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1. 发明公开

EP1975979A1 COATING APPARATUS AND COATING METHOD 有权
标题翻译： BESCHICHTUNGSVORRICHTUNG UND BESCHICHTUNGSVERFAHREN
公开(公告)号：EP1975979A1
公开(公告)日：2008-10-01
申请号：EP06834803.6
申请日：2006-12-15
申请人： TOKYO ELECTRON LIMITED
发明人： SAWADA, Ikuo , MATSUZAKI, Kazuyoshi , TANAKA, Takashi , IWASHITA, Mitsuaki , MUNAKATA, Mizue
IPC分类号： H01L21/027 , B05C11/08 , B05C15/00
CPC分类号： B05D1/005 , B05C11/06 , B05C11/08 , B05D3/0406 , B05D3/0486 , B05D2203/30 , B05D2203/35 , G03F7/162 , H01L21/67017 , H01L21/67023 , H01L21/6715
摘要： The invention is a coating apparatus including: a substrate-holding part that holds a substrate horizontally; a chemical nozzle that supplies a chemical to a central portion of the substrate horizontally held by the substrate-holding part; a rotation mechanism that causes the substrate-holding part to rotate in order to spread out the chemical on a surface of the substrate by a centrifugal force, for coating the whole surface with the chemical; a gas-flow-forming unit that forms a down flow of an atmospheric gas on the surface of the substrate horizontally held by the substrate-holding part; a gas-discharging unit that discharges an atmosphere around the substrate; and a gas nozzle that supplies a laminar-flow-forming gas to the surface of the substrate, the laminar-flow-forming gas having a coefficient of kinematic viscosity larger than that of the atmospheric gas; wherein the atmospheric gas or the laminar-flow-forming gas are supplied to the central portion of the substrate.
摘要翻译：本发明是一种涂覆装置，包括：水平保持基板的基板保持部; 化学喷嘴，其将化学品供给到由所述基板保持部水平保持的所述基板的中央部; 旋转机构，其使基板保持部旋转以通过离心力在基板的表面上分散化学品，用化学品涂布整个表面; 气体流动形成单元，其在由所述基板保持部水平保持的所述基板的表面上形成气氛气体的向下流动; 气体排出单元，其排出基板周围的气氛; 以及气体喷嘴，其将层流形成气体供给到所述基板的表面，所述层流形成气体的运动粘度系数大于所述气氛气体的系数; 其中所述大气气体或层流形成气体被供应到所述基板的中心部分。

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