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1. 发明授权

EP1927100B1 LAYER COMPOSITIONS FOR PROTECTION OF DISPLAY CELL STRUCTURES AND ELECTRODES 有权
公开(公告)号：EP1927100B1
公开(公告)日：2018-08-29
申请号：EP06814977.2
申请日：2006-09-18
申请人： E Ink California, LLC
发明人： ZANG, HongMei , REN, Kangtai , HOU, Jack , WANG, Wanheng , CHANG, Chia-Pu , CHEN, Jing-Den , CHEN, Yajuan , WANG, Fei , CHAUG, Yi-Shung
IPC分类号： G02F1/167
CPC分类号： G02F1/167 , C08G18/3814 , C08G18/5015 , C08G18/6677 , C08G18/792 , C09D175/16 , G02F2202/023 , Y10T428/1036 , Y10T428/1059
摘要： The invention is directed to compositions of display cell structure and electrode protecting layers for improving the performance of display devices. The composition comprises a polar oligomeric or polymeric material having a glass transition temperature below about 100° C., and the resulting display cells or electrode protecting layer have an average crosslinking density of below about 1 crosslink point per 80 Dalton molecular weight.

2. 发明公开

EP3328584A1 POLYMERIC LAPPING MATERIALS, MEDIA AND SYSTEMS INCLUDING POLYMERIC LAPPING MATERIAL, AND METHODS OF FORMING AND USING SAME 审中-公开
公开(公告)号：EP3328584A1
公开(公告)日：2018-06-06
申请号：EP16831376.5
申请日：2016-07-28
申请人： JH Rhodes Company, Inc.
发明人： WASILCZYK, George , MUNCY, Brent , DASKIEWICH, Scott
IPC分类号： B24B37/14 , B24B37/27 , B24B37/34
CPC分类号： B24B37/24 , C08G18/10 , C08G18/12 , C08G18/3206 , C08G18/4854 , C08G18/6674 , C08G18/7621 , C08G2101/005 , C08J9/0066 , C08J2205/044 , C08J2363/02 , C08J2375/08 , C08G18/3814
摘要： A polymeric material suitable for use in lapping processes, media including the polymeric material, systems including the media, and methods of forming and using the polymeric material are disclosed. The polymeric material can be used to lap hard surfaces, such as sapphire surfaces. The lapping process can be performed after a grinding process and before a polishing process.

3. 发明授权

EP2806453B1 POLISHING PAD AND METHOD FOR PRODUCING SAME 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：EP2806453B1
公开(公告)日：2018-05-02
申请号：EP12841356.4
申请日：2012-10-12
申请人： Fujibo Holdings, Inc.
发明人： ITOYAMA Kouki , MIYAZAWA Fumio
IPC分类号： H01L21/304 , B24B37/20 , B24B37/24 , C08G18/32
CPC分类号： B24B37/24 , C08G18/3814 , C08G18/4854 , C08G18/7621 , C08G2101/00 , C08G2101/0066 , C08K2201/005 , H01L21/31053 , C08G18/10 , C08G18/6685 , C08G18/3206
摘要： Provided are: a polishing pad which is capable of alleviating a scratch problem that occurs when a conventional hard (dry) polishing pad is used, and which is excellent in polishing rate and polishing uniformity and is usable not only for primary polishing but also for finish polishing; and a method for producing the polishing pad. The polishing pad is for polishing a semiconductor device and includes a polishing layer having a polyurethane-polyurea resin molded body containing cells of a substantially spherical shape. The polyurethane-polyurea resin molded body has a ratio of closed cells of 60 to 98%. The polyurethane-polyurea resin molded body has a ratio tan´ of a loss modulus E" to a storage modulus E' (loss modulus/storage modulus) of 0.15 to 0.30. The storage modulus E' is 1 to 100 MPa. The polyurethane-polyurea resin molded body has a density D of 0.4 to 0.8 g/cm 3 .

4. 发明公开

EP3046944A1 VERFAHREN ZUR HERSTELLUNG VON ORGANISCHEN AEROGELEN AUF BASIS VON ISOCYANAT 审中-公开
标题翻译：用于生产有机气凝胶基于异氰酸酯
公开(公告)号：EP3046944A1
公开(公告)日：2016-07-27
申请号：EP14758983.2
申请日：2014-09-05
申请人： BASF SE
发明人： FRICKE, Marc , WEINRICH, Dirk
IPC分类号： C08G18/76 , C08J9/28 , C08G18/22 , C08G18/30 , C08G18/32 , C08G101/00
CPC分类号： C08J9/28 , C08G18/225 , C08G18/302 , C08G18/3243 , C08G18/3814 , C08G18/7664 , C08G2101/0091 , C08J9/286 , C08J2201/0502 , C08J2201/0522 , C08J2205/026 , C08J2375/02 , C08J2375/04 , E04B1/80 , Y02A30/243 , Y02B80/14
摘要： The invention relates to a method for producing aerogels consisting of reacting at least one multi-functional isocyanate with at least one multi-functional aromatic amine in the presence of at least one carboxylate as a catalysator and a solvent. The invention also relates to the thus obtained areogels and to the use of said areogels as insulators, in particular in the field of construction and in vacuum isolation panels.

