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    • 4. 发明公开
    • Compositions containing bisphenol compounds
    • Bisphenolverbindungen enthaltende Zusammensetzungen。
    • EP0251724A2
    • 1988-01-07
    • EP87305695.6
    • 1987-06-25
    • SUMITOMO CHEMICAL COMPANY, LIMITED
    • Takata, TakeshiYachigo, Shin-ichiKanooya, TatsuoOkamura, HarukiTakahashi, Yukoh
    • C08L9/00C08K5/13
    • C08K5/134C08L9/00
    • Bisphenol compounds of the formula:
      (in which R₁ is a C₁-C₃ alkyl group, a C₂-C₄ alkenyl group, a phenyl group or a 2-phenylethenyl group; R₂ is a C₁-C₅ alkyl group or a cyclohexyl group; R₃ is a C₁-C₉ alkyl group, a cyclohexyl group or a phenyl group; and R₄ is a C₁-C₁₁ alkyl group or a phenyl group) are prepared by reacting a carboxylic acid of the formula:
      (wherein R₁ is as defined above) with a bisphenol compound of the formula:
      (wherein R₂, R₃ and R₄ are as defined above) by the use of a halogenating agent in the presence of a dehydrohalogenating agent.
      Stabilized butadiene compositions contain as stabilizer certain compounds of formula (I), namely those in which R₁ is a group -CH=CH₂ or -C(CH₃)=CH₂; R₂ is -C(CH)₃; R₃ is a group -C(CH₃)₂-Rʹ (in which Rʹ is C₁-C₅ alkyl or phenyl): and R₄ is C₁-C₄ alkyl.
    • 下式的双酚化合物:其中R 1为C 1 -C 3烷基,C 2 -C 4烯基,苯基或2-苯基乙烯基; R 2为C 1 -C 5烷基或环己基 ; R 3为C 1 -C 9烷基,环己基或苯基; R 4为C 1 -C 11烷基或苯基)是通过使下式的羧酸:其中R 1为 如上定义)与下式的双酚化合物:其中R 2,R 3和R 4如上所定义,通过使用卤化剂在脱卤化氢剂的存在下进行。 稳定的丁二烯组合物含有某些式(I)化合物作为稳定剂,即其中R 1为基团-CH = CH 2或-C(CH 3)= CH 2的化合物; R2是-C(CH)3; R3是基团-C(CH3)2-R'(其中R'是C1-C5烷基或苯基):R4是C1-C4烷基。