专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2925231A4 X-RAY REDUCTION SYSTEM 有权
标题翻译： X射线还原体系
公开(公告)号：EP2925231A4
公开(公告)日：2016-11-02
申请号：EP13859556
申请日：2013-11-07
申请人： CONTROLRAD SYSTEMS INC
发明人： MELMAN HAIM ZVI , GUEZ ALLON
IPC分类号： A61B6/03 , G01D18/00 , G02B27/30 , G03C5/00 , G21K1/02 , G21K1/04
CPC分类号： A61B6/469 , A61B6/02 , A61B6/06 , A61B6/4225 , A61B6/461 , A61B6/467 , A61B6/5205 , A61B6/542 , A61B6/545 , A61B6/583 , G21K1/04 , G21K1/043

2. 发明公开

EP2178655A4 APPARATUS AND METHOD FOR INDIRECT SURFACE CLEANING 有权转让
标题翻译：用于间接表面清洁的装置和方法
公开(公告)号：EP2178655A4
公开(公告)日：2014-05-07
申请号：EP08796835
申请日：2008-07-30
申请人： RAVE LLC
发明人： LECLAIRE JEFFREY E , ROESSLER KENNETH GILBER , BRINKLEY DAVID
IPC分类号： G03C5/00 , B08B7/00 , G03F1/00 , G03F1/82 , H01L21/00
CPC分类号： B08B7/0042 , G03F1/82 , Y10S134/902
摘要： A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.
摘要翻译：一种用于目标表面的激光表面清洁的方法，该方法在待清洁的表面正上方限制或不接近环境。该方法包括以较低的底物损伤风险清洁表面的能力。该方法包括对污染的基底表面的直接激光激发和从基底到污染颗粒或污染层的热传递。该方法还包括通过将产生表面清洁所需的温度保持在基底材料的热损伤水平以下来产生基于热的去除并降低基底损伤的风险。此外，该方法包括通过利用相对较长的脉冲宽度降低衬底损伤的风险，提供改善的小污染物/颗粒的去除以及引导光束通过相对于作为衬底环境外壳的一部分的表面设置的材料。

3. 发明公开

EP2556044A1 NORBORNENE-TYPE POLYMERS, COMOSITIONS THEREOF AND LITHOGRAPHIC PROCESS USING SUCH COMPOSITIONS 审中-公开
标题翻译：降冰片烯，THEREOF组合物和此类组合物中的光刻工艺
公开(公告)号：EP2556044A1
公开(公告)日：2013-02-13
申请号：EP11715344.5
申请日：2011-04-05
申请人： Promerus, LLC , Sumitomo Bakelite Co., Ltd.
发明人： KANDANARACHCHI, Pramod , FUJITA, Kazuyoshi , SMITH, Steven , RHODES, Larry, F.
IPC分类号： C07C205/03 , C08F24/00 , C08F28/06 , C08F32/00 , C08F232/08 , C08G61/08 , G03C5/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： G03F7/11 , C08F232/08 , G03F7/0046 , G03F7/2041
摘要： Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.

4. 发明公开

EP2488918A1 MARKING PAPER PRODUCTS 失效转让
标题翻译：纸制品打标
公开(公告)号：EP2488918A1
公开(公告)日：2012-08-22
申请号：EP10823969.0
申请日：2010-10-12
申请人： Xyleco, Inc.
发明人： MEDOFF, Marshall
IPC分类号： G03C1/00 , G03C5/00
CPC分类号： G06K5/02 , B32B29/002 , B32B2262/0276 , B32B2554/00 , C08B15/00 , C08J7/123 , C12M45/00 , C12M45/06 , C12P19/00 , D21H21/48 , D21H25/04 , G01N33/346 , G01N2223/1013 , G01N2223/102 , G03C11/02 , G06K5/00 , G21K5/00 , H01J3/02 , H01J3/04
摘要： Methods of marking paper products and marked paper products are provided. Some methods include irradiating the paper product to alter the functionalization of the paper.

5. 发明公开

EP1761457A4 IMPRINTING OF SUPPORTED AND FREE-STANDING 3-D MICRO-OR NANO-STRUCTURES 审中-公开
标题翻译： AUFDRUCKEN VONGESTÜTZTENUND FREISTEHENDEN 3-D-MIKRO- ODER NANOSTRUKTUREN
公开(公告)号：EP1761457A4
公开(公告)日：2012-07-18
申请号：EP05741094
申请日：2005-05-24
申请人： AGENCY SCIENCE TECH & RES , UNIV MICHIGAN
发明人： KONG YEN PENG , LOW HONG YEE , PANG STELLA W , YEE ALBERT F
IPC分类号： B81C1/00 , B28B11/08 , B29C59/02 , B81C99/00 , B82B3/00 , G03C5/00 , G03F7/00
CPC分类号： A61M25/00 , B27N3/08 , B28B3/06 , B81C99/0085 , B81C2201/034 , B81C2203/032 , B81C2203/038 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24479 , Y10T428/254

