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1. 发明公开

EP3170801A1 METHOD TO PROTECT FEATURES DURING REPAIR CYCLE 有权
标题翻译：修复循环过程中保护特征的方法
公开(公告)号：EP3170801A1
公开(公告)日：2017-05-24
申请号：EP16199367.0
申请日：2016-11-17
申请人： General Electric Company
发明人： WEAVER, Jared Hogg , CORMAN, Gregory Scot , KEBBEDE, Anteneh , DUNN, Daniel Gene , MAGNANT, Jerome Geoffrey
IPC分类号： C04B41/85 , F01D5/28
CPC分类号： C23C16/045 , C04B41/009 , C04B41/52 , C04B41/85 , F01D5/005 , F01D5/282 , F01D5/284 , F05D2300/6033 , C04B35/80 , C04B41/4592 , C04B41/5027 , C04B41/5062 , C04B41/522 , C04B41/4523 , C04B41/4572 , C04B41/4531
摘要： A method includea applying a mask (216) to a ceramic matrix composite (CMC) structure (10), and subjecting the structure having an applied mask to a process for repair. In one embodiment, the applying a mask (216) to a CMC structure (10) can include applying a mask (216) to a feature (212) of a CMC structure (10).
摘要翻译：一种方法包括将掩模（216）施加到陶瓷基质复合材料（CMC）结构（10），并且将具有施加的掩模的结构进行修复处理。在一个实施例中，将掩模（216）施加到CMC结构（10）可以包括将掩模（216）施加到CMC结构（10）的特征（212）。

2. 发明公开

EP1293313A4 CERAMIC BODY PRODUCING METHOD 有权
标题翻译：用于生产陶瓷体
公开(公告)号：EP1293313A4
公开(公告)日：2005-08-17
申请号：EP01919917
申请日：2001-04-12
申请人： NGK INSULATORS LTD
发明人： NISHI HIDEAKI , ITO EIJI , KONDO YOSHIMASA
IPC分类号： B01D46/00 , B01D46/24 , B01J35/04 , B28B11/00 , C04B38/00 , F01N3/022
CPC分类号： B01D46/2418 , B01D46/0001 , B01D46/2466 , B01J35/04 , B28B11/006 , B28B11/007 , C04B38/0006 , C04B38/0012 , F01N3/0222 , F01N3/2828 , F01N2330/06 , Y02T10/20 , C04B35/00 , C04B41/4592
摘要： A ceramic body producing method in which a ceramic body of a construction in which in the opposite end surfaces of a ceramic honeycomb structure, the cells are alternately sealed is obtained by filling sealing slurry in predetermined cells in the opposite end surfaces of a ceramic honeycomb molding, comprising the steps of filling a sealant in advance in the cells which are desired to open in the end surfaces of the ceramic honeycomb molding, immersing the surface filled with a masking sealant in sealing slurry, filling the sealing slurry in predetermined cells not filled with the masking sealant, followed by drying and firing, the masking sealant being removed during the drying or firing.

