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    • 1. 发明公开
    • Liquid phase epitaxial process
    • Flüssigphasen-Epitaxieverfahren。
    • EP0010920A1
    • 1980-05-14
    • EP79302313.6
    • 1979-10-24
    • SPERRY CORPORATION
    • Nelson, Gary LeeHarvey, William Albert
    • C30B19/10C30B29/28G02F1/00
    • C30B19/10C30B19/02C30B19/062C30B29/28
    • In a liquid phase epitaxial process for producing magnetic garnet crystals, primary melt residues adhering to a magnetic garnet crystal (4) are removed by immersing the crystal (2, 4) subsequent to growth in a rinse melt at or near the growth temperature of the primary melt. The rinse melt has a saturation to nucleation temperature range overlapping that of the primary melt and encompassing its growth temperature, has a solvent different from that of the primary melt and saturated or super-saturated with respect to the primary melt's solute, and has no undesirable adhesion properties of its own.
      The rinse melt enables residues of bismuth containing primary melts to be removed. Bismuth containing primary melts are used to improve the properties of garnet crystal structures (2, 4, 6, 8) used for magneto-optic light deflectors.
    • 在用于制备磁性石榴石晶体的液相外延方法中,通过在晶体(2,4)的生长温度或接近生长温度之后将晶体(2,4)浸渍在漂洗熔体中生长后,去除附着在磁性石榴石晶体(4)上的初级熔融残余物 初级熔融。 冲洗熔体具有与初级熔体重叠的成核温度范围的饱和度并且包含其生长温度,具有与初级熔体不同的溶剂并且相对于初级熔体的溶质为饱和或过饱和,并且没有不期望的 粘附性自身。 ...冲洗熔融物使含有熔融物的铋的残留物被去除。 含有初级熔体的铋用于改善用于磁光偏转器的石榴石晶体结构(2,4,6,8)的性质。