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1. 发明公开

EP3161861A4 ANISOTROPIC ETCH OF COPPER USING PASSIVATION 审中-公开
公开(公告)号：EP3161861A4
公开(公告)日：2018-07-18
申请号：EP15815902
申请日：2015-06-04
申请人： TOKYO ELECTRON LTD
发明人： CHEN LEE , ZHANG YING
IPC分类号： C23F4/00 , C23G5/00 , H01J37/32
CPC分类号： C23F1/02 , C23F1/08 , C23F4/00 , C23G5/00 , H01J37/32862 , H01J2237/334
摘要： A method for anisotropically etching a feature in a Cu-containing layer includes providing a substrate having a Cu-containing layer and a patterned etch mask formed on the Cu-containing layer such that on exposed Cu-containing layer is exposed to processing through the patterned etch mask, passivating a first surface of the exposed Cu-containing layer, and inhibiting passivation of a second surface of the Cu-containing layer. A Cu compound is formed on said second surface of the Cu-containing layer, and the Cu compound is removed from the second surface of the Cu-containing layer to anisotropically etch a feature in the Cu-containing layer.

2. 发明公开

EP3227402A4 IMPROVED PROCESS FOR NiFe FLUXGATE DEVICE 有权
公开(公告)号：EP3227402A4
公开(公告)日：2018-06-27
申请号：EP15864348
申请日：2015-12-02
申请人： TEXAS INSTRUMENTS INC
发明人： EISSA MONA M , ZHANG YOUSONG , JENSON MARK
IPC分类号： C23F1/28 , C09K13/04 , C09K13/06 , C23F1/02 , G01R33/04 , H01L21/3213
CPC分类号： C23F1/28 , C09K13/06 , C23F1/02 , G01R33/04 , G03F7/0005 , H01L21/02107
摘要： An etchant for simultaneously etching NiFe and AlN with approximately equal etch rates that comprises phosphoric acid, acetic acid, nitric acid and deionized water. Alternating layers of NiFe and AlN may be used to form a magnetic core of a fluxgate magnetometer in an integrated circuit. The wet etch provides a good etch rate of the alternating layers with good dimensional control and with a good resulting magnetic core profile. The alternating layers of NiFe and AlN may be encapsulated with a stress relief layer. A resist pattern may be used to define the magnetic core geometry. The overetch time of the wet etch may be controlled so that the magnetic core pattern extends at least 1.5 um beyond the base of the magnetic core post etch. The photo mask used to form the resist pattern may also be used to form a stress relief etch pattern.

3. 发明公开

EP3335079A1 METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE 有权转让
公开(公告)号：EP3335079A1
公开(公告)日：2018-06-20
申请号：EP16834759.9
申请日：2016-07-27
申请人： Kateeva Inc
发明人： SHPAISMAN, Nava , FRENKEL, Moshe
IPC分类号： G03F1/92 , H05K3/06
CPC分类号： H05K3/061 , B41M5/0058 , C09D11/101 , C09D11/30 , C23F1/00 , C23F1/02 , G03F1/0023 , G03F7/2018 , H01L51/0004 , H01L51/0005 , H05K3/0002 , H05K3/0017 , H05K3/0079 , H05K2203/013 , H05K2203/0392 , H05K2203/0582 , H05K2203/1173
摘要： A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface- activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch resist mask.

4. 发明授权

EP2257969B1 METHODS OF PATTERNING A CONDUCTOR ON A SUBSTRATE 有权
标题翻译：在衬底上形成导体的方法
公开(公告)号：EP2257969B1
公开(公告)日：2017-12-20
申请号：EP09713944.8
申请日：2009-02-26
申请人： 3M Innovative Properties Company
发明人： ZU, Lijun, , FREY, Matthew H.
IPC分类号： H01L21/027 , G03F7/00
CPC分类号： G06F3/044 , B41M5/52 , B82Y10/00 , B82Y40/00 , C23F1/02 , C23F1/30 , G03F7/0002 , G06F3/041 , G06F2203/04103 , G06F2203/04112 , H05K1/0296 , H05K1/032 , H05K3/0079 , H05K3/061 , H05K2201/0108 , H05K2201/0133 , H05K2203/0108 , H05K2203/0537 , Y10T428/24802
摘要： A method of patterning a conductor on a substrate includes providing an inked elastomeric stamp inked with self-assembled monolayer-forming molecules and having a relief pattern with raised features. Then the raised features of the inked stamp contact a metal-coated visible light transparent substrate. Then the metal is etched to form an electrically conductive micropattern corresponding to the raised features of the inked stamp on the visible light transparent substrate.