3. 发明授权

EP2010466B1 VERFAHREN ZUR VERHINDERUNG DER BEIM VERFUGEN VON PFLASTERSTEINBELÄGEN AUFTRETENDEN FLECKENBILDUNG 有权转让
标题翻译： VERFAHREN ZUR VERHINDERUNG DER BEIM VERFUGEN VONPFLASTERSTEINBELÄGENAUFTRETENDEN FLECKENBILDUNG
公开(公告)号：EP2010466B1
公开(公告)日：2009-08-26
申请号：EP07724536.3
申请日：2007-04-24
申请人： Construction Research and Technology GmbH
发明人： KAISER, Robert , EISENREICH, Andreas , GLASER, Werner , GRAF, Wilhelm
IPC分类号： C04B41/48
CPC分类号： C04B41/4592 , C04B2111/60 , C04B41/46 , C04B41/4803 , C04B41/502 , C04B41/4834 , C04B41/4869
摘要： A method of preventing the spot formation which occurs on the surface of paving stones when joining paving stones by means of reactive resin mortars, wherein a) a protective layer (A) comprising A 1 ) from 5 to 99.5% by weight of a water-soluble and/or water-dispersible polymer, A 2 ) from 0.5 to 35% by weight of an evaporation accelerator selected from the group consisting of alcohols, glycol ethers, ketones and any mixtures thereof, A 3 ) if appropriate, water as balance is applied to the paving stones before joining, b) after drying of the protective layer, the reactive resin mortar is introduced and c) after curing of the reactive resin mortar, the protective layer (A) is cleaned off together with the adhering reactive resin residues by means of water, is described. The method of the invention makes rapid joining of paving stones by means of reactive resin mortars and reliable prevention of spot formation on the surface of these paving stones possible.
摘要翻译：一种防止在通过反应性树脂砂浆接合铺路石时在铺路石表面上发生的斑点形成的方法，其中a）保护层（A）包含A1）5-99.5重量％的水溶性和/或水分散性聚合物，A2）0.5-35重量％选自醇，乙二醇醚，酮及其任何混合物的蒸发促进剂，A3）如果合适，将水作为余量施用于 b）在保护层干燥之后，引入反应性树脂砂浆，和c）在反应性树脂砂浆固化之后，通过借助于粘合的反应性树脂残余物将保护层（A）与粘合的反应性树脂残余物水被描述。本发明的方法通过反应性树脂砂浆快速连接铺路石，并可靠地防止这些铺路石表面上的斑点形成。

4. 发明公开

EP1293313A1 CERAMIC BODY PRODUCING METHOD 有权
标题翻译：用于生产陶瓷体
公开(公告)号：EP1293313A1
公开(公告)日：2003-03-19
申请号：EP01919917.3
申请日：2001-04-12
申请人： NGK INSULATORS, LTD.
发明人： NISHI, Hideaki , ITO, Eiji , KONDO, Yoshimasa
IPC分类号： B28B1/00 , F01N3/28
CPC分类号： B01D46/2418 , B01D46/0001 , B01D46/2466 , B01J35/04 , B28B11/006 , B28B11/007 , C04B38/0006 , C04B38/0012 , F01N3/0222 , F01N3/2828 , F01N2330/06 , Y02T10/20 , C04B35/00 , C04B41/4592
摘要： A method of producing a ceramic body having a construction such that cells are plugged alternately at both end faces of a ceramic honeycomb structural body by filling a plugging slurry into predetermined cells at both end faces of a ceramic honeycomb formed body, having the steps of: filling a plugging material for mask into the cells to be opened at one end face of the ceramic honeycomb formed body; immersing the end face, to which the plugging material for mask is filled, into a plugging slurry; and drying and sintering the ceramic honeycomb formed body while the plugging material for mask is removed during a drying step or a sintering step.

5. 发明公开

EP0872460A1 Procédé de traitement de céramiques, notamment à base d'oxyde de zirconium 失效
标题翻译：一种基于氧化锆处理的陶瓷材料，特别是陶瓷方法
公开(公告)号：EP0872460A1
公开(公告)日：1998-10-21
申请号：EP98400902.7
申请日：1998-04-10
申请人： C.S.E.M. CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA
发明人： Haenni, Werner , Dan, Jean-Pierre
IPC分类号： C04B41/91
CPC分类号： C04B41/009 , C04B41/53 , C04B41/91 , C04B2111/94 , C04B41/4519 , C04B41/4556 , C04B41/4592 , C04B41/5133 , C04B35/48
摘要： L'invention concerne le traitement des céramiques en vue de permettre leur usinage par des procédés de type électroérosion ou usinage électrochimique.
Le procédé de l'invention consiste à :

(a) chauffer les pièces de céramique dans une atmosphère sans oxygène de manière à obtenir une pièce conductrice de l'électricité, et
(b) modifier la pièce résultant de l'opération (a) par enlèvement ou dépôt de matière par au moins un procédé mettant en oeuvre un courant électrique.

