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1. 发明公开

EP1868229A1 Liquid processing apparatus 有权
标题翻译：液体处理设备
公开(公告)号：EP1868229A1
公开(公告)日：2007-12-19
申请号：EP07011675.1
申请日：2007-06-14
申请人： TOKYO ELECTRON LIMITED
发明人： Ito, Norihiro
IPC分类号： H01L21/00 , B05C11/02 , G03F7/16
CPC分类号： G03F7/162 , G03F7/3021 , H01L21/6704 , H01L21/67051 , H01L21/67075 , H01L21/6708 , H01L21/68728 , H01L21/68742 , H01L21/68785 , H01L21/68792 , Y10S134/902
摘要： A liquid processing apparatus includes a substrate holding member (2) configured to rotate along with a substrate (W) held thereon in a horizontal state; a rotary cup (4) configured to surround the substrate held on the substrate holding member, to rotate along with the substrate, and to receive the process liquid thrown off from the substrate; a rotation mechanism (3) configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism (5) configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup (51) and an annular exhaust cup (52) with an exhaust port (70) connected thereto to discharge a collected gas component. A gas-flow adjusting mechanism (78, 97, 99a) is disposed between the exhaust cup and the exhaust port and configured to adjust a gas flow of the gas component to flow toward the exhaust port from essentially all around within the exhaust cup.
摘要翻译：一种液体处理装置，其特征在于，具备：基板保持部件（2），其以保持水平状态的基板（W）为中心进行旋转; 旋转杯（4），其被构造成围绕保持在所述基板保持构件上的所述基板，与所述基板一起旋转，并且接收从所述基板抛出的所述处理液; 旋转机构（3），其构造成使旋转杯和基板保持部件一体旋转; 和液体供给机构（5），其构造成将处理液供给到基板上。该设备还包括一个环形排水杯（51）和一个环形排气杯（52），排气口（70）连接到排气口以排出收集的气体成分。气体流量调节机构（78,97,99a）设置在排气杯和排气口之间，并构造成调节气体成分的气体流动以基本上在排气杯内全部流向排气口。

2. 发明公开

EP1883100A3 Liquid processing system 审中-公开
标题翻译：流体处理系统，
公开(公告)号：EP1883100A3
公开(公告)日：2012-01-04
申请号：EP07014286.4
申请日：2007-07-20
申请人： TOKYO ELECTRON LIMITED
发明人： Matsumoto, Kazuhisa , Kaneko, Satoshi , Akimoto, Masami , Toshima, Takayuki , Ito, Norihiro
IPC分类号： H01L21/67
CPC分类号： H01L21/67051 , H01L21/67017 , H01L21/6708 , H01L21/67173
摘要： A liquid processing system includes a liquid processing section (21b) including liquid processing units (22) horizontally disposed therein and each configured to perform a liquid process while supplying a process liquid onto a substrate (W); a process liquid storing section (21h) that stores the process liquid to be supplied to the liquid processing units of the liquid processing section; and a piping unit (21f) including a supply pipe configured to guide the process liquid from the process liquid storing section to the liquid processing units. The process liquid storing section, the piping unit, and the liquid processing section are disposed inside a common casing (21) in this order from below. The supply pipe of the piping unit has a horizontal pipe portion (70a) horizontally extending along an array direction of the liquid processing units, such that the process liquid is supplied from the horizontal pipe portion to the liquid processing units individually.

3. 发明公开

EP1848024A1 Liquid processing apparatus 有权
标题翻译：液体处理设备
公开(公告)号：EP1848024A1
公开(公告)日：2007-10-24
申请号：EP07007785.4
申请日：2007-04-17
申请人： TOKYO ELECTRON LIMITED
发明人： Akimoto, Masami , Toshima, Takayuki , Kaneko, Satoshi , Matsumoto, Kazuhisa , Ito, Norihiro , Nanba, Hiromitsu
IPC分类号： H01L21/00 , H01L21/687 , B05C11/02 , B08B11/02 , B05B7/00 , B05B7/02
CPC分类号： H01L21/67051 , H01L21/6715 , H01L21/68728
摘要： A liquid processing apparatus includes: a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integratedly rotate the rotary cup and the substrate holding member; a liquid supply mechanism configured to supply a process liquid onto the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining of the rotary cup. The exhaust/drain section includes an annular drain cup configured to mainly collect and discharge a process liquid thrown off from the substrate, and an exhaust cup surrounding the drain cup and configured to mainly collect and discharge a gas component from inside and around the rotary cup. Liquid-draining from the drain cup and gas-exhausting from the exhaust cup are performed independently of each other.
摘要翻译：一种液体处理装置，其特征在于，具备：基板保持部件，其与保持在基板上的基板一起以水平状态旋转; 旋转杯，其被构造成围绕保持在所述基板保持构件上的所述基板并且与所述基板一起旋转; 旋转机构，所述旋转机构构造成使所述旋转杯和所述基板保持部件一体旋转; 液体供应机构，其构造成将处理液供应到所述基板上; 以及配置成执行旋转杯的排气和排液的排气/排放部。排气/排水部分包括被构造成主要收集和排出从基板抛出的处理液的环形排水杯和围绕排水杯的排气杯，排气杯被配置为主要从旋转杯的内部和周围收集和排出气体成分。从排水杯排出液体和从排气杯排出气体是彼此独立进行的。

