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    • 2. 发明公开
    • Method and apparatus for using solution based precursors for atomic layer deposition
    • Vorrichtung und Verfahren zurLösung-basierten Abscheidung von Atomschichten。
    • EP1717343A2
    • 2006-11-02
    • EP06252213.1
    • 2006-04-25
    • THE BOC GROUP, INC.
    • Ma, CeWang, Qing MinHelly, Patrick JosephHogle, Richard Allen
    • C23C16/455
    • C23C16/45544C23C16/448C23C16/45525Y10T428/8305
    • A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.
      An ALD deposition system that can be used in the present invention includes solution vessel (10), for holding the dissolved precursor solution (precursor A), a liquid pump (20), to pump precursor A to a vaporizer (30), a vessel (40), for holding precursor B, such as water, a deposition chamber (50), having a monitoring device (60), therein, and an exhaust system (70).
    • 提供了具有特殊ALD操作的解决方案稳定和传送技术的独特组合。 使用溶解在溶剂中的各种低挥发性固体ALD前体。 不稳定的溶质可以在溶液中稳定,并且所有溶液可以在室温下输送。 在溶液蒸发之后,气相前体和溶剂被脉冲进入沉积室以确保真正的ALD膜生长。 可用于本发明的ALD沉积系统包括用于保持溶解的前体溶液(前体A)的溶液容器(10),液体泵(20),以将前体A泵送到蒸发器(30),容器 (40),用于保持诸如水的前体B,其中具有监测装置(60)的沉积室(50)和排气系统(70)。