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1. 发明公开

EP4083016A1 METHOD FOR MANUFACTURING HIGHLY POLYMERIZABLE N-VINYL CARBOXYLIC ACID AMIDE MONOMER 审中-实审转让
公开(公告)号：EP4083016A1
公开(公告)日：2022-11-02
申请号：EP20907644.7
申请日：2020-12-23
申请人： Showa Denko K.K.
发明人： TANAKA, Naoyuki , MIKAMI, Katsumi , KOBAYASHI, Takamitsu
IPC分类号： C07C231/24 , C07C233/05
摘要： Provided is a method capable of producing a highly polymerizable N-vinyl carboxylic acid amide monomer by efficiently purifying N-vinyl carboxylic acid amide. The method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer of the present invention is a method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer, comprising (A) a step of melting a crude N-vinyl carboxylic acid amide monomer comprising 50 to 88 mass% of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation (cooling crystallization), and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) a step of further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in the step (A) in a mixed solvent of ethyl acetate and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization (solvent crystallization), performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of ethyl acetate/N-vinyl carboxylic acid amide monomer crystal in the step (B) is 0.01 or more and 0.5 or less, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in the step (B) is 0.5 or more and 3.0 or less.

2. 发明公开

EP4083605A1 FLUORINE GAS PRODUCTION DEVICE AND LIGHT SCATTERING DETECTOR 审中-实审转让
公开(公告)号：EP4083605A1
公开(公告)日：2022-11-02
申请号：EP20907881.5
申请日：2020-12-03
申请人： Showa Denko K.K.
发明人： MIKAMI, Katsumi , FUKUCHI, Yohsuke , KOBAYASHI, Hiroshi
IPC分类号： G01N15/02 , C25B1/24 , C25B9/00
摘要： There is provided a device for producing fluorine gas capable of suppressing clogging of pipes or valves by mist. A flow path of the device for producing fluorine gas has a first flow path configured to send a fluid from the inside of an electrolytic cell through a mist removal unit configured to remove mist from the fluid to a fluorine gas selection unit and a second flow path configured to send the fluid from the inside of the electrolytic cell to the fluorine gas selection unit without passing through the mist removal unit and has a flow path switching unit configured to switch a flow path through which the fluid flows depending on the average particle size of the mist measured by an average particle size measurement unit. The flow path switching unit is configured to send the fluid to the first flow path from the inside of the electrolytic cell in a case where the average particle size of the mist measured by the average particle size measurement unit is equal to or less than a predetermined reference value and to send the fluid to the second flow path from the inside of the electrolytic cell in a case where the average particle size of the mist is more than the predetermined reference value. The second flow path has a clogging suppression mechanism configured to suppress clogging of the second flow path by the mist.

3. 发明公开

EP3831984A1 ANODE FOR ELECTROLYTIC SYNTHESIS AND METHOD FOR MANUFACTURING FLUORINE GAS OR FLUORINE-CONTAINING COMPOUND 审中-实审转让
公开(公告)号：EP3831984A1
公开(公告)日：2021-06-09
申请号：EP19844681.7
申请日：2019-07-19
申请人： Showa Denko K.K.
发明人： FUKUCHI, Yohsuke , MIKAMI, Katsumi , KOBAYASHI, Hiroshi
IPC分类号： C25B11/12 , C25B1/24
摘要： There is provided an anode for electrolytic synthesis capable of electrolytically synthesizing fluorine gas or a fluorine containing compound by a simple process and at a low cost while suppressing the occurrence of an anode effect. An anode for electrolytic synthesis (3) for electrolytically synthesizing fluorine gas or a fluorine containing compound includes an anode substrate formed of a carbonaceous material and a metal coating film coating the anode substrate. Metal constituting the metal coating film is nickel.

4. 发明公开

EP3489569A1 GAS SUPPLY APPARATUS AND GAS SUPPLY METHOD 有权转让
公开(公告)号：EP3489569A1
公开(公告)日：2019-05-29
申请号：EP17830895.3
申请日：2017-07-11
申请人： Showa Denko K.K.
发明人： AOKI, Takanori , MIKAMI, Katsumi
IPC分类号： F17C9/00 , C23C16/448
摘要： Provided is a gas supply apparatus for supplying a gas compound obtained by vaporizing a liquid compound to a target location, the gas supply apparatus comprising: a storage vessel capable of storing the liquid compound; a gas compound supply pipeline, one end of which is connected to the storage vessel, and another end of which is capable of being disposed at the target location; and a temperature control device configured to adjust a temperature of the gas compound or the liquid compound within the storage vessel to be equal to or lower than a surrounding temperature of the gas compound supply pipeline.

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