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    • 5. 发明公开
    • Method of and apparatus for applying voltage to electrostatic chuck
    • 方法和装置用于向静电卡盘提供电压。
    • EP0395340A2
    • 1990-10-31
    • EP90304353.7
    • 1990-04-23
    • TOTO LTD.
    • Watanabe, ToshiyaKitabayashi, Tetsuo
    • B23Q3/154
    • B23Q3/15Y10T307/858
    • A first voltage is first applied to the electrode or electrodes of an electrostatic chuck for electro­statically attracting a workpiece such as a silicon wafer. Then, before the workpiece is removed from the electrostatic chuck, a second voltage which is of opposite polarity to the first voltage is applied to the electrostatic chuck for eliminating a residual attractive force from the electro­static chuck. The second voltage has a voltage value which is 1.5 to 2 times higher than the voltage value of the first voltage. The second voltage is continuously applied for a period of time which is in inverse proportion to the voltage value of the second voltage.
    • 第一电压首先被施加到静电卡盘的一个或多个电极用于静电吸引工件:如硅晶片。 然后,工件从静电卡盘移除之前,第二电压所有这是相反的极性与第一电压被施加到静电卡盘,用于从静电吸盘消除残余引力。 该第二电压具有的电压值的所有比所述第一电压的电压值高1.5至2倍。 第二电压被连续地施加一段时间的所有这是反比于所述第二电压的电压值。