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    • 7. 发明公开
    • Atomized-water dispersing apparatus
    • 水分散装置
    • EP0081261A3
    • 1984-04-25
    • EP82201511
    • 1982-11-26
    • Ramisa Navarro, Josep
    • Ramisa Navarro, Josep
    • B05B07/06F04D17/16
    • B05B7/0075B05B7/08
    • Atomized-water dispersing apparatus which is comprised of a general cylindrical casing 1 provided at its rear part with the inlet for the air which is sucked in by a centrifugal impeller 4 which is driven by a motor 5 and which is integral with a concentric annular deflector 6 having a greater diameter than the impeller blades and having a width substantially corresponding to that of said blades. Preferably the deflector is connected to the impeller by a collar 6b which is likewise concentric and completes the deflector, thus forming a concentric crown 16 for axially forced air flow when the impeller and the cylindrical deflector are jointly rotating, said air being directed through an annular passage 7 defined between the outer casing and that of the motor. Also preferably, the apparatus has, in continuation of the annular passage 7, a spout ending with a collar 20 wherein there is located a toric annular duct 21 which received water under pressure and is provided with a series of atomizers (22) which provide an outlet for the water for it to be dispersed when crossing with the air jets leaving through the collar of the spout.
    • 9. 发明公开
    • A gas distribution arrangement for the admission of a processing gas to an atomizing chamber
    • 用于将加工气体进入气化室的气体分配装置
    • EP0153723A3
    • 1986-04-23
    • EP85102063
    • 1985-02-25
    • APV Anhydro A/S
    • Rasmussen, Henning
    • B05B03/00B05B03/10B05B07/06B01D01/20
    • B05B3/105B05B7/0075
    • In a gas distribution arrangement the processing gas is admitted from a helical inlet duct through an annular orificial slit (4) into a space between two coaxial guide walls (6,7). Guide vanes (8) are provided in the orificial slit (4) to impart a change of direction to the flow of processing gas. Each guide vane (8) is a spatial body with differently extending, vertical limitation surfaces (8a,8b), which between adjacent vanes (8) delimit ducts whose sectional area as measured transversely of the flow direction of the processing gas through the individual duct (13) is substantially of the same size over the extent of the duct (13). By this arrangement sudden changes of the velocity of the flow of gas through the ducts (13) are avoided as well as consequent formations of eddies and pressure drops over the orificial slit (4), whereby the power consumption for supplying the processing gas is diminished. The vertical height of the guide vanes (8) may decrease along their radial extent inwards in the orificial slit, and their vertical limitation surfaces (8a,8b) may form an acute angle at the radially innermost ends of the guide vanes (8), so that the flow of gas is directed downwards through the individual ducts (13) toward the space between the conical guide walls (6,7).