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1. 发明专利

JP2004317375A Determination method and measuring instrument for shape of beam and light intensity distribution in beam, wave front measuring instrument, regulation method for image-focusing optical system, and manufacturing method for exposure device 审中-公开
公开(公告)号：JP2004317375A
公开(公告)日：2004-11-11
申请号：JP2003113320
申请日：2003-04-17
申请人： Nikon Corp , Nikon System:Kk , 株式会社ニコン , 株式会社ニコンシステム
发明人： FUJII TORU , TSUKAMOTO HIROYUKI , SAWADA MASAYASU
IPC分类号： G01J1/02 , G01M11/02 , G02B27/00 , G02B27/18 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To restrain an influence of cross-talk, and to accurately measure a shape of a beam and an intensity distribution in the beam.
SOLUTION: Microlenses of which all the eight adjacent microlenses form spots are handled as the microlenses included completely in the beam. (microlenses expressed by solid black circles in (b)). The ratio of the microlenses included in the beam is calculated by a method as follows. (1) The microlens included completely in the beam is counted as 1. (2) For a microlens included not completely in the beam, the average value of light intensities in the neighboring microlenses included completely in the beam is found, the ratio of the light intensity in the microlens to the average value serves as the rate of the microlens included in the beam. The rate of the microlens included in the beam is corrected by taking the influence of the cross-talk into account.
COPYRIGHT: (C)2005,JPO&NCIPI

2. 发明专利

JP2004317376A Wave front measuring method and device therefor, adjustment method of imaging optical system, and manufacturing method of semiconductor aligner 审中-公开
公开(公告)号：JP2004317376A
公开(公告)日：2004-11-11
申请号：JP2003113321
申请日：2003-04-17
申请人： Nikon Corp , Nikon System:Kk , 株式会社ニコン , 株式会社ニコンシステム
发明人： TSUKAMOTO HIROYUKI , FUJII TORU , SAWADA MASAYASU
IPC分类号： G01B11/24 , G01J9/00 , G01M11/00 , G01M11/02 , G02B7/02 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a wave front measuring method that can measure an accurate wave front by suppressing the influence of crosstalk, without enlarging a device therefor.
SOLUTION: In the past method, all the ray spot data were used for the fitting calculation of the wave front collected by microlens 5 (microlens figures shown by A in figure that exist on the inside by one step from the irradiated outer part of luminous flux in microlens 5 ) completely covered with luminous flux PB as shown in (a), and collected by the inner microlens 5 (microlens figures shown by B, C, and D in figure). On the contrary, in this method, ray collection spot data in the most outer part of the microlens 5 (figures shown by A in figure) are not used in the form of this execution among microlenses 5 completely covered with luminous flux PB as shown in (b). As a result, it is enabled to suppress the influence of crosstalk without enlarging the device, and to be able to provide the wave front measuring method that can measure an accurate wave front, the wave front measuring device, as well as the adjustment method of image formation optical system that uses the wave front measuring method and the manufacturing method of image formation optical system.
COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2011103465A Lighting optical device, exposure device, and control method 审中-公开
标题翻译：照明光学装置，曝光装置和控制方法
公开(公告)号：JP2011103465A
公开(公告)日：2011-05-26
申请号：JP2010250006
申请日：2010-11-08
申请人： Nikon Corp , 株式会社ニコン
发明人： FUJII TORU
IPC分类号： H01L21/027 , G02B5/00 , G02B19/00
摘要： PROBLEM TO BE SOLVED: To prevent the condensation of light from optical elements in a narrow region on a surface of a following optical member when the light from a plurality of optical elements is used.
