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1. 发明授权

EP3708299B1 POLISHING PAD FOR WAFER POLISHING APPARATUS AND MANUFACTURING METHOD THEREFOR 有权
公开(公告)号：EP3708299B1
公开(公告)日：2024-09-25
申请号：EP18903372.3
申请日：2018-06-04
IPC分类号： B24B37/26 , B24B37/22 , B24D18/00 , B24D11/00
CPC分类号： B24B37/26 , B24B37/22 , B24D18/0009

2. 发明公开

EP4126450A1 CHEMICAL-MECHANICAL POLISHING PAD WITH PROTRUDED STRUCTURES 无效
公开(公告)号：EP4126450A1
公开(公告)日：2023-02-08
申请号：EP20932313.8
申请日：2020-10-14
申请人： Smart Pad LLC
发明人： KIM, Goo Youn
IPC分类号： B24B37/22 , B24B37/26 , B24B37/24 , H01L21/67

3. 发明授权

EP3420579B1 WINDOW IN THIN POLISHING PAD 有权
公开(公告)号：EP3420579B1
公开(公告)日：2022-10-19
申请号：EP16891844.9
申请日：2016-02-26
发明人： HU, Yongqi , NARENDRNATH, Kadthala Ramaya , TERRY, Thomas Lawrence
IPC分类号： B24B37/20 , B24B37/22

4. 发明授权

EP3140852B1 MULTI-LAYER POLISHING PAD FOR CMP 有权转让
公开(公告)号：EP3140852B1
公开(公告)日：2021-07-28
申请号：EP15788762.1
申请日：2015-04-30
发明人： MRZYGLOD, Brian , NAIR, Jayakrishnan , BLAKE, Garrett
IPC分类号： B24B37/22 , B24B37/04 , B24B37/24 , B24D11/00 , B24D18/00 , H01L21/304

5. 发明公开

EP3549719A1 AN ELASTIC POLISHING COMPOSITE TOOL 有权转让
公开(公告)号：EP3549719A1
公开(公告)日：2019-10-09
申请号：EP19164011.9
申请日：2019-03-20
申请人： Dong Guan Golden Sun Abrasives Co., Ltd.
发明人： Fang, Hong
IPC分类号： B24D3/00 , B24D11/00 , B24B37/22 , B24D3/34 , B24D13/14
摘要： For achieving an optimal polishing result process it is suggested to provide an elastic polishing composite tool (100) in such a way that it comprises an adhesive layer (10) comprising thermoplastic polyurethane and a release paper, wherein the elastic polishing composite tool (100) further comprises an abrasive layer (11), wherein the abrasive layer (11) is adhered to the adhesive layer (10) by means of an adhesive (12), said adhesive (12) comprising polyurethane resin, a curing agent, a modifying agent and a leveling agent, and wherein the weight ratio of the polyurethane resin, the curing agent, the modifying agent and the leveling agent is 100:(10 - 20):(10-12):(0.5 - 1.5).

6. 发明授权

EP2961571B1 A METHOD TO PROVIDE AN ABRASIVE PRODUCT AND ABRASIVE PRODUCTS THEREOF 有权
公开(公告)号：EP2961571B1
公开(公告)日：2019-05-29
申请号：EP13716818.3
申请日：2013-02-26
申请人： KWH Mirka Ltd.
发明人： MEANA-ESTEBAN, Beatriz , HÖGLUND, Göran , HEDE, Hans , KASS, Markus , SUNDELL, Mats
IPC分类号： B24D3/28 , B24D11/00 , B24B37/24 , B24B37/26 , B24B37/22

7. 发明授权

EP2948271B1 POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS 有权转让
公开(公告)号：EP2948271B1
公开(公告)日：2019-05-08
申请号：EP14702711.4
申请日：2014-01-16
申请人： CABOT MICROELECTRONICS CORPORATION
发明人： LEFEVRE, Paul Andre , ALLISON, William C. , SIMPSON, Alexander William , SCOTT, Diane , HUANG, Ping , CHARNS, Leslie M. , RINEHART, James Richard , KERPRICH, Robert
IPC分类号： B24B37/26 , B24B37/20 , B24B37/22

