会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明公开
    • Exposure head and image forming apparatus
    • Belichtungskopf und Bilderzeugungsvorrichtung
    • EP2333618A2
    • 2011-06-15
    • EP10192800.0
    • 2010-11-26
    • Seiko Epson Corporation
    • Sowa, TakeshiIkuma, KenKoizumi, RyutaInoue, Nozomu
    • G03G15/32
    • G03G15/326B41J2/45G03G15/04045
    • A exposure head (29) includes: a light-emitting element substrate including a first light-emitting element configured to emit light, a second light-emitting element (ER1) disposed in a first direction of the first light-emitting element, a third light-emitting element, and a fourth light-emitting element disposed so as to satisfy the following relationship; Dr12:Dr23 = 1:m (l ≠ m) where, 1: positive integer number, m: positive integer number, Dr12: distance between the first light-emitting element and the third light-emitting element in the direction orthogonal to the first direction, Dr23: distance between the third light-emitting element and the fourth light-emitting element in the direction orthogonal to the first direction, and an imaging optical system configured to image lights emitted from the first light-emitting element, the second light-emitting element (ER1), the third light-emitting element, and the fourth light-emitting element.
    • 曝光头(29)包括:发光元件基板,包括被配置为发光的第一发光元件,设置在第一发光元件的第一方向上的第二发光元件(ER1),第三发光元件 发光元件和配置成满足以下关系的第四发光元件; Dr12:Dr23 = 1:m(l‰m)其中,1:正整数,m:正整数,Dr12:第一发光元件与第三发光元件在与第一发光元件正交的方向上的距离 方向,Dr23:与第一方向正交的方向上的第三发光元件与第四发光元件之间的距离,以及被配置为对从第一发光元件发出的光进行成像的摄像光学系统, 发光元件(ER1),第三发光元件和第四发光元件。
    • 3. 发明公开
    • An exposure head, a method of controlling an exposure head and an image forming apparatus
    • Belichtungskopf,Verfahren zum Steuern eines Belichtungskopfs und Bilderzeugungsvorrichtung
    • EP2070709A2
    • 2009-06-17
    • EP08021619.5
    • 2008-12-12
    • Seiko Epson Corporation
    • Koizumi, RyutaInoue, NozomuNomura, Yujiro
    • B41J2/45
    • B41J2/45
    • An exposure head, includes: an imaging optical system; a first light emitting element (Ea1,Ea2,Ea3,Ea4) that emits a light which is to be focused by the imaging optical system; a second light emitting element (Ec8,Ec7,Ec8,Ec5) that emits a light which is to be focused by the imaging optical system; a first TFT circuit (TCa1,TCa2,TCa3,TCa4) that is connected with the first light emitting element (Ea1,Ea2,Ea3,Ea4) via an interconnection wire; and a second TFT circuit (TCc8,TCc7,TCc6,TCc5) that is connected with the second light emitting element (Ec8,Ec7,Ec6,Ec5) via an interconnection wire, wherein the first light emitting element (Ea) and the second light emitting element (Ec) are provided between the first TFT circuit (TCa) and the second TFT circuit (TCc).
    • 一种曝光头,包括:成像光学系统; 发射由成像光学系统聚焦的光的第一发光元件(Ea1,Ea2,Ea3,Ea4); 发射要由成像光学系统聚焦的光的第二发光元件(Ec8,Ec7,Ec8,Ec5); 经由互连线与第一发光元件(Ea1,Ea2,Ea3,Ea4)连接的第一TFT电路(TCa1,TCa2,TCa3,TCa4) 以及经由互连线与第二发光元件(Ec8,Ec7,Ec6,Ec5)连接的第二TFT电路(TCc8,TCc7,TCc6,TCc5),其中,第一发光元件(Ea)和第二光 发光元件(Ec)设置在第一TFT电路(TCa)和第二TFT电路(TCc)之间。