4. 发明授权

EP1868229B1 Liquid processing apparatus 有权
标题翻译：流体处理装置
公开(公告)号：EP1868229B1
公开(公告)日：2010-01-13
申请号：EP07011675.1
申请日：2007-06-14
申请人： TOKYO ELECTRON LIMITED
发明人： Ito, Norihiro
IPC分类号： H01L21/00 , B05C11/02 , G03F7/16
CPC分类号： G03F7/162 , G03F7/3021 , H01L21/6704 , H01L21/67051 , H01L21/67075 , H01L21/6708 , H01L21/68728 , H01L21/68742 , H01L21/68785 , H01L21/68792 , Y10S134/902

5. 发明授权

EP1848025B1 Liquid processing apparatus 有权
标题翻译：液体处理设备
公开(公告)号：EP1848025B1
公开(公告)日：2009-12-02
申请号：EP07007786.2
申请日：2007-04-17
申请人： TOKYO ELECTRON LIMITED
发明人： Kaneko, Satoshi , Matsumoto, Kazuhisa , Ito, Norihiro , Akimoto, Masami , Toshima, Takayuki , Nanba, Hiromitsu
IPC分类号： H01L21/00 , H01L21/687 , B05B7/00 , B05B7/02 , B08B11/02 , B05C11/02
CPC分类号： H01L21/67051 , H01L21/6715 , H01L21/68728 , Y10S134/902

6. 发明公开

EP1883100A2 Liquid processing system 审中-公开
标题翻译： Flüssigkeitsbehandlungssystem
公开(公告)号：EP1883100A2
公开(公告)日：2008-01-30
申请号：EP07014286.4
申请日：2007-07-20
申请人： TOKYO ELECTRON LIMITED
发明人： Matsumoto, Kazuhisa , Kaneko, Satoshi , Akimoto, Masami , Toshima, Takayuki , Ito, Norihiro
IPC分类号： H01L21/00
CPC分类号： H01L21/67051 , H01L21/67017 , H01L21/6708 , H01L21/67173
摘要： A liquid processing system includes a liquid processing section (21b) including liquid processing units (22) horizontally disposed therein and each configured to perform a liquid process while supplying a process liquid onto a substrate (W); a process liquid storing section (21h) that stores the process liquid to be supplied to the liquid processing units of the liquid processing section; and a piping unit (21f) including a supply pipe configured to guide the process liquid from the process liquid storing section to the liquid processing units. The process liquid storing section, the piping unit, and the liquid processing section are disposed inside a common casing (21) in this order from below. The supply pipe of the piping unit has a horizontal pipe portion (70a) horizontally extending along an array direction of the liquid processing units, such that the process liquid is supplied from the horizontal pipe portion to the liquid processing units individually.
摘要翻译：液体处理系统包括液体处理部分（21b），其包括水平地设置在其中的液体处理单元（22），并且每个液体处理部分被配置为在将处理液体供应到基板（W）上时进行液体处理。处理液储存部（21h），其存储供给到所述液体处理部的液体处理单元的处理液; 以及管道单元（21f），其包括供给管，其构造成将处理液从处理液储存部引导到液体处理单元。处理液储存部，配管部和液处理部从下方依次配置在公共壳体21内。管道单元的供给管具有沿着液体处理单元的排列方向水平延伸的水平管部分（70a），使得处理液体从水平管部分分别供应到液体处理单元。

7. 发明公开

EP1848025A1 Liquid processing apparatus 有权
标题翻译： Flüssigkeitsverarbeitungsvorrichtung
公开(公告)号：EP1848025A1
公开(公告)日：2007-10-24
申请号：EP07007786.2
申请日：2007-04-17
申请人： TOKYO ELECTRON LIMITED
发明人： Kaneko, Satoshi , Matsumoto, Kazuhisa , Ito, Norihiro , Akimoto, Masami , Toshima, Takayuki , Nanba, Hiromitsu
IPC分类号： H01L21/00 , H01L21/687 , B05B7/00 , B05B7/02 , B08B11/02 , B05C11/02
CPC分类号： H01L21/67051 , H01L21/6715 , H01L21/68728 , Y10S134/902
摘要： A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate and to rotate along with the substrate; a liquid supply mechanism configured to supply a process liquid onto at least a front surface of the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining out of the rotary cup; and a guide member disposed to surround the substrate, having an upper surface to be substantially continued to the front surface of the substrate, and configured to rotate along with the substrate holding member and the rotary cup, such that a process liquid supplied onto the front surface of the substrate and thrown off from the substrate is guided by the upper surface of the guide member from the rotary cup to the exhaust/drain section.
摘要翻译：一种液体处理装置，包括：基板保持部件，其构造成与水平状态下保持的基板一起旋转; 旋转杯，其构造成围绕所述基底并与所述基底一起旋转; 液体供给机构，其构造成将处理液体供给到所述基板的至少前表面上; 以及排气/排出部，被构造成从所述旋转杯中排出并排出液体; 以及设置成围绕所述基板的引导构件，所述引导构件具有基本上连续到所述基板的前表面的上表面，并且被构造成与所述基板保持构件和所述旋转杯一起旋转，使得提供给所述前端的处理液从衬底抛出的衬底的表面由引导构件的上表面从旋转杯引导到排气/排出区。

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