8. 发明公开

EP3126093A1 POLISHING PADS AND SYSTEMS AND METHODS OF MAKING AND USING THE SAME 有权
标题翻译：抛光垫上，的系统和方法生产及其用途
公开(公告)号：EP3126093A1
公开(公告)日：2017-02-08
申请号：EP15716349.4
申请日：2015-03-31
申请人： 3M Innovative Properties Company
发明人： LEHUU, Duy K. , MEYER, Kenneth A.P. , DAVID, Moses M.
IPC分类号： B24B37/26 , B24B37/22 , B24B37/24 , B24B7/22
CPC分类号： B24B37/26 , B24B7/228 , B24B37/22 , B24B37/245
摘要： The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes at least one of a plurality of precisely shaped pores and a plurality of precisely shaped asperities. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.
摘要翻译：本公开内容涉及抛光垫其中包括一个抛光层，worin抛光层包括工作表面和工作表面相对的第二表面。工作表面包括精确成形的孔的多个部分并加以精确成形的凹凸的多个的至少一个。本公开还涉及一种抛光系统，研磨系统包括preceding-抛光垫和抛光液。本发明涉及一种抛光衬底的方法，抛光的方法，包括：提供抛光垫gemäß到先前抛光垫中的任何一个; 提供一基底，接触与基板表面的抛光垫的工作表面，移动所述抛光垫和相对于一个基片另一个，同时保持所述抛光垫的工作表面和基片表面之间的接触，worin抛光在传导的研磨液的存在。

9. 发明公开

EP3017744A1 COMPOSITE FOAM PADS COMPRISING MELAMINE AND POLYURETHANE FOAM FOR MOTORIZED FLOOR CLEANING MACHINES 审中-公开
标题翻译： VERBUNDSCHAUMKISSEN ENTHALTEND MELAMIN- UND POLYURETHANSCHAUMFÜRMOTORISIERTE BODENREINIGUNGSMASCHINEN
公开(公告)号：EP3017744A1
公开(公告)日：2016-05-11
申请号：EP15193520.2
申请日：2015-11-06
申请人： BOS Polijstmaterialen B.V.
发明人： BOS, Christiaan
IPC分类号： A47L13/16 , C08J9/33 , B24B37/22 , B24B37/24 , B24D13/14 , B32B5/02 , B32B5/16 , B32B5/18 , B32B5/24 , B32B7/12 , A47L11/40
CPC分类号： C08J9/33 , A47L11/4038 , A47L13/16 , C08J2300/30 , C08J2361/28 , C08J2375/04 , C08J2461/28 , C08J2475/04
摘要： The invention relates to a cleaning pad for cleaning a floor surface, said cleaning pad being embodied for coupling to a cleaning machine, comprising a cleaning layer of a mixture of melamine foam flakes and polyurethane foam flakes that are mutually bonded by means of a waterproof hot melt adhesive. The cleaning pad is characterized in that the cleaning layer is provided with a non-woven abrasion fleece for coupling to the cleaning machine and in that the hot melt adhesive is an MDI based composition.
摘要翻译：本发明涉及一种用于清洁地板表面的清洁垫，所述清洁垫被实施为联接到清洁机器，其包括通过防水热相互粘合的三聚氰胺泡沫薄片和聚氨酯泡沫薄片的混合物的清洁层熔融粘合剂。清洗垫的特征在于，清洁层设置有用于连接到清洁机器的无纺布耐磨羊毛，并且热熔粘合剂是基于MDI的组合物。

10. 发明授权

EP2323808B1 POLISHING PAD WITH FLOATING ELEMENTS AND METHOD OF MAKING AND USING THE SAME 有权
标题翻译：抛光垫上，与浮动元素及其制造方法和使用
公开(公告)号：EP2323808B1
公开(公告)日：2015-09-30
申请号：EP09790596.2
申请日：2009-07-17
申请人： 3M Innovative Properties Company
发明人： JOSEPH, William, D.
IPC分类号： B24B37/22 , B24B37/20
CPC分类号： B24B37/26 , B24B37/205 , B24B37/22

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