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1. 发明公开

EP4407652A1 FIVE-DIMENSIONAL ELECTRON MICROSCOPE AND ANALYSIS METHOD THEREFOR 审中-公开
公开(公告)号：EP4407652A1
公开(公告)日：2024-07-31
申请号：EP22872688.1
申请日：2022-09-05
申请人： RIKEN
发明人： SHIMOJIMA, Takahiro , NAKAMURA, Asuka
IPC分类号： H01J37/06 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , G01N23/04
CPC分类号： G01N23/04 , H01J37/06 , H01J37/20 , H01J37/22 , H01J37/28 , H01J37/244
摘要： Since it takes time of seconds to minutes to obtain a single image, time-division observation of a sample cannot be performed for events on a time scale less than the time it takes to obtain the single image of the sample. A five-dimensional electron microscope includes: a photocathode 9 that is irradiated with first laser pulses and generates electron pulses; a sample 15 that is irradiated with the electron pulses and second laser pulses, and becomes excited; a pixel camera 18 that detects the electron pulses that have passed through the sample; and a processing unit that processes an output of the pixel camera, and the electron pulses are delayed by a delay time from the second laser pulses by a delay generator 25.

2. 发明公开

EP4401109A1 METHOD FOR CREATING DETECTION DATA IN ELECTRON BEAM APPLICATION DEVICE, METHOD FOR SYNTHESIZING IMAGE OF OBJECT BEING IRRADIATED, PROGRAM, RECORDING MEDIUM, AND ELECTRON BEAM APPLICATION DEVICE 审中-公开
公开(公告)号：EP4401109A1
公开(公告)日：2024-07-17
申请号：EP22867324.0
申请日：2022-09-05
申请人： Photo Electron Soul Inc.
发明人： NISHITANI, Tomohiro
IPC分类号： H01J37/073 , H01J37/22 , H01J37/244 , H01J37/252 , H01J37/28
CPC分类号： H01J37/073 , H01J37/06 , H01J37/28 , H01J37/252 , H01J37/22 , H01J37/244 , H01J37/04
摘要： An object is to provide a creation method of detection data and an image composition method for an irradiation target in an electron beam applicator, a program, a storage medium, and an electron beam applicator based on a novel principle. In the creation method of detection data in an electron beam applicator, the electron beam applicator includes a light source, a photocathode configured to generate releasable electrons in response to receiving light from the light source, an anode configured to form an electric field between the photocathode and the anode and extract the releasable electrons by the formed electric field to form an electron beam, a detector configured to detect emission quantity data related to emission from an irradiation target irradiated with the electron beam, and a control unit, and the creation method of detection data includes: an electron beam irradiation step of irradiating an irradiation region of the irradiation target with the electron beam; a detection step of detecting, by the detector, the emission quantity data related to emission from the irradiation region irradiated with the electron beam and generating a detection signal; a quantity of light adjustment step of adjusting a quantity of light reaching the photocathode from the light source so that a signal intensity of the detection signal is a preset value; a step of repeating the electron beam irradiation step, the detection step, and the quantity of light adjustment step until the signal intensity of the detection signal becomes the preset value; and a detection data output step of outputting the quantity of light adjustment data where the signal intensity of the detection signal is the preset value as detection data on the irradiation region.

3. 发明公开

EP4386810A1 LASER DEVICE WITH SAFETY INTERLOCK AND SCIENTIFIC INSTRUMENT FOR USE WITH THE SAME 审中-公开
公开(公告)号：EP4386810A1
公开(公告)日：2024-06-19
申请号：EP23215018.5
申请日：2023-12-07
申请人： FEI Company
发明人： DECK, Francis , MORROW, Justin
IPC分类号： H01J37/22 , G01J3/02 , G01J3/44 , G01N21/00 , G01N21/65
CPC分类号： G01N21/65 , G01J3/44 , G01J3/0232 , G01J3/027 , G01J3/0286 , G01J3/0291 , H01J37/228
摘要： A laser device for use with a scientific instrument. The laser device includes a laser emitter and a control system. The laser emitter is configured to generate a laser beam for radiating a sample disposed in a vacuum chamber of the scientific instrument. The control system is configured to receive a pressure signal associated with the vacuum chamber from a pressure sensor, and to change a state of the laser beam in response to the pressure reaching a threshold level.