6. 发明授权

EP1483628B1 FULL PHASE SHIFTING MASK IN DAMASCENE PROCESS 有权
标题翻译： FULL相移掩模在镶嵌过程
公开(公告)号：EP1483628B1
公开(公告)日：2012-03-21
申请号：EP03713753.6
申请日：2003-02-27
申请人： Synopsys, Inc.
发明人： PIERRAT, Christophe
IPC分类号： G03F1/00 , G03F9/00 , G03C5/00
CPC分类号： G03F1/30 , G03F1/70
摘要： A full phase shifting mask (FPSM) can be advantageously used in a damascene process for hard-to-etch metal layers. Because the FPSM can be used with a positive photoresist, features on an original layout can be replaced with shifters on a FPSM layout. Adjacent shifters should be of opposite phase, e.g. 0 and 180 degrees. In one embodiment, a dark field trim mask can be used with the FPSM. The trim mask can include cuts that correspond to cuts on the FPSM. Cuts on the FPSM can be made to resolve phase conflicts between proximate shifters. In one case, exposing two proximate shifters on the FPSM and a corresponding cut on the trim mask can form a feature in the metal layer. The FPSM and/or the trim mask can include proximity corrections to further improve printing resolution.

7. 发明授权

EP1583091B1 MANUFACTURING PROCESS OF ORIGINAL DISC FOR PRODUCING OPTICAL DISC AND PRODUCTION PROCESS OF OPTICAL DISC 有权
标题翻译：制造工艺ORIGINAL媒体光盘的光盘光学的生产制作过程
公开(公告)号：EP1583091B1
公开(公告)日：2011-04-27
申请号：EP03789628.9
申请日：2003-12-24
申请人： Sony Corporation
发明人： Kai, Shinichi, c/o Sony Corporation , Aratani, Katsuhisa, c/o Sony Corporation , Kouchiyama, Akira, c/o Sony Corporation , Nakagawa, Kenzo, c/o Sony Corporation , Takemoto, Yoshihiro, c/o Sony Corporation
IPC分类号： G11B7/26 , G03C5/00 , G11B20/18
CPC分类号： G11B7/261 , Y10S425/81
摘要： A process for manufacturing an original disc comprising a step for irradiating an inorganic resist layer formed on a substrate with a recording laser beam modulated by an information signal corresponding to the information signal of an information irregular pattern to be formed on an optical disc thus forming an exposure pattern corresponding to the information irregular pattern of the optical disc, and a step for developing the inorganic resist layer to form an irregular pattern corresponding to the information irregular pattern by the inorganic resist layer. In order to manufacture an original disc having an appropriate irregular pattern, the exposed part is irradiated with an evaluation laser beam in the exposure step following trial exposure of the non-recorded region of the resist layer. Recording signal characteristics of the resist layer is then evaluated from the reflected light and an optimal focus position of laser beam for subsequent recording is determined based on the evaluation results.

8. 发明公开

EP2240826A1 EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY 审中-公开
标题翻译： EXTRUSIONSMINDERUNG在DERPRÄGELITHOGRAPHIE
公开(公告)号：EP2240826A1
公开(公告)日：2010-10-20
申请号：EP09707380.3
申请日：2009-02-09
申请人： MOLECULAR IMPRINTS, INC.
发明人： KHUSNATDINOV, Niyaz , JONES, Christopher E. , PEREZ, Joseph G. , LABRAKE, Dwayne L. , MCMACKIN, Ian Matthew
IPC分类号： G03C5/00
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要： Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.

9. 发明公开

EP2228401A1 Sacrificial compositions, methods of use thereof, and methods of decomposition thereof 审中-公开
标题翻译：牺牲组合物，它们的使用方法和过程，其分解
公开(公告)号：EP2228401A1
公开(公告)日：2010-09-15
申请号：EP10163437.6
申请日：2003-10-31
申请人： Georgia Tech Research Corporation
发明人： Kohl, Paul A. , Allen, SueAnn Bidstrup , Henderson, Clifford Lee , Jayachandran, Joseph Paul , Reed, Hollie , White, Celesta, E.
IPC分类号： C08J3/28 , G03C1/76 , G03C1/795 , G03C5/00 , G03C5/56
CPC分类号： B81C1/00476 , B81C2201/0108 , H01L21/7682 , Y10S430/114
摘要： Polymers, methods of use thereof, and methods for fabricating a structure having air-gaps, are provided. One exemplary polymers, among others, includes, a composition having a sacrificial polymer and a photoacid generator.
摘要翻译：聚合物，使用它们的方法，以及用于制造具有空气隙的结构的方法中，提供了。一个示例性的聚合物，尤其包括，具有牺牲聚合物和光产酸剂的组合物。

10. 发明公开

EP1618436A4 DETERMINATION OF CENTER OF FOCUS BY PARAMETER VARIABILITY ANALYSIS 审中-公开
标题翻译：焦点中心通过决定参数变异性分析
公开(公告)号：EP1618436A4
公开(公告)日：2010-08-25
申请号：EP04759392
申请日：2004-04-09
申请人： ACCENT OPTICAL TECH INC
发明人： LITTAU MICHAEL E , RAYMOND CHRISTOPHER J
IPC分类号： G03B27/52 , G01B9/00 , G01B11/00 , G01B11/04 , G01B11/06 , G01N21/00 , G03C5/00 , G03F20060101 , G03F7/20
CPC分类号： G01N21/956 , G01N21/4788 , G01N21/9501 , G01N2021/95615 , G03F7/70483 , G03F7/705 , G03F7/70508 , G03F7/70533 , G03F7/70641

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式