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1. 发明授权

EP2554607B1 Microstructured device and method of fabrication 有权转让
标题翻译：微结构器件和制造方法
公开(公告)号：EP2554607B1
公开(公告)日：2018-03-21
申请号：EP12178949.9
申请日：2012-08-02
申请人： Viavi Solutions Inc.
发明人： Argoitia, Alberto , O'Boyle, Lily , Delst, Cornelis Jan , Holden, Laurence
IPC分类号： C09C1/00 , G03H1/00 , G03H1/02
CPC分类号： C09C1/0015 , C09C2210/30 , C09C2210/40 , G03H1/0011 , G03H1/0244 , G03H1/0272 , G03H1/028 , G03H2270/24 , Y10T428/24851
摘要： A security device has a support substrate of a first material having a softening temperature t1 and an embossed layer of a second different material supported by the support substrate having a softening temperature wherein t2

2. 发明授权

EP1184747B1 Optical element and manufacturing method thereof 有权
标题翻译：一种光学元件及其制造
公开(公告)号：EP1184747B1
公开(公告)日：2016-08-10
申请号：EP01120808.9
申请日：2001-08-29
申请人： DAI NIPPON PRINTING CO., LTD.
发明人： Kitamura, Mitsuru, Dai Nippon Printing Co.,Ltd. , Hamano, Tomohisa, c/o Dai Nippon Printing Co.,Ltd.
IPC分类号： G03H1/08
CPC分类号： G03H1/0841 , G03H1/028 , G03H1/0808 , G03H1/0891 , G03H2001/0858 , G03H2001/2223 , G03H2001/226 , G03H2210/40 , G03H2224/04 , G03H2240/13 , G03H2240/50

3. 发明公开

EP2723576A4 PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD 有权
标题翻译：在纸和纸盒上打印各种网点
公开(公告)号：EP2723576A4
公开(公告)日：2014-12-10
申请号：EP12802010
申请日：2012-06-20
申请人： BASF SE
发明人： RICHERT MICHELLE , BOLLE THOMAS , FLEURY ROLAND
IPC分类号： G03H1/00 , B41M1/24 , B41M3/06 , B41M3/14 , B41M7/00 , G03H1/02 , G03H1/18 , G03H1/20
CPC分类号： B42D25/405 , B05D3/067 , B41M1/24 , B41M3/06 , B41M3/148 , B41M7/00 , B41M7/0081 , B42D25/21 , B42D25/23 , B42D25/24 , B42D25/29 , B42D25/30 , B42D25/324 , B42D25/328 , B42D25/373 , B42D25/42 , B42D25/425 , B42D2033/10 , B42D2033/30 , G03H1/028 , G03H2001/185 , G03H2250/36 , G03H2270/12

4. 发明授权

EP1299250B2 METHOD OF PROVIDING AN IMAGE ON A SUBSTRATE, AND AN INK FOR USE THEREIN 有权
标题翻译：方法产生图像上的底物，并且有使用的墨水
公开(公告)号：EP1299250B2
公开(公告)日：2013-09-25
申请号：EP01947667.0
申请日：2001-07-09
申请人： De La Rue International Limited
发明人： MORRIS, Alan , STONE, David, Allen , DAVIS, Sharon, Christine
IPC分类号： B44F1/10 , B44F1/02 , B44C1/18 , B42D15/00 , B41M3/14
CPC分类号： B44F1/10 , B41M1/24 , B41M3/144 , B42D25/29 , B44F1/02 , C09D11/101 , G03H1/0244 , G03H1/0252 , G03H1/028 , G03H2250/43

5. 发明授权

EP2297617B1 IMAGING OF DEEP STRUCTURES OR RELIEFS FOR SHALLOW RELIEF EMBOSSING 有权
标题翻译：图深部结构，救济冲压地势平坦
公开(公告)号：EP2297617B1
公开(公告)日：2012-12-19
申请号：EP09795160.2
申请日：2009-07-09
申请人： Illinois Tool Works Inc.
发明人： SPOTO, Louis, M. , RANDAZZO, Dean, J. , DESCHNER, Matt
IPC分类号： G03H1/04 , G03H1/02 , B29C59/04
CPC分类号： G03H1/028 , B29C59/04 , B29C2059/023 , G03H1/0244 , G03H1/0404 , G03H2001/0204 , G03H2001/0288 , G03H2001/0296 , G03H2001/185 , G03H2210/12 , G03H2210/30 , G03H2240/55 , G03H2260/14 , G03H2270/11