5. 发明公开

EP2698809A4 POLISHING PAD AND MANUFACTURING METHOD THEREFOR 审中-公开
标题翻译：抛光垫上，及其制造方法
公开(公告)号：EP2698809A4
公开(公告)日：2015-03-04
申请号：EP12770798
申请日：2012-04-16
申请人： FUJIBO HOLDINGS INC
发明人： ITOYAMA KOUKI , MIYAZAWA FUMIO
IPC分类号： H01L21/304 , B24B37/24 , C08J5/14
CPC分类号： B24B37/24 , B24B37/22 , C08G18/10 , C08G18/4854 , C08G18/7621 , C08G2101/0008 , C08J9/12 , C08J2207/00 , C08J2375/04 , H01L21/304 , C08G18/3814 , C08G18/4829
摘要： Provided are a polishing pad which remedies the problem of scratches occurring when a conventional hard (dry) polishing pad is used, which is excellent in polishing rate and polishing uniformity, and which can be used for not only primary polishing but also finish polishing, and a manufacturing method therefor. The polishing pad is a polishing pad for polishing a semiconductor device, comprising a polishing layer having a polyurethane-polyurea resin foam containing substantially spherical cells, wherein an M-component of the polyurethane-polyurea resin foam has a spin-spin relaxation time T2 of 160 to 260 µs, the polyurethane-polyurea resin foam has a storage elastic modulus E' of 1 to 30 MPa, the storage elastic modulus E' being measured at 40°C with an initial load of 10 g, a strain range of 0.01 to 4%, and a measuring frequency of 0.2 Hz in a tensile mode, and the polyurethane-polyurea resin foam has a density D in a range from 0.30 to 0.60 g/cm 3 .

6. 发明公开

EP2698809A1 POLISHING PAD AND MANUFACTURING METHOD THEREFOR 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：EP2698809A1
公开(公告)日：2014-02-19
申请号：EP12770798.2
申请日：2012-04-16
申请人： Fujibo Holdings, Inc.
发明人： ITOYAMA Kouki , MIYAZAWA Fumio
IPC分类号： H01L21/304 , B24B37/24 , C08J5/14
CPC分类号： B24B37/24 , B24B37/22 , C08G18/10 , C08G18/4854 , C08G18/7621 , C08G2101/0008 , C08J9/12 , C08J2207/00 , C08J2375/04 , H01L21/304 , C08G18/3814 , C08G18/4829
摘要： Provided are a polishing pad which remedies the problem of scratches occurring when a conventional hard (dry) polishing pad is used, which is excellent in polishing rate and polishing uniformity, and which can be used for not only primary polishing but also finish polishing, and a manufacturing method therefor. The polishing pad is a polishing pad for polishing a semiconductor device, comprising a polishing layer having a polyurethane-polyurea resin foam containing substantially spherical cells, wherein an M-component of the polyurethane-polyurea resin foam has a spin-spin relaxation time T2 of 160 to 260 µs, the polyurethane-polyurea resin foam has a storage elastic modulus E' of 1 to 30 MPa, the storage elastic modulus E' being measured at 40°C with an initial load of 10 g, a strain range of 0.01 to 4%, and a measuring frequency of 0.2 Hz in a tensile mode, and the polyurethane-polyurea resin foam has a density D in a range from 0.30 to 0.60 g/cm 3 .
摘要翻译：本发明提供一种抛光垫，该抛光垫能够解决使用传统的硬质（干）抛光垫时出现的划痕问题，该抛光垫具有优异的抛光速率和抛光均匀性，并且不仅可以用于一次抛光，而且可以用于精抛光，其制造方法。该抛光垫是用于抛光半导体器件的抛光垫，其包括具有基本上球形电池的聚氨酯 - 聚脲树脂发泡体的抛光层，其中聚氨酯 - 聚脲树脂发泡体的M成分的自旋 - 自旋弛豫时间T2为 160〜260μs时，聚氨酯 - 聚脲树脂发泡体的储能弹性模量E'为1〜30MPa，储能弹性模量E'在40℃，初始负荷10g，应变范围0.01〜 4％，拉伸模式下的测定频率为0.2Hz，聚氨酯 - 聚脲树脂发泡体的密度D为0.30〜0.60g / cm 3。