SOLUTION: A lighting device 2 for lighting a surface of a reticle by using the light from a light source 7 includes: a plurality of mirror elements 3 which are two-dimensionally arranged on the light path; a drive 4 for driving the plurality of mirror elements 3 and independently controlling each of the light deflection directions; and a relay optical system 14 which introduces the light deflected by the plurality of mirror elements 3 into an incident surface of a fly-eye lens 15. The relay optical system 14 prevents the light in the same direction from being condensed in one point at the incident surface 22I when the light deflection directions in the plurality of mirror elements 3 are aligned to be identical.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：当使用来自多个光学元件的光时，防止来自光学构件的表面上的狭窄区域中的光学元件的光的冷凝。解决方案：通过使用来自光源7的光照亮标线板的表面的照明装置2包括：二维地布置在光路上的多个反射镜元件3; 用于驱动多个镜元件3并独立地控制每个光偏转方向的驱动器4; 以及中继光学系统14，其将由多个镜子元件3偏转的光引入到飞眼透镜15的入射表面。中继光学系统14防止在相同方向上的光在当多个镜面元件3中的光偏转方向对齐成相同时，入射面22I。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2010249627A Method and device for polarization measurement, and method and device for exposure 审中-公开
标题翻译：用于偏振测量的方法和装置，以及用于曝光的方法和装置
公开(公告)号：JP2010249627A
公开(公告)日：2010-11-04
申请号：JP2009098711
申请日：2009-04-15
申请人： Nikon Corp , 株式会社ニコン
发明人： FUJII TORU
IPC分类号： G01J4/04 , G01M11/00 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To measure polarization characteristics of two optical systems respectively, by detecting illumination light passing through the two optical systems. SOLUTION: A method for measuring the polarization characteristics of an illumination optical system ILS and a projection optical system PL is provided, which includes: the step of measuring a first polarization characteristic of the illumination light IL passing through the illumination optical system ILS and the projection optical system PL; the step of arranging a prism part 22A between the illumination optical system ILS and the projection optical system PL; the step of measuring a second polarization characteristic of the illumination light IL passing through the illumination optical system ILS, the prism part 22A and the projection optical system PL; and the step of obtaining respective polarization characteristics of the illumination optical system ILS and the projection optical system PL, based on the first and second polarization characteristics. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：通过检测通过两个光学系统的照明光，分别测量两个光学系统的偏振特性。解决方案：提供了一种用于测量照明光学系统ILS和投影光学系统PL的偏振特性的方法，其包括：测量通过照明光学系统ILS的照明光IL的第一偏振特性的步骤和投影光学系统PL; 在照明光学系统ILS和投影光学系统PL之间布置棱镜部分22A的步骤; 测量通过照明光学系统ILS，棱镜部分22A和投影光学系统PL的照明光IL的第二偏振特性的步骤; 以及基于第一和第二偏振特性获得照明光学系统ILS和投影光学系统PL的各自的偏振特性的步骤。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2009192412A Wave front measurement device and program 审中-公开
标题翻译：波前测量设备和程序
公开(公告)号：JP2009192412A
公开(公告)日：2009-08-27
申请号：JP2008034486
申请日：2008-02-15
申请人： Nikon Corp , 株式会社ニコン
发明人： FUJII TORU , ITO HIROSHI
IPC分类号： G01M11/02
摘要： PROBLEM TO BE SOLVED: To provide a technology capable of precisely and speedily measuring a wave front using a white light source by a Shack-Hartmann method.
SOLUTION: The wave front measurement device comprises a white light source emitting white light; a microlens array of two or more microlenses; an imaging element that has two-dimensionally aligned two or more picture elements and a color filter array, in which color filters are disposed in a prescribed pattern to color-separate the white light entering to each picture element, on a light receiving surface; a shift portion to shift the relative position between the microlens array and the imaging element in the direction perpendicular to the optical train connecting the white light source and the imaging element so that two or more spot images focused by condensing the white light from the white light source projected by a test lens by the microlens array in a prescribed shift amount on the light receiving surface of the imaging element; and a control portion for imaging the two or more spot images at an imaging portion by shifting the relative position between the microlens array and the imaging element at the shift portion.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够通过Shack-Hartmann方法使用白光源精确且快速地测量波前的技术。解决方案：波前测量装置包括发射白光的白光源; 两个或多个微透镜的微透镜阵列; 具有二维排列的两个或更多个像素的成像元件和滤色器阵列，其中滤色器以规定的图案设置以将入射到每个图像元素的白光分色到分别在光接收表面上; 移位部分，用于在与连接白色光源和成像元件的光学系统垂直的方向上移动微透镜阵列和成像元件之间的相对位置，使得通过将来自白光的白光聚光来聚焦的两个或更多个点图像通过微透镜阵列的测试透镜在成像元件的光接收表面上以规定的移位量投射的光源; 以及控制部分，用于通过在所述偏移部分移动所述微透镜阵列和所述成像元件之间的相对位置来在成像部分对所述两个或更多个斑点图像进行成像。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008292929A Manufacturing method for light-shield pattern 审中-公开
