专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

EP2472569B1 DIFFUSION AGENT COMPOSITION AND METHOD OF FORMING AN IMPURITY DIFFUSION LAYER 有权
标题翻译：扩散剂组合物和形成杂质扩散层的方法
公开(公告)号：EP2472569B1
公开(公告)日：2018-01-03
申请号：EP10811467.9
申请日：2010-08-18
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： HIRAI, Takaaki , MUROTA, Atsushi , TANITSU, Katsuya
IPC分类号： H01L21/225 , H01L31/04 , H01L31/06 , H01L21/228
CPC分类号： H01L21/228 , H01L21/2225 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： Disclosed is a diffusion agent composition that includes: an impurity diffusion component (A); a binder resin (B), which thermally decomposes and disappears at a temperature lower than the temperature at which the impurity diffusion component (A) begins to thermally diffuse; SiO 2 micro-particles (C); and an organic solvent (D), which contains an organic solvent (D1) having a boiling point of 100°C or greater. Also disclosed is a method for forming an impurity diffusion layer. The method includes a pattern formation step whereby a pattern is formed by printing the aforementioned diffusion agent composition onto a semi-conductor substrate, and a diffusion step whereby the impurity diffusion component (A) in the diffusion agent composition is diffused onto the semi-conductor substrate. Further disclosed is a solar cell, provided with a semi-conductor substrate whereon an impurity diffusion layer has been formed by means of the above mentioned impurity diffusion layer formation method.

2. 发明授权

EP2573800B1 DIFFUSION AGENT COMPOSITION AND METHOD OF FORMING AN IMPURITY DIFFUSION LAYER 有权
公开(公告)号：EP2573800B1
公开(公告)日：2017-11-08
申请号：EP11783206.3
申请日：2011-04-12
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： MUROTA, Atsushi , HIRAI, Takaaki
IPC分类号： H01L21/22 , H01L21/225 , H01L31/04 , H01L21/228
CPC分类号： H01L21/2225 , H01L21/18 , H01L21/182 , H01L21/228 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The disclosed diffusion agent composition is used in the formation of an impurity diffusion agent layer on a semiconductor substrate, and contains (A) an impurity diffusion component, (B) a silicon compound, and (C) a solvent containing (C1) a solvent with a boiling point of 100C or less, (C2) a solvent with a boiling point of 120-180C, and a (C3) solvent with a boiling point of 240-300C.

3. 发明公开

EP2472569A1 DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL 有权
标题翻译： DIFFUSIONSMITTELZUSAMMENSETZUNG，VERFAHREN ZUR FORMUNG EINER UNREINHEITENDIFFUSIONSSCHICHT UND SOLARZELLE
公开(公告)号：EP2472569A1
公开(公告)日：2012-07-04
申请号：EP10811467.9
申请日：2010-08-18
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： HIRAI, Takaaki , MUROTA, Atsushi , TANITSU, Katsuya
IPC分类号： H01L21/225 , H01L31/04
CPC分类号： H01L21/228 , H01L21/2225 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： Disclosed is a diffusion agent composition that includes: an impurity diffusion component (A); a binder resin (B), which thermally decomposes and disappears at a temperature lower than the temperature at which the impurity diffusion component (A) begins to thermally diffuse; SiO 2 micro-particles (C); and an organic solvent (D), which contains an organic solvent (D1) having a boiling point of 100°C or greater. Also disclosed is a method for forming an impurity diffusion layer. The method includes a pattern formation step whereby a pattern is formed by printing the aforementioned diffusion agent composition onto a semi-conductor substrate, and a diffusion step whereby the impurity diffusion component (A) in the diffusion agent composition is diffused onto the semi-conductor substrate. Further disclosed is a solar cell, provided with a semi-conductor substrate whereon an impurity diffusion layer has been formed by means of the above mentioned impurity diffusion layer formation method.
摘要翻译：公开了一种扩散剂组合物，其包括：杂质扩散组分（A）; 粘合剂树脂（B），其在比杂质扩散组分（A）开始热扩散的温度低的温度下热分解和消失; SiO 2微粒（C）; 和含有沸点为100℃以上的有机溶剂（D1）的有机溶剂（D）。还公开了形成杂质扩散层的方法。该方法包括图案形成步骤，其中通过将上述扩散剂组合物印刷在半导体衬底上形成图案，扩散步骤使扩散剂组合物中的杂质扩散组分（A）扩散到半导体上基质。进一步公开了一种太阳能电池，其具有通过上述杂质扩散层形成方法形成杂质扩散层的半导体基板。

4. 发明公开

EP2573800A1 DIFFUSION AGENT COMPOSITION, METHOD OF FORMING AN IMPURITY DIFFUSION LAYER, AND SOLAR CELL 有权
标题翻译：扩散剂组合物，形成杂质扩散层的方法和太阳能电池
公开(公告)号：EP2573800A1
公开(公告)日：2013-03-27
申请号：EP11783206.3
申请日：2011-04-12
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： MUROTA, Atsushi , HIRAI, Takaaki
IPC分类号： H01L21/225 , H01L31/04
CPC分类号： H01L21/2225 , H01L21/18 , H01L21/182 , H01L21/228 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The disclosed diffusion agent composition is used in the formation of an impurity diffusion agent layer on a semiconductor substrate, and contains (A) an impurity diffusion component, (B) a silicon compound, and (C) a solvent containing (C1) a solvent with a boiling point of 100C or less, (C2) a solvent with a boiling point of 120-180C, and a (C3) solvent with a boiling point of 240-300C.
摘要翻译：所公开的扩散剂组合物用于在半导体基板上形成杂质扩散剂层，并含有（A）杂质扩散成分，（B）硅化合物和（C）含有（C1）溶剂其沸点为100℃或更低，（C2）沸点为120-180℃的溶剂和沸点为240-300℃的（C3）溶剂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式