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    • 1. 发明公开
    • PLANT CULTIVATION METHOD AND PLANT CULTIVATION DEVICE
    • EP4074163A1
    • 2022-10-19
    • EP20897749.6
    • 2020-12-03
    • Anzai, Satoshi
    • Anzai, Satoshi
    • A01G7/00A01G7/02A01G7/06
    • Provided is a plant cultivation method that, through the efficient supply of a required gas to the leaf surface, promotes plant growth and improves plant quality; also provided is a plant cultivation device. The plant cultivation method uses a nutrient liquid supply device (10) that supplies a nutrient liquid to a plant, a fine bubble-generating device (20) that feeds a gas in the form of fine bubbles into the nutrient liquid supplied from the nutrient liquid supply device (10), a spraying device (30) that converts the fine bubble-containing nutrient liquid into a mist, and a control device (40). The plant cultivation method carries out plant cultivation by supplying the nutrient liquid in mist form, and comprises a first step in which an oxygen-containing gas is supplied as the gas into the nutrient liquid and the fine bubble-containing nutrient liquid is sprayed on the leaf surface of a plant, and a second step in which, after the first step, a carbon dioxide-containing gas is supplied as the gas into the nutrient liquid and the fine bubblecontaining nutrient liquid is sprayed on the leaf surface of the plant.