标题翻译：光栅图案的制造方法
公开(公告)号：JP2008292929A
公开(公告)日：2008-12-04
申请号：JP2007140593
申请日：2007-05-28
申请人： Nikon Corp , 株式会社ニコン
发明人： NAKAJIMA KENJI , FUJII TORU
IPC分类号： G02B5/00 , G02B3/00 , G03F1/68 , G03F1/80
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method for a light-shield pattern having a flat surface and capable of efficiently preventing adherence of fine particles. SOLUTION: A resist 2 is applied to the surface of a transparent substrate 1 made of, for example, quarts, (a). The resist 2 to serve as a light-shield portion is removed by a lithography process, (b). Subsequently, a transparent substrate 1 is etched by an RIE etching, with the remaining resist 2 serving as a mask (c). A light-shield film 3, such as Cr, is formed on the surfaces of the remaining transparent substrate 1 and resist 2, (d). At this time, the thickness of the light-shield film 3 is identical to the thickness obtained by subtracting the thickness of the transparent substrate by the RIE etching, and the surface of the light-shield film 3 on the transparent substrate 1 is on the same plane as the unetched surface of the transparent substrate 1. Lastly, the remaining resist 2 is dissolved to remove the resist 2 and the light-shield film 3 formed on it. Consequently, a light-shield pattern that has a flat surface can be formed, (e). COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有平坦表面并能够有效防止细颗粒附着的遮光图案的制造方法。解决方案：将抗蚀剂2施加到由例如（a）制成的透明基板1的表面上。通过光刻工艺除去用作遮光部分的抗蚀剂2，（b）。随后，通过RIE蚀刻蚀刻透明基板1，其余的抗蚀剂2用作掩模（c）。在剩余的透明基板1和抗蚀剂2的表面上形成诸如Cr的遮光膜3（d）。此时，遮光膜3的厚度与通过RIE蚀刻减去透明基板的厚度而得到的厚度相同，透明基板1上的遮光膜3的表面在与透明基板1的未蚀刻表面相同的平面。最后，将剩余的抗蚀剂2溶解以除去形成在其上的光刻胶2和遮光膜3。因此，可以形成具有平坦表面的遮光图案（e）。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2007194537A Method and apparatus for measuring optical characteristic, and exposure apparatus 有权
标题翻译：用于测量光学特性和曝光装置的方法和装置
公开(公告)号：JP2007194537A
公开(公告)日：2007-08-02
申请号：JP2006013541
申请日：2006-01-23
申请人： Nikon Corp , 株式会社ニコン
发明人： MIZUNO YASUSHI , FUJII TORU
IPC分类号： H01L21/027 , G01M11/02 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an apparatus capable of controlling the polarized state of illumination light to a required state in the case of measuring the optical characteristics of an optical system. SOLUTION: The measuring apparatus for measuring the wave front aberration of a projecting optical system PL is provided with an illuminating optical system 12 for illuminating the projecting optical system PL by illumination light from a light source, a polarization control unit 2 and a diffusion plate 38 for setting the polarized state of illumination light on the pupil surface of the projecting optical system PL, a collimate lens 23 and a micro fly-eye 24 for converting light through the projecting optical system PL into light having light quantity distribution corresponding to phase information on the pupil surface, and an image forming element for detecting the converted light. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：在测量光学系统的光学特性的情况下，提供能够将照明光的偏振状态控制到所需状态的装置。解决方案：用于测量投影光学系统PL的波前像差的测量装置设置有照明光学系统12，用于通过来自光源的照明光，偏振控制单元2和用于将照明光的偏振状态设置在投影光学系统PL的光瞳表面上的漫射板38，准直透镜23和用于将通过投影光学系统PL的光转换成具有对应于瞳孔表面上的相位信息，以及用于检测转换的光的图像形成元件。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2006196659A Optical characteristics measuring method, optical system adjusting method, optical characteristics measuring apparatus, exposure apparatus and device manufacturing method 审中-公开
标题翻译：光学特性测量方法，光学系统调整方法，光学特性测量装置，曝光装置和装置制造方法
公开(公告)号：JP2006196659A
公开(公告)日：2006-07-27
申请号：JP2005006279
申请日：2005-01-13
申请人： Nikon Corp , 株式会社ニコン
发明人： FUJII TORU
IPC分类号： H01L21/027 , G01M11/02
