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    • 2. 发明公开
    • PROCESS FOR PRODUCING OPTICAL FIBER PREFORM
    • 制造方法的光纤预制件
    • EP1808419A4
    • 2011-09-07
    • EP05795596
    • 2005-10-20
    • SUMITOMO ELECTRIC INDUSTRIES
    • NAKANISHI THIRANO M
    • C03B37/018
    • C03B37/01823C03B2207/66Y02P40/57
    • The present invention provides a method for producing an optical fiber preform, in which method it is possible to synthesize and deposit glass at a high rate by the inside CVD method using a plasma burner as a heat source in a manner such that unconsolidated portions or bubbles are little generated in the optical fiber preform. The method includes a step of depositing a glass film on the inner wall surface of a starting pipe, the wall thickness of which is d (mm), by heating from the outer circumferential surface of the pipe while a gas containing a glass raw material is introduced into the pipe, the plasma burner being moved in parallel with the axis of the pipe, wherein in a first embodiment, the temperature is controlled not to exceed (1800 + 100×d)°C, a temperature of (1100 + 100×d)°C or higher being continued for 20 seconds or more at each point of the starting pipe. In a second embodiment of the invention, the plasma burner includes at least two inlets for gases for forming plasma and has an inner diameter of 80 mm or more (sectional area S) in a region where the plasma is formed, and the deposition step is performed in a manner to satisfy the relationship, 150 mm/second
    • 4. 发明公开
    • Glass-processing method and glass-processing apparatus for the method
    • Verfahren zur Verarbeitung von Glas sowie Vorrichtung zu dessenAusführung
    • EP1454889A1
    • 2004-09-08
    • EP04004489.3
    • 2004-02-27
    • SUMITOMO ELECTRIC INDUSTRIES, Ltd
    • Onishi, Masashi Sumimoto Electric Industries, Ltd.Hirano, Masaaki Sumimoto Electric Industries, Ltd.Nakanishi, Tetsuya Sumimoto Elect. Industries, Ltd
    • C03B37/018
    • H05H1/30C03B23/043C03B23/207C03B29/02C03B37/0124C03B37/01815C03B37/01823Y02P40/57
    • A glass-processing method adjusts the range of the heating region according to the work piece and processing condition, and a glass-processing apparatus implements the method. The method incorporates the heating of a glass body (G) with a thermal plasma torch (10) comprising (a) a main body provided with a plurality of ports (P1,P2,P3) from which a gas issues and (b) a device (8) for applying a high-frequency electric field to the gas fed into the main body. The method comprises the steps of (1) adjusting the plasma flame's size perpendicular to the center axis of the main body by controlling the flow rate of the gas fed into each port according to the size of the glass body, the processing condition, or both and (2) heating the glass body. The apparatus comprises (a) a thermal plasma torch (10) for heating a glass body, comprising (a1) a main body provided with a plurality of ports (P1,P2,P3) from which a gas issues and (a2) a device (8) for applying a high-frequency electric field to the gas fed into the main body and (b) a device (31,32) for adjusting the flow rate of the gas fed into each port.
    • 玻璃加工方法根据工件和加工条件调节加热区域的范围,玻璃加工装置实施该方法。 该方法包括用热等离子体焰炬(10)加热玻璃体(G),所述热等离子体焰炬(10)包括:(a)主体,其设有多个气体发生的端口(P1,P2,P3),(b) 用于将高频电场施加到供给到主体中的气体的装置(8)。 该方法包括以下步骤:(1)通过根据玻璃体的尺寸,加工条件或两者来控制进入每个端口的气体的流量来调节垂直于主体的中心轴的等离子体火焰的尺寸 和(2)加热玻璃体。 该装置包括:(a)用于加热玻璃体的热等离子体焰炬(10),包括(a1)设置有气体发生的多个端口(P1,P2,P3)的主体,(a2) (8),用于对供给到主体的气体施加高频电场;(b)用于调节供给到每个端口的气体的流量的装置(31,32)。
    • 6. 发明公开
    • a PCVD method for manufacturing a primary preform for optical fibers
    • PCVD-VERFAHREN ZUR HERSTELLUNG EINERPRIMÄRENVORFORMFÜROPTISCHE FASERN
    • EP2796420A1
    • 2014-10-29
    • EP14164529.1
    • 2014-04-14
    • Draka Comteq B.V.
    • Milicevic, IgorVan Stralen, Mattheus Jacobus NicolaasHartsuiker, Johannes Antoon
    • C03B37/018
    • C03B37/0183C03B37/01807C03B37/01823C03B37/01869C03B2201/31C03B2207/28C03B2207/70C03B2207/80
    • A method for manufacturing a primary preform for optical fibres by means of an internal plasma chemical vapour deposition (PCVD) process, which method comprises the steps of: providing a hollow glass substrate tube having a supply side and a discharge side; supplying a gas flow in the interior of said hollow substrate tube via the supply side thereof, said gas flow comprising a main gas flow comprising at least one glass-forming gas and at least one secondary gas flow comprising at least one dopant; creating a plasma reaction zone in the interior of said hollow substrate tube by means of microwave radiation for effecting the deposition of glass layers on the inner surface of said hollow substrate tube, said reaction zone being moved back and forth along the longitudinal axis of said hollow substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of said hollow substrate tube, to obtain a substrate tube having glass layers deposited on its inner surface; and optionally subjecting the substrate tube having glass layers deposited on its inner surface obtained in step iii) to a collapsing treatment so as to form a solid primary preform, wherein the supply of the at least one secondary gas flow is interrupted during step iii) when the plasma reaction zone is located near or at the reversal point located near the supply side and/or the reversal point located near the discharge side.
    • 一种通过内部等离子体化学气相沉积(PCVD)工艺制造用于光纤的初级预制件的方法,该方法包括以下步骤:提供具有供给侧和排出侧的中空玻璃基板管; 在所述中空衬底管的内部经由其供应侧供应气流,所述气流包括包含至少一种玻璃形成气体的主气流和至少一种包含至少一种掺杂剂的二次气流; 通过微波辐射在所述中空衬底管的内部产生等离子体反应区,以实现玻璃层在所述中空衬底管的内表面上的沉积,所述反应区沿所述空心衬套的纵向轴线前后移动 在位于供给侧附近的反转点和位于所述中空基板管的排出侧附近的反转点之间的基板管,以获得在其内表面上沉积有玻璃层的基板管; 并且可选地使具有沉积在其在步骤iii)中获得的内表面上的玻璃层的基底管经历塌陷处理,以形成固体初级预制件,其中在步骤iii)期间中断所述至少一个二次气流的供应 等离子体反应区位于位于靠近排出侧的供给侧和/或反转点附近或位于反转点附近。