7. 发明授权

EP1057841B1 Urethane molded products for polishing pad and method for making same 有权
标题翻译： Polyurethanformteilchen用于抛光垫及其制造方法
公开(公告)号：EP1057841B1
公开(公告)日：2012-05-30
申请号：EP99306858.4
申请日：1999-08-27
申请人： Fujibo Holdings Inc.
发明人： Kihara, Katushi , Mochizuki, Yoshimi
IPC分类号： C08G18/12 , C08L75/02 , B24B37/04 , C08K7/22 , C08L75/04 , C08J9/32
CPC分类号： C08J9/32 , C08G18/12 , C08G18/4854 , C08G18/6674 , C08J2203/22 , C08J2375/04 , Y10T428/249972 , Y10T428/249986 , C08G18/3814 , C08G18/6685 , C08G18/3868

8. 发明授权

EP1546229B1 POLYURETHANE AND POLYURETHANE-UREA ELASTOMERS FROM POLYTRIMETHYLENE ETHER GLYCOL 有权
标题翻译：聚氨酯和聚氨酯脲弹性体从丙二
公开(公告)号：EP1546229B1
公开(公告)日：2012-02-08
申请号：EP02807679.2
申请日：2002-10-24
申请人： E.I. DU PONT DE NEMOURS AND COMPANY
发明人： SUNKARA, Hari Babu , MCINNIS, Edwin, L.
IPC分类号： C08G18/48 , C08G18/32 , C08G18/10 , C08G18/08 , C07C269/02 , C07C271/08
CPC分类号： C08G65/34 , C08G18/10 , C08G18/4825 , C08G18/3206 , C08G18/3814 , C08G18/3868
摘要： Polyurethanes or polyurethane-ureas prepared from: (a) polytrimethylene ether glycol having a number average molecular weight in the range of about 1,000 to about 4,000 and unsaturated end groups in the range of about 0.003 to about 0.015 meq/g; (b) diisocyanate; and (c) diol or diamine chain extender; and their manufacture, intermediates and use.

9. 发明公开

EP2283053A1 POLYHARNSTOFFZUSAMMENSETZUNG 审中-公开
公开(公告)号：EP2283053A1
公开(公告)日：2011-02-16
申请号：EP09749548.5
申请日：2009-05-07
申请人： Bayer MaterialScience AG
发明人： SCHMIDT, Axel , HOMANN, Malte , AUS DER WIESCHEN, Andreas
IPC分类号： C08G18/10 , C08G18/38 , C08G18/78 , C09D175/02
CPC分类号： C09D175/02 , C08G18/10 , C08G18/3234 , C08G18/324 , C08G18/3814 , C08G18/3821 , C08G18/7837 , C08G2390/40 , Y10T428/139 , Y10T428/1393 , C08G18/792
摘要： The invention relates to materials having a higher flexural modulus which consist of polyurea compositions.

10. 发明公开

EP2262842A2 2,2'-MDI-BASIERTE ISOCYANAT-MISCHUNGEN UND IHRE HERSTELLUNG SOWIE VERWENDUNG 有权
标题翻译： 2,2'- MDI-异氰酸酯混合物及其生产和使用
公开(公告)号：EP2262842A2
公开(公告)日：2010-12-22
申请号：EP09724858.7
申请日：2009-03-14
申请人： Bayer MaterialScience AG , Polytex Sportbeläge Produktions-GmbH
发明人： FINDER, Zdenka , KRAUSE, Jens , FAEHLING, Friedhelm , SCHMIDT, Manfred , WEGENER, Dirk
IPC分类号： C08G18/08 , C08G18/10 , C08G18/30 , C08G18/76 , C08G18/38
CPC分类号： C08G18/4854 , C08G18/0852 , C08G18/10 , C08G18/307 , C08G18/3821 , C08G18/4238 , C08G18/4825 , C08G18/4845 , C08G18/7671 , D06N7/0071 , C08G18/3814
摘要： The invention relates to 2,2'-diphenylmethane diisocyanate (2,2'-MDI)-based isocyanate mixtures, to a method for producing the same and to their use in the production of polyisocyanate polyaddition products.
摘要翻译：异氰酸酯的混合物，其包括：（a）具有1.5 NCO含量为18重量％的NCO预聚物。和（b）1到单体2,2'- diisocyanatodiphenylmethanes的40重量％，基于所述异氰酸酯混合物。 worin异氰酸酯混合物具有从2至22重量％的总NCO含量。由其制备多异氰酸酯的加聚产物; 及其制备方法。

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