4. 发明公开

EP4283654A1 ELECTRON MICROSCOPE AND CALIBRATION METHOD 审中-实审
公开(公告)号：EP4283654A1
公开(公告)日：2023-11-29
申请号：EP23173447.6
申请日：2023-05-15
申请人： Jeol Ltd.
发明人： KONYUBA, Yuji
IPC分类号： H01J37/22 , H01J37/26
摘要： An electron microscope (100) includes: an electronic optical system (20) that irradiates a specimen (S) with an electron beam and forms an image using electrons transmitted through the specimen (S); a camera (40) that includes an image sensor (42) and outputs a frame image which is based on a signal obtained by electrons entering each cell of the image sensor (42); and a computation unit (60) that generates an image based on the frame image, wherein the computation unit (60) performs processing for: setting a threshold; and binarizing the frame image using the threshold, and generating the image based on the binarized frame image, and in the processing for setting the threshold, the computation unit (60) repeatedly performs processing for (i) setting a tentative threshold, (ii) acquiring a plurality of the frame images obtained on a condition that electrons entering the image sensor follow Poisson process, (iii) binarizing each of the plurality of acquired frame images using the tentative threshold, (iv) generating an integrated image by integrating the plurality of binarized frame images, and (v) obtaining a normalized constant based on a mean and variance of pixel values of pixels of the integrated image, with the tentative threshold being differed each time of the processing, and the computation unit (60) obtains an optimal threshold based on the plurality of obtained normalized constants and sets the optimal threshold as the threshold.

5. 发明公开

EP4283653A1 COMBINED LASER AND BROAD ION BEAM (BIB) SYSTEMS FOR MORE EFFICIENT PROCESSING OF MULTIPLE SAMPLES 审中-实审
公开(公告)号：EP4283653A1
公开(公告)日：2023-11-29
申请号：EP23173315.5
申请日：2023-05-15
申请人： FEI Company
发明人： NEELISETTY, Krishna Kanth , WANDROL, Petr , KLVAC, Ondrej , FAM, Yakub , NOVAK, Libor , HROUZEK, Michal
IPC分类号： H01J37/22 , G01N1/32 , H01J37/09 , H01J37/16 , H01J37/20
摘要： Systems and methods for operating a combined laser and broad ion beam (BIB) polisher in a sample preparation workflow, are disclosed. An example method for operating a combined laser and broad ion beam (BIB) polisher according to the present invention comprises positioning a sample within the interior volume of the combined BIB and laser sample preparation system, causing a laser source component of the combined BIB and laser sample preparation system to emit an optical beam towards the sample, and causing a BIB source component of the combined BIB and laser sample preparation system to emit a broad ion beam towards the sample. The optical beam and the broad ion beam are each configured to cause a first portion and a second portion of the sample upon which it is incident to be removed, respectively.

6. 发明公开

EP4254468A2 METHODS AND SYSTEMS FOR ALIGNING A MULTI-BEAM SYSTEM 审中-实审
公开(公告)号：EP4254468A2
公开(公告)日：2023-10-04
申请号：EP23165386.6
申请日：2023-03-30
申请人： FEI Company
发明人： STOPKA, Jan , SED'A, Bohuslav , VASINA, Radovan , SEJNOHA, Radim
IPC分类号： H01J37/153 , H01J37/22 , H01J37/28
摘要： The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.

