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    • 1. 发明公开
    • Novel wholly aromatic copolyester, process for production thereof, and film melt-shaped therefrom
    • 新型单体芳族聚酯,其生产工艺及其薄膜形状
    • EP0045499A3
    • 1982-06-09
    • EP81106037
    • 1981-07-31
    • TEIJIN LIMITED
    • Urasaki, TakanoriYoshida, TugusiInata, HirooHirabayashi, Yasuji
    • C08G63/18C08G63/22C08G63/26C08J05/18
    • C08J5/18C08G63/19C08G63/605C08G63/64C08G63/672C08J2367/03
    • A wholly aromatic copolyester composed mainly of isophthalic acid units and hydroquinone units, the total proportion of said isophthalic acid units and hydroquinone units being at least about 80 mole% based on the entire units, said wholly aromatic copolyester having a terminal carboxyl group concentration, measured by the method described in the specification, of not more than about 90 eq/10 6 g and a reduced viscosity, determined at 35°C in a mixed solvent of phenol and tetrachloroethane in a weight ratio of 4:6 in a concentration of 1.2 gfdl of at least about 0.6 and being substantially linear and melt-shapable and substantially free from a halogen atom bonded to the molecular chain, and a film prepared therefrom by melt shaping. The wholly aromatic copolyester can be prepared by a process which comprises polycondensing under heat in the presence of a polycondensation catalyst (a) a reaction mixture consisting of a major proportion of a diaryl ester of isophthalic acid and hydroquinone and a minor proportion of at least one other component selected from diaryl esters of aromatic dicarboxylic acids other than isophthalic acid, aromatic dihydroxy compounds other than hydroquinone and aryl hydroxyenboates or (b) a reaction mixture consisting of a major proportion of isophthalic acid, hydroquinone and a diaryl carbonate and a minor proportion of at least one other component selected from aromatic dicarboxylic acids other than isophthalic acid, aromatic dihydroxy compounds other than hydroquinone, hydroxybenzoic acid and aryl hydroxybenzoates, and after the reduced viscosity of the polymer formed in the reaction system has reached about 0.2, performing the polycondensation at a temperature lower than the crystalline melting point of the polymer while maintaining the reaction system in a molten condition; or which comprises polymerizing the wholly aromatic copolyester having a reduced viscosity of at least 0.6 prepared by the above process or a wholly aromatic copolyester having a reduced viscosity of less than about 0.6 in the solid phase in a manner known per se under reduced pressure or while passing an inert gas into the reaction system. The film can be used as films for metal vapor depocition, films for printed circuits and electrical insulating films by using their excellent heat resistance.
    • 3. 发明公开
    • Novel wholly aromatic copolyester, process for production thereof, and film melt-shaped therefrom
    • 全芳族共聚酯,用于制备和由其从熔体膜获得。
    • EP0045499A2
    • 1982-02-10
    • EP81106037.5
    • 1981-07-31
    • TEIJIN LIMITED
    • Urasaki, TakanoriYoshida, TugusiInata, HirooHirabayashi, Yasuji
    • C08G63/18C08G63/22C08G63/26C08J5/18
    • C08J5/18C08G63/19C08G63/605C08G63/64C08G63/672C08J2367/03
    • A wholly aromatic copolyester composed mainly of isophthalic acid units and hydroquinone units, the total proportion of said isophthalic acid units and hydroquinone units being at least about 80 mole% based on the entire units, said wholly aromatic copolyester having a terminal carboxyl group concentration, measured by the method described in the specification, of not more than about 90 eq/10 6 g and a reduced viscosity, determined at 35°C in a mixed solvent of phenol and tetrachloroethane in a weight ratio of 4:6 in a concentration of 1.2 gfdl of at least about 0.6 and being substantially linear and melt-shapable and substantially free from a halogen atom bonded to the molecular chain, and a film prepared therefrom by melt shaping.
      The wholly aromatic copolyester can be prepared by a process which comprises polycondensing under heat in the presence of a polycondensation catalyst (a) a reaction mixture consisting of a major proportion of a diaryl ester of isophthalic acid and hydroquinone and a minor proportion of at least one other component selected from diaryl esters of aromatic dicarboxylic acids other than isophthalic acid, aromatic dihydroxy compounds other than hydroquinone and aryl hydroxyenboates or (b) a reaction mixture consisting of a major proportion of isophthalic acid, hydroquinone and a diaryl carbonate and a minor proportion of at least one other component selected from aromatic dicarboxylic acids other than isophthalic acid, aromatic dihydroxy compounds other than hydroquinone, hydroxybenzoic acid and aryl hydroxybenzoates, and after the reduced viscosity of the polymer formed in the reaction system has reached about 0.2, performing the polycondensation at a temperature lower than the crystalline melting point of the polymer while maintaining the reaction system in a molten condition; or which comprises polymerizing the wholly aromatic copolyester having a reduced viscosity of at least 0.6 prepared by the above process or a wholly aromatic copolyester having a reduced viscosity of less than about 0.6 in the solid phase in a manner known per se under reduced pressure or while passing an inert gas into the reaction system.
      The film can be used as films for metal vapor depocition, films for printed circuits and electrical insulating films by using their excellent heat resistance.