5. 发明公开

EP3227402A1 IMPROVED PROCESS FOR NiFe FLUXGATE DEVICE 有权
标题翻译：镍铁助焊剂装置的改进工艺
公开(公告)号：EP3227402A1
公开(公告)日：2017-10-11
申请号：EP15864348.6
申请日：2015-12-02
申请人： Texas Instruments Incorporated
发明人： EISSA, Mona M. , ZHANG, Yousong , JENSON, Mark
IPC分类号： C09K13/04 , H01L21/3213
CPC分类号： C23F1/28 , C09K13/06 , C23F1/02 , G01R33/04 , G03F7/0005 , H01L21/02107
摘要： An etchant for simultaneously etching NiFe and AlN with approximately equal etch rates that comprises phosphoric acid, acetic acid, nitric acid and deionized water. Alternating layers of NiFe and AlN may be used to form a magnetic core of a fluxgate magnetometer in an integrated circuit. The wet etch provides a good etch rate of the alternating layers with good dimensional control and with a good resulting magnetic core profile. The alternating layers of NiFe and AlN may be encapsulated with a stress relief layer. A resist pattern may be used to define the magnetic core geometry. The overetch time of the wet etch may be controlled so that the magnetic core pattern extends at least 1.5 um beyond the base of the magnetic core post etch. The photo mask used to form the resist pattern may also be used to form a stress relief etch pattern.
摘要翻译：在所述实例中，用于以大致相同的蚀刻速率同时蚀刻NiFe和AlN的蚀刻剂包括磷酸，乙酸，硝酸和去离子水。可以使用NiFe和AlN的交替层来形成集成电路（100）中的磁通门磁强计的磁芯（120）。湿蚀刻提供良好的尺寸控制和良好的磁芯轮廓的交替层的良好蚀刻速率。 NiFe和AlN的交替层可以用应力消除层（118,122）封装。可以使用抗蚀剂图案来限定磁芯几何形状。可以控制湿蚀刻的过度时间，使得磁芯图案延伸超过磁芯后蚀刻的基底至少1.5微米。用于形成抗蚀剂图案的光掩模也可用于形成应力消除蚀刻图案。

6. 发明公开

EP3062907A4 ISLAND ETCHED FILTER PASSAGES 审中-公开
标题翻译： INSELGEÄTZTEFILTERDURCHGÄNGE
公开(公告)号：EP3062907A4
公开(公告)日：2017-08-16
申请号：EP13896580
申请日：2013-10-30
申请人： HEWLETT-PACKARD DEV COMPANY L P
发明人： MCKAY ROGER A , SADIK PATRICK W
IPC分类号： B01D39/14 , B01D67/00 , B01D69/02 , B81B7/00 , B81C1/00 , C23C14/58 , C23C18/16 , C23F1/00 , C23F1/14
CPC分类号： B01D29/0093 , B01D35/02 , B01D67/0032 , B01D69/02 , B01D2325/021 , B81B7/0061 , C23C14/5873 , C23C18/1603 , C23F1/00 , C23F1/02
摘要： A method comprises forming etching islands on a substrate and exposing the substrate with etching islands to a solution that reacts with the etching islands to form a filter passage of interconnected pores in the substrate. The filter passage has an inlet into the substrate and an outlet from the substrate.
摘要翻译：一种方法包括在基板上形成蚀刻岛并且将具有蚀刻岛的基板暴露于溶液，该溶液与蚀刻岛反应以在基板中形成互连孔的过滤器通道。过滤器通道具有进入基板的入口和来自基板的出口。