6. 发明公开

EP2344932A4 IMPROVED MULTI-AXIS DIFFRACTION GRATING 审中-公开
标题翻译： VERBESSERTES MEHRACHSIGES DIFFRAKTIONSGITTER
公开(公告)号：EP2344932A4
公开(公告)日：2012-06-06
申请号：EP09825563
申请日：2009-11-09
申请人： ILLINOIS TOOL WORKS
发明人： SPOTO LOUIS M , RANDAZZO DEAN J , DESCHNER MATTHEW J
IPC分类号： G03H1/04
CPC分类号： G02B5/1857 , G03H1/0244 , G03H1/028 , G03H1/04 , G03H1/265 , G03H2001/0296 , G03H2001/0482 , G03H2001/0497 , G03H2001/2239 , G03H2260/62
摘要： An enhanced optical interference pattern, such as a diffraction grating, is incorporated into a photodefineable surface by shining three or more beams of coherent light from a single source at a photodefinable surface, such as a photosensitive emulsion/photoresist covered glass or an ablatable substrate and mapping the diffraction grating pattern to the photodefinable surface. Mapping of the optical interference pattern is created by interference of three or more light beams, such as laser light or other light sources producing a suitable spectrum of light. The mapped photodefinable surface can be used to create embossing shims. The embossing shim can then be used to emboss film or paper. The embossed film/paper can be metalized and laminated onto a substrate to create a product that has shifting patterns at a variety of viewing angles when exposed to white light.
摘要翻译：增强的光学干涉图案，例如衍射光栅，通过在可光限定的表面例如感光乳剂/光致抗蚀剂覆盖的玻璃或可烧蚀的基底上照射来自单个源的三个或更多个相干光束而被并入到可光限定的表面中，以及将衍射光栅图案映射到可光限定的表面。光学干涉图案的映射是通过三个或更多个光束的干涉产生的，诸如产生合适光谱的激光或其他光源。映射的光可定义表面可用于创建压花垫片。然后可以使用压花垫片来压印膜或纸。压花膜/纸可以金属化并层压在基板上，以产生当暴露于白光时具有各种视角的移动图案的产品。

7. 发明公开

EP2344932A1 IMPROVED MULTI-AXIS DIFFRACTION GRATING 审中-公开
标题翻译：改进的多轴衍射光栅
公开(公告)号：EP2344932A1
公开(公告)日：2011-07-20
申请号：EP09825563.1
申请日：2009-11-09
申请人： ILLINOIS TOOL WORKS INC.
发明人： SPOTO, Louis M. , RANDAZZO, Dean J. , DESCHNER, Matthew J.
IPC分类号： G03H1/04
CPC分类号： G02B5/1857 , G03H1/0244 , G03H1/028 , G03H1/04 , G03H1/265 , G03H2001/0296 , G03H2001/0482 , G03H2001/0497 , G03H2001/2239 , G03H2260/62
摘要： An enhanced optical interference pattern, such as a diffraction grating, is incorporated into a photodefineable surface by shining three or more beams of coherent light from a single source at a photodefinable surface, such as a photosensitive emulsion/photoresist covered glass or an ablatable substrate and mapping the diffraction grating pattern to the photodefinable surface. Mapping of the optical interference pattern is created by interference of three or more light beams, such as laser light or other light sources producing a suitable spectrum of light. The mapped photodefinable surface can be used to create embossing shims. The embossing shim can then be used to emboss film or paper. The embossed film/paper can be metalized and laminated onto a substrate to create a product that has shifting patterns at a variety of viewing angles when exposed to white light.