摘要： PROBLEM TO BE SOLVED: To provide an optical characteristic measuring method for eliminating nonuniform distribution in amount of light resulting from uneven diffusing of light due to a diffusing member, an optical system adjusting method, optical characteristics measuring apparatus, an exposure apparatus for improving exposure accuracy, and also to provide a device manufacturing method for manufacturing high integration density device with high a manufacturing yield. SOLUTION: A reticle set RA for measurement having formed aperture patterns (PH 1 to PH N ) is lit with the light diffused with a light diffusing member with a timing such that the aperture patterns (PH 1 to PH N ) respectively become a conjugated relationship with the aperture 41a regarding the projected optical system PL. The light, having passed the aperture patterns (PH 1 to PH N ) in the conjugated relation with the aperture 41a and the projected optical system PL, is inputted via the aperture 41a, the wave surface of the input light is divided to form a plurality of spot images, the spot images corresponding to each aperture pattern (PH 1 to PH N ) are overlapped and received, and the optical characteristic of the optical system to be inspected is calculated, on the basis of the light-receiving result. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决问题的方案：提供一种光学特性测量方法，用于消除由于漫射构件引起的光的不均匀漫射导致的光的不均匀分布，光学系统调整方法，光学特性测量装置，用于提高曝光精度，并且还提供一种制造高集成度密度装置的装置制造方法，制造成品率高。解决方案：具有形成孔径图案（PH 1 至PH N ）的测量用掩模版RA随着具有定时的光漫射构件漫射的光点亮使得孔径图案（PH 1 至PH N ）分别成为与投影光学系统PL相关的孔41a的共轭关系。已经通过与孔41a和投影光学系统PL共轭关系的孔径图案（PH 1 至PH N ）的光经由孔41a ，将输入光的波面分割成多个点图像，与各孔径图案（PH 1 〜PH N ）对应的点图像重叠，根据受光结果计算出要检查的光学系统的光学特性。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2006003762A Optical element, method for manufacturing optical element and aligner 审中-公开
标题翻译：光学元件，制造光学元件和对准器的方法
公开(公告)号：JP2006003762A
公开(公告)日：2006-01-05
申请号：JP2004182024
申请日：2004-06-21
申请人： Nikon Corp , 株式会社ニコン
发明人： FUJII TORU , TSUKAMOTO HIROYUKI , OKI YASUSHI
IPC分类号： G02B5/18 , G03F1/26 , G03F1/68 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To decrease the value of a 0-th order beam by optimizing the level difference in steps formed in a phase difference type exposure mask, and to increase the manufacture margin for the manufacturing of a diffraction optical element. SOLUTION: A diffraction optical element is manufactured in a process of overall exposure by an aligner apparatus and of dry etching. Various kinds of diffraction optical elements can be manufactured, by using an exposure mask to be used for an aligner and having a phase grating comprising steps, in a predetermined region of a transparent substrate; the exposure mask satisfying the relation (1/2)*λ/(n-1) COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过优化在相位差型曝光掩模中形成的台阶中的电平差来降低0级光束的值，并且增加制造衍射光学元件的制造裕度。解决方案：衍射光学元件在通过对准器装置和干法蚀刻的整体曝光的过程中制造。可以通过使用用于对准器的曝光掩模并且在透明基板的预定区域中具有包括步骤的相位光栅来制造各种衍射光学元件; 满足关系（1/2）*λ/（n-1）

10. 发明专利

JP2004014866A Multiphoton interference aligner 审中-公开
公开(公告)号：JP2004014866A
公开(公告)日：2004-01-15
申请号：JP2002167539
申请日：2002-06-07
申请人： Nikon Corp , 株式会社ニコン
发明人： OSAWA HISAO , FUJII TORU , OKI YASUSHI
IPC分类号： G03F7/20 , G02F1/39 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a multiphoton interference aligner capable of creating various exposure patterns using interference of multiple photons without requiring a reticle. SOLUTION: A pattern to form on a wafer is stored in a pattern memory 11 and an intensity/phase calculator 12 calculates the interference intensity at each incident angle θ, the phase between two light beams, and the angular variation of interference reflectors 5a and 5b based on that information. Based on the output from the intensity/phase calculator 12, a synchronization controller 13 transmits the angular variation of the interference reflectors 5a and 5b to reflector controllers 6a and 6b in order to vary the angle of the interference reflectors 5a and 5b. At the same time, the interference intensity is transmitted to an exposure light source 1 in order to regulate the exposure and the phase variation is transmitted to a phase modulation controller 10 in order to vary the optical phase difference between two light beams by driving a phase modulation element 9. These operations are performed by varying the incident angle θ for a required amount in a desired mode, and the wafer is exposed. COPYRIGHT: (C)2004,JPO

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