7. 发明公开

EP4250330A1 CHARGED PARTICLE BEAM APPARATUS 审中-实审
公开(公告)号：EP4250330A1
公开(公告)日：2023-09-27
申请号：EP23158446.7
申请日：2023-02-24
申请人： Jeol Ltd.
发明人： TSUTSUMI, Kenichi , UCHIDA, Tatsuya , YOKOUCHI, Kazushiro , IKEO, Nobuyuki , IKITA, Konomi
IPC分类号： H01J37/22 , H01J37/26 , H01J37/28
摘要： A charged particle beam apparatus (100) that forms a probe with a charged particle beam and scans a specimen (S) with the probe to acquire a scanning image, the charged particle beam apparatus (100) including: an optical system (20) for scanning the specimen (S) with the probe; a detector (70) that detects a signal generated from the specimen (S) through the scanning of the specimen (S) with the probe; and a control unit (80) that controls the optical system (20), the control unit (80) performing: correction processing of acquiring a reference image obtained by the scanning of the specimen (S) with the probe, comparing the reference image to a criterion image to determine a drift amount (D), and correcting a displacement of an irradiation position with the probe on the specimen (S) based on the drift amount (D); and processing of setting a frequency with which the correction processing is to be performed based on the drift amount (D).

8. 发明授权

EP2896061B1 INTEGRATED OPTICAL AND CHARGED PARTICLE INSPECTION APPARATUS 有权转让
公开(公告)号：EP2896061B1
公开(公告)日：2023-06-28
申请号：EP13767152.5
申请日：2013-09-16
发明人： HOOGENBOOM, Jacob Pieter , ZONNEVYLLE, Aernout Christiaan , KRUIT, Pieter , NARVÁEZ-GONZÁLEZ, Angela Carolina
IPC分类号： H01J37/22

9. 发明公开

EP4199031A1 CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD 无效
公开(公告)号：EP4199031A1
公开(公告)日：2023-06-21
申请号：EP21215700.2
申请日：2021-12-17
申请人： ASML Netherlands B.V.
发明人： SCOTUZZI, Marijke , MANGNUS, Albertus, Victor, Gerardus , REN, Yan , SMAKMAN, Erwin, Paul
IPC分类号： H01J37/22
摘要： A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising:
a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector;
wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.

10. 发明公开

EP4181168A1 ALIGNING A DISTORTED IMAGE 无效
公开(公告)号：EP4181168A1
公开(公告)日：2023-05-17
申请号：EP21207870.3
申请日：2021-11-12
申请人： ASML Netherlands B.V.
发明人： VAN RENS, Jasper, Frans, Mathijs , HUISMAN, Thomas, Jarik , VAN MIERLO, Willem, Louis , DILLEN, Hermanus, Adrianus
IPC分类号： H01J37/22
摘要： Disclosed herein is a non-transitory computer readable medium that has stored therein a computer program, wherein the computer program comprises code that, when executed by a computer system, instructs the computer system to perform a method of determining the charging induced distortion of a SEM image, the method comprising: determining, at each of a plurality of locations in a SEM image of at least part of a sample, a deflection of an illuminating charged particle beam caused by a charging of the sample at the location; and determining the charging induced distortion of the SEM image in dependence on the determined deflections at each of the plurality of locations in the SEM image. Block 3001: measuring distortion imaging error of the SEM image; block 3002: optionally further step on imaging error; either error from block 3001 or block 3002 used, in block 3003, in comparison with modelled charging induced distortions; block 3007: fixed and variable parameters of model of charging induced distortions determined; block 3005: model in dependence on the parameters; block 3006: optionally (e.g. 6 parameter polynomial fit correction); block 3003: comparison between model and imaging error; if measured remaining error at converged minimum level and/or below predetermined threshold, then stopped and determination made that variable parameters of model are suitable for achieving desired reduction or substantial correction of charging induced error in the SEM image; if measured remaining error not at a converged minimum level and/or not below predetermined threshold, continue at block 3008

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