L'invention est applicable à la fabrication des guides de fils textiles, micro-roues, micro-engrenages, pièces d'horlogerie, implants dentaires ou outils de précision.
摘要翻译：一种用于治疗的陶瓷工艺（尤其是氧化物类陶瓷锆）包括部分（a）加热在无氧气的气氛中，以获得在导电部分; （B）通过材料的去除或沉积操作修改部使用电流的哪个; 和（c）在碱性氧气或含氧化合物的气氛中加热，以恢复原始部分的介电性能。

6. 发明公开

EP0677500A2 Multiple level mask for patterning of ceramic materials 失效
标题翻译： Mehrschichtige Maskefürdie Strukturierung von keramischen Materialien。
公开(公告)号：EP0677500A2
公开(公告)日：1995-10-18
申请号：EP95104916.2
申请日：1995-04-03
申请人： TEXAS INSTRUMENTS INCORPORATED
发明人： Belcher, James F. , Long, John P. , Frank, Steven N. , Jones, Jeanee
IPC分类号： C04B41/53 , H01L27/148 , H01L27/146
CPC分类号： C04B41/009 , C04B41/5338 , C04B41/91 , C04B2111/00844 , H01L27/1465 , H01L37/02 , Y10S438/951 , C04B41/4562 , C04B41/4592 , C04B35/00 , C04B35/465
摘要： A novel multiple level mask (e.g. tri-level mask 36) process for masking achieves a desired thick mask with substantially vertical walls and thus improves the ion milling process of ceramic materials (e.g. BST). An embodiment of the present invention is a microelectronic structure comprising a ceramic substrate, an ion mill mask layer (e.g. photoresist 42) overlaying the substrate, a dry-etch-selective mask layer (e.g. TiW 40) overlaying the ion mill mask layer, the dry-etch-selective mask layer comprising a different material than the ion mill mask layer, a top photosensitive layer (38) overlaying the dry-etch-selective mask layer, the top photosensitive layer comprising a different material than the dry-etch-selective mask layer, and a predetermined pattern formed in the top photosensitive layer, the dry-etch-selective mask layer and the ion mill mask layer. The predetermined pattern has substantially vertical walls in the ion mill mask layer.
摘要翻译：用于掩蔽的新型多层掩模（例如三层掩模36）工艺实现了具有基本垂直壁的期望的厚掩模，并因此改善了陶瓷材料（例如BST）的离子研磨过程。本发明的一个实施例是一种微电子结构，其包括陶瓷衬底，覆盖衬底的离子磨掩模层（例如光致抗蚀剂42），覆盖离子磨掩模层的干蚀刻选择性掩模层（例如TiW 40）干蚀刻选择性掩模层，其包括与离子磨掩模层不同的材料，覆盖干蚀刻选择性掩模层的顶部光敏层（38），顶部光敏层包含与干蚀刻选择性不同的材料掩模层，以及形成在顶部光敏层中的预定图案，干蚀刻选择掩模层和离子磨掩模层。该预定图案在离子磨掩模层中具有基本垂直的壁。

7. 发明授权

EP2116347B1 Method for manufacturing a sealed honeycomb structure 有权
标题翻译：一种用于制造蜂窝结构插入方法
公开(公告)号：EP2116347B1
公开(公告)日：2013-08-21
申请号：EP07831579.3
申请日：2007-11-09
申请人： NGK Insulators, Ltd.
发明人： ITO, Koichi , TOKUNAGA, Takeshi
IPC分类号： B28B11/00 , C04B41/52 , C04B41/89 , F01N3/022 , C04B41/00
CPC分类号： F01N3/0222 , B28B11/006 , B28B11/007 , C04B41/009 , C04B41/52 , C04B41/89 , C04B2111/00793 , F01N2330/06 , F01N2450/28 , Y02T10/20 , C04B41/4503 , C04B41/4572 , C04B41/4592 , C04B41/48 , C04B41/4539 , C04B41/4574 , C04B41/5024 , C04B41/5059 , C04B41/522 , C04B35/00 , C04B38/0006