7. 发明公开

EP3146015A2 JETTABLE INKS FOR SOLAR CELL AND SEMICONDUCTOR FABRICATION 审中-公开
标题翻译：。ARE。。。。。。。。。。。。。。。。。。。
公开(公告)号：EP3146015A2
公开(公告)日：2017-03-29
申请号：EP15796809.0
申请日：2015-05-19
申请人： Alpha Metals, Inc.
发明人： PROKOPIAK, Steven , TORMEY, Ellen, S. , KHASELEV, Oscar , MARCZI, Michael, T. , SINGH, Bawa
IPC分类号： C09K13/00
CPC分类号： C23F1/16 , C23F1/02 , H01L21/32134 , H01L31/02168 , H01L31/022425 , H01L31/022441 , H01L31/02363 , H01L31/18 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A jettable etchant composition includes 1 to 90 wt % active ingredient, and a remainder containing any combination of the following: 10 to 90 wt % solvent, 0 to 10 wt % reducing agents,
摘要翻译：可喷射蚀刻剂组合物包含1至90重量％的活性成分，余量包含以下任意组合：10至90重量％的溶剂，0至10重量％的还原剂，1至20重量％的酸洗剂，0至5 wt％表面活性剂和0-5wt％消泡剂。该组合物还可以包含含有至少一种元素的可溶性化合物，当溶解时，具有比被蚀刻金属更高的标准电极电位或含有IA族元素的可溶性化合物和可溶性铂族金属。油墨组合物可以包括在溶剂系统中的VA族化合物或IIIA族化合物，其配制成在约5至约10皮升的液滴体积的表面上可喷射，并获得小于约20Ω/ 激活后表面的α。

8. 发明公开

EP2021519A4 A METHOD AND COMPOSITION FOR SELECTIVELY STRIPPING NICKEL FROM A SUBSTRATE 审中-公开
标题翻译：方法和组合物镍底物的选择性分离
公开(公告)号：EP2021519A4
公开(公告)日：2016-11-09
申请号：EP07775959
申请日：2007-04-20
申请人： OMG ELECTRONIC CHEMICALS INC
发明人： BERNARDS ROGER FRANCIS , BOWERS JOSEPH S
IPC分类号： C22B3/16 , H01L21/3213 , H05K3/00 , H05K3/06
CPC分类号： C23F1/02 , C23F1/28 , C23F1/44 , H05K3/067 , H05K2203/0361

9. 发明授权

EP2449547B1 ELECTRONIC DISPLAYS AND METAL MICROPATTERNED SUBSTRATES HAVING A GRAPHIC 有权
标题翻译：美国麻醉科学院金属学家麻省理工学院EINKTRONISCHE ANZEIGEN
公开(公告)号：EP2449547B1
公开(公告)日：2016-09-21
申请号：EP10730630.0
申请日：2010-06-18
申请人： 3M Innovative Properties Company
发明人： MORAN, Cristin E. , FREY, Matthew H.
IPC分类号： G09F13/16 , G09F13/12 , G09F9/30
CPC分类号： H05K1/0296 , C23F1/02 , C23F1/14 , G09F9/30 , G09F13/02 , G09F13/16

10. 发明授权

EP2573193B1 METHOD FOR PRODUCING UNIDIRECTIONAL ELECTROMAGNETIC STEEL SHEET 有权
标题翻译：用于生产单向电磁钢板
公开(公告)号：EP2573193B1
公开(公告)日：2016-08-17
申请号：EP11797972.4
申请日：2011-06-03
申请人： Nippon Steel & Sumitomo Metal Corporation
发明人： IWATA, Keiji , KIKUCHI, Yasuhiro
IPC分类号： C21D8/12 , C23F1/02 , C25F3/14
CPC分类号： C21D8/1294 , C21D6/008 , C21D8/12 , C21D8/1255 , C21D9/46 , C21D2201/05 , C21D2221/00 , C22C1/02 , C22C38/00 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/06 , C23F1/00 , C23F1/02 , C23F1/14 , C25F3/06 , H01F1/14783 , H01F1/16

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