening 5 is pierced in the bottom wall 1' of a washing vessel 1 so that the opening 5 is made similar in shape to the bottom ot the vessel 1. A chemical resistant fixing frame 6 with a quartz diaphragm 2 fixed therein is set on the edge of the opening 5 and a pressing frame 7 is put on the frame 6. The frames 7, 6 and the edge of the opening 5 are pierced by bolts 8 and fastened by nuts 8' to fix the diaphragm 2 to the bottom wall 1' together with the frame 6 and to block the opening 5. In the cleaning vessel 1, efficient cleaning can be carried out in a short time.

7. 发明专利

JPH03242932A WASHING AND DRYING APPARATUS FOR WAFER 失效
公开(公告)号：JPH03242932A
公开(公告)日：1991-10-29
申请号：JP3844490
申请日：1990-02-21
申请人： KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI , IMAIZUMI MASABUMI , INAGAKI KIYOHIKO
IPC分类号： H01L21/304
摘要： PURPOSE:To prevent formation of an oxide film, abrasion by a spinner jig, etc. by a method wherein a nitrogen gas is supplied into and discharged from a tank body made of quartz which supports a carrier holding a plurality of wafers set up in juxtaposition vertically inside the tank body, and a space inside the tank body is filled up with the nitrogen gas. CONSTITUTION:A tank body 1 is made of silica glass and has an immersion part 8 of a carrier and a corridor-shaped inundation part 9 so provided around the immersion part 8 as to project from the upper part of the outside, and a cover body 2 closes up the upper side of the inundation part 9 and covers it up. Wafers 4 to be washed are set up vertically and juxtaposed in the carrier 3, which is set on a support rack 15 in the immersion part 8. Next, the upper side of the inundation part 9 is covered up with the cover body 2, the inside of the tank body 1 is shut off from the outside air and washing water is supplied into the immersion part 8 from an introduction port 10 provided in the bottom. At the same time, a nitrogen gas is introduced into the tank body and filled up in a space above the immersion part 8 in the tank body 1. According to this constitution, formation of an oxide film on the wafers, abrasion with the carrier, production of dust and impairment are eliminated.

8. 发明专利

JPS62210095A ION EXCHANGE DEVICE 失效
公开(公告)号：JPS62210095A
公开(公告)日：1987-09-16
申请号：JP5343986
申请日：1986-03-11
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO , GOTO YUKIO
IPC分类号： B01J47/04 , B01J47/02 , C02F1/42
摘要： PURPOSE:To permit efficient drawing of water according to the constitution ratio of cations and anions of raw water by using an ion exchange device of a 2-bed 1-column type using an anion exchange resin and mixed bed type ion exchange resin. CONSTITUTION:The inside of an ion exchange column 20 is segmented to two chambers by a partition wall 23 with a strainer 31. A raw water supplying port 21 is provided to one chamber 24 and a treated water discharge port 22 is provided to the other chamber 25. The anion exchange resin A is packed into the one chamber 24. The cation exchange resin and anion exchange resin are packed into the other chamber 25 as the mixed bed type. More specifically, the total resin amt. can be determined as desired in conformity with the load constitution ratio of the cations and anions of the raw water and therefore, the efficient drawing of the water is made possible; in addition, the constant water quality operation by controlling the specific resistance of the treated water is executed. Since the device is constituted as the 1-column 2-bed type, the size of the device is reduced and the floor area and initial cost are reduced.

9. 发明专利

JPS60202792A APPARATUS FOR OXIDATION AND REDUCTION TREATMENT 失效
公开(公告)号：JPS60202792A
公开(公告)日：1985-10-14
申请号：JP5847584
申请日：1984-03-28
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO
IPC分类号： C02F1/70 , C02F1/72
摘要： PURPOSE:To reduce the amt. of chemicals to be used and to improve the efficiency of the treatment by providing an operating part for operating the amt. of a neutralizing chemical to be injected into a reaction vessel, and the amt. of oxidizing and reducing agent and a controlling part for controlling a means for injecting the chemicals basing on the results operated by the operating part. CONSTITUTION:A value of pH of waste water measured by a pH meter 6 is inputted to an operating part 11a where the amt. of specified acid or alkali is operated from an already inputted titration curve for adjusting pH. For carrying out oxidation or reduction reaction, present oxidation-reduction potential of the waste water obtd. by an oxidation-reduction potential meter (ORP meter) 7 is inputted to an operating part 11a. Whether an oxidizing agent is to be injected or a reducing agent is to be injected, is decided from its potential, and the amt. of the agent to be used id decided. A slightly less amt. than the decided value is outputted from the controlling part 11b to an automatic valve V5, and the automatic valve V5 is held open for a necessary time. The potential of the waste water is detected by the ORP meter again and above described procedure is repeated once or twice. When the potential attains thus a specified value, the automatic valve V5 is closed and the reaction is finished.

10. 发明专利

JPS60202784A COD ADSORPTION DEVICE 失效
公开(公告)号：JPS60202784A
公开(公告)日：1985-10-14
申请号：JP5847684
申请日：1984-03-28
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO , HATSUTA TAKESHI
IPC分类号： C02F1/28
摘要： PURPOSE:To treat waste water utilizing full capacity of an adsorbent by providing a COD meter to a specified proportion of the height of a packed tower and commencing regeneration of the adsorbent by letting a regulator operate when an indication of the COD meter attains a specified value. CONSTITUTION:A sampling port 9a and a COD meter 9 are provided to a position at a specified proportion of a height of an adsorption layer of an adsorbing tower 3. Samples of waste water are analyzed at every specified time interval, and the result is inputted to a controller 8. When the value attains a referential value or comes near the referential value, a group of automatic valves V1 is closed and a pump P1 is stopped, and a regeneration stage is commenced. By this process, the capacity of the adsorbent is utilized to its limit, and waste water is thus treated.

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