8. 发明公开

EP2344931A1 VOLUMENHOLOGRAMM MIT EXPANSIONSMITTELSCHICHT BZW. KONTRAKTIONSMITTELSCHICHT ZUR ERZEUGUNG VON FARBMUSTERN 失效
标题翻译：与膨胀剂层体积全息图或收缩剂层FOR彩色图案生产
公开(公告)号：EP2344931A1
公开(公告)日：2011-07-20
申请号：EP09748029.7
申请日：2009-10-16
申请人： OVD Kinegram AG
发明人： HANSEN, Achim , TOMPKIN, Wayne, Robert , BURKHARDT, Dr., Markus , SCHARFENBERG, Michael
IPC分类号： G03H1/00 , G03H1/18 , B42D15/10
CPC分类号： G03H1/0011 , B42D25/29 , B42D25/328 , B42D2033/14 , G03H1/028 , G03H1/18 , G03H1/181 , G03H1/182 , G03H1/202 , G03H2001/186 , G03H2001/207 , G03H2001/2231 , G03H2001/2271 , G03H2001/2289 , G03H2001/2635 , G03H2001/303 , G03H2223/12 , G03H2250/40 , G03H2250/44 , G03H2260/12 , G03H2270/23
摘要： The invention relates to a security element in the form of a multi-layer foil body containing a volume hologram layer (3) which is accommodated using a relief hologram (4). The Bragg grating of the volume hologram is expanded (8) locally using an expansion agent (5) or a contraction agent, in the form of a color image, for example, in order to add a second piece of optional information. A pattern, such as an image, is created either by partially imprinting the expansion agent or using an inserted mask layer (6) that is locally pervious to the expansion agent.

9. 发明公开

EP2297617A1 IMAGING OF DEEP STRUCTURES OR RELIEFS FOR SHALLOW RELIEF EMBOSSING 有权
标题翻译：图深部结构，救济冲压地势平坦
公开(公告)号：EP2297617A1
公开(公告)日：2011-03-23
申请号：EP09795160.2
申请日：2009-07-09
申请人： Illinois Tool Works Inc.
发明人： SPOTO, Louis, M. , RANDAZZO, Dean, J. , DESCHNER, Matt
IPC分类号： G03H1/04
CPC分类号： G03H1/028 , B29C59/04 , B29C2059/023 , G03H1/0244 , G03H1/0404 , G03H2001/0204 , G03H2001/0288 , G03H2001/0296 , G03H2001/185 , G03H2210/12 , G03H2210/30 , G03H2240/55 , G03H2260/14 , G03H2270/11
摘要： A variety of deep structured decorative patterns originate with mechanical relief or etching A deeply patterned or textured etching or relief is incorporated into a thin film embossing shim to simulate the look of the deep pattern or texture when used to emboss thin film or mateπal A transparent mold of the relief surface (such as brushed metal, engine-turned patterns, and textured glass) is formed using UV curable liquid and a transparent substrate The relief copy in the transparent mold or overlay is mapped onto a photoresist surface or plate by shining or expanding one or more laser beams through the transparent mold The thin film embossing shim is then used with conventional embossing equipment to form thin film embossings The embossed thin films can then be metalized and laminated onto substrate to create shifting patterns that reflect at a variety of viewing angles when exposed to white light.

10. 发明公开

EP2257841A2 SICHERHEITSELEMENT MIT POLARISATIONSMERKMAL 有权
标题翻译：极化特征的安全元件
公开(公告)号：EP2257841A2
公开(公告)日：2010-12-08
申请号：EP09705239.3
申请日：2009-01-28
申请人： Giesecke & Devrient GmbH
发明人： HOFFMÜLLER, Winfried , BURCHARD, Theodor , RENNER, Patrick
IPC分类号： G02B5/30 , B44F1/12 , B24D15/00 , G03H1/02
CPC分类号： B42D25/351 , B42D25/29 , B42D25/328 , B42D25/364 , B42D25/373 , B42D25/391 , B42D2033/20 , B42D2033/26 , B42D2035/36 , D21H21/40 , G02B5/3016 , G03H1/0011 , G03H1/02 , G03H1/0244 , G03H1/0252 , G03H1/028 , G03H2250/34 , G03H2250/36
摘要： The application relates to a security element (1) for safeguarding the authenticity of a value object, such as a security paper, a value document or a proprietary item, said security element (1) comprising a reflecting layer (13', 13") over which a phase delay layer (11', 11") is placed in at least a partial area or the entire surface, wherein the security element is characterized in that the reflecting layer is colored at least in a partial area by way of at least one coloring agent. The application also relates to methods for producing the security element, value objects containing the security element, and in general the use of the security element for product security. The security element is preferably designed as a transfer element.

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