8. 发明公开

EP2116347A1 METHOD FOR MANUFACTURING SEALED HONEYCOMB STRUCTURE 有权
标题翻译：维尔法赫恩·祖尔·赫斯特伦
公开(公告)号：EP2116347A1
公开(公告)日：2009-11-11
申请号：EP07831579.3
申请日：2007-11-09
申请人： NGK Insulators, Ltd.
发明人： ITO, Koichi , TOKUNAGA, Takeshi
IPC分类号： B28B11/02 , B01D39/20 , C04B37/00 , F01N3/022
CPC分类号： F01N3/0222 , B28B11/006 , B28B11/007 , C04B41/009 , C04B41/52 , C04B41/89 , C04B2111/00793 , F01N2330/06 , F01N2450/28 , Y02T10/20 , C04B41/4503 , C04B41/4572 , C04B41/4592 , C04B41/48 , C04B41/4539 , C04B41/4574 , C04B41/5024 , C04B41/5059 , C04B41/522 , C04B35/00 , C04B38/0006
摘要： A method of manufacturing a plugged honeycomb structure 30 including a honeycomb substrate 1 and plugging portions 15 arranged so as to form complementary checkered patterns at both end surfaces 11 and 21 of the honeycomb substrate 1; which comprises attaching a first mask film 4a to the first end surface 11 of the honeycomb substrate 1, making slurry permeation holes 3a to introduce a plugging slurry 6, attaching a second mask film 4b to the second end surface 21 of the honeycomb substrate 1, makes slurry permeation holes 3b, allowing air to flow into the cells 2 so as to discharge air giving a pressure of 0.05 to 5 MPa between the first mask film 4a and the honeycomb substrate 1; and filling cell opening end portions 7 with the plugging slurry 6 to fire the resultant slurry filled substrate 20.
摘要翻译：蜂窝基板1的两端面11,21上形成有形成互补花纹图案的蜂窝基板1和堵塞部15的堵塞蜂窝结构体30的制造方法，其包括将第一掩模膜4a附接到蜂窝基板1的第一端面11，使得浆料渗透孔3a引入封堵浆料6，将第二掩模膜4b附接到蜂窝基板1的第二端面21，使第一掩模膜4a和蜂窝基板1之间的空气流入电池单元2，排出空气，得到0.05〜5MPa的压力; 并且用封堵浆料6填充电池开口端部7以对所填充的浆料填充衬底20进行点火。

9. 发明授权

EP0872460B1 Procédé de traitement de céramiques, notamment à base d'oxyde de zirconium 失效
标题翻译：一种基于氧化锆处理的陶瓷材料，特别是陶瓷方法
公开(公告)号：EP0872460B1
公开(公告)日：2001-09-05
申请号：EP98400902.7
申请日：1998-04-10
申请人： C.S.E.M. CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA
发明人： Haenni, Werner , Dan, Jean-Pierre
IPC分类号： C04B41/91
CPC分类号： C04B41/009 , C04B41/53 , C04B41/91 , C04B2111/94 , C04B41/4519 , C04B41/4556 , C04B41/4592 , C04B41/5133 , C04B35/48

10. 发明公开

EP0677500A3 Multiple level mask for patterning of ceramic materials 失效
标题翻译：多层掩模陶瓷材料的图案化。
公开(公告)号：EP0677500A3
公开(公告)日：1996-05-15
申请号：EP95104916.2
申请日：1995-04-03
申请人： TEXAS INSTRUMENTS INCORPORATED
发明人： Belcher, James F. , Long, John P. , Frank, Steven N. , Jones, Jeanee
IPC分类号： C04B41/53 , H01L27/148 , H01L27/146
CPC分类号： C04B41/009 , C04B41/5338 , C04B41/91 , C04B2111/00844 , H01L27/1465 , H01L37/02 , Y10S438/951 , C04B41/4562 , C04B41/4592 , C04B35/00 , C04B35/465
摘要： A novel multiple level mask (e.g. tri-level mask 36) process for masking achieves a desired thick mask with substantially vertical walls and thus improves the ion milling process of ceramic materials (e.g. BST). An embodiment of the present invention is a microelectronic structure comprising a ceramic substrate, an ion mill mask layer (e.g. photoresist 42) overlaying the substrate, a dry-etch-selective mask layer (e.g. TiW 40) overlaying the ion mill mask layer, the dry-etch-selective mask layer comprising a different material than the ion mill mask layer, a top photosensitive layer (38) overlaying the dry-etch-selective mask layer, the top photosensitive layer comprising a different material than the dry-etch-selective mask layer, and a predetermined pattern formed in the top photosensitive layer, the dry-etch-selective mask layer and the ion mill mask layer. The predetermined pattern has substantially vertical walls in the ion mill mask layer.

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