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    • 5. 发明公开
    • BASE WITH FILM AND GLASS FOR FILM FORMATION
    • BASIS MIT FILM UND GLAS ZUR FILMBILDUNG
    • EP1925444A1
    • 2008-05-28
    • EP06796417.1
    • 2006-08-14
    • Asahi Glass Company, Limited
    • NAGAI, KensukeMAEDA, Kei
    • B32B9/00B32B17/06C03C3/14C03C3/16C03C3/247C03C3/32
    • C03C17/02C23C14/10H01L51/5253Y10T428/261Y10T428/263
    • A substrate with film and a glass for forming such a film are provided, wherein the film has high gas barrier property, high transmittance in visible light region, and high productivity since the film provides effective gas barrier property even if the film is a single layer.
      A substrate with film having an inorganic amorphous film having a softening temperature of from 100 to 800°C formed on at least one surface of a substrate; or a substrate with film having an inorganic amorphous film having a glass transition temperature of from 50 to 500°C formed on at least one surface of a substrate. Further, a glass for forming film composed of a borate glass containing B 2 O 3 as the main component, a phosphate glass containing P 2 O 5 , a tellurite type composition containing TeO 2 as the main component, a bismuth oxide type composition containing Bi 2 O 3 as the main component or a chalcogenide type composition containing at least one type of element selected from the group consisting of S, Se and Te.
    • 提供了具有膜和用于形成这种膜的玻璃的基板,其中该膜具有高阻气性,可见光区域的高透射率和高生产率,因为即使膜是单层,膜也提供有效的阻气性 。 一种具有膜的基板,其具有在基板的至少一个表面上形成的软化温度为100至800℃的无机非晶膜; 或具有在基板的至少一个表面上形成的具有玻璃化转变温度为50-500℃的无机非晶膜的膜的基板。 此外,由含有B 2 O 3的硼酸盐玻璃作为主要成分的玻璃形成用玻璃,含有P 2 O 5的磷酸盐玻璃,含有TeO 2作为主要成分的碲化物型组合物,含有Bi 2 O 3或含有选自S,Se和Te中的至少一种元素的硫族化物型组合物。
    • 10. 发明公开
    • NEW GLASS MATERIAL AND METHOD OF PREPARING SAID GLASS
    • 新型玻璃材料制造方法GLASS
    • EP1585710A1
    • 2005-10-19
    • EP04702110.0
    • 2004-01-14
    • Diamorph AB
    • ESMAEILZADEH, Saeid
    • C03C3/32C03C3/253C03C3/14C03C4/20
    • C03C3/045C03C3/111
    • Abstract The invention relates to nitride glass with the general formula axbygz, wherein a is a glass modifier comprising at least one electropositive element, b comprises Si, B, Ge, Ga and/or Al, and g is N or N together with O, whereby the atomic ratio of O:N is in the interval from 65:35 to 0:100, a method for preparing a nitride glass and the use of the glass. The results clearly shows that the physical and mechanical properties of oxide glasses such as hardness, elastic modulus, fracture toughness, and glass transition temperature are improved/increased, when the atomic structure of the network is strengthened by replacing oxygen atoms bAbstract The invention relates to nitride glass with the general formula axbygz, wherein a is a glass modifier comprising at least one electropositive element, b comprises Si, B, Ge, Ga and/or Al, and g is N or N together with O, whereby the atomic ratio of O:N is in the interval from 65:35 to 0:100, a method for preparing a nitride glass and the use of the glass. The results clearly shows that the physical and mechanical properties of oxide glasses such as hardness, elastic modulus, fracture toughness, and glass transition temperature are improved/increased, when the atomic structure of the network is strengthened by replacing oxygen atoms by nitrogen atoms. Further, the results show that a very high refractivity index could be achieved.