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1. 发明公开

EP3628478A1 STRETCHABLE FILM AND METHOD FOR FORMING STRETCHABLE FILM 有权
公开(公告)号：EP3628478A1
公开(公告)日：2020-04-01
申请号：EP19200162.6
申请日：2019-09-27
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Hatakeyama, Jun , Iwabuchi, Motoaki , Hasegawa, Koji , Nonaka, Shiori , Ikeda, Joe
IPC分类号： B29D7/01 , C08J5/18 , C08G18/38 , C08G18/61 , C08G18/50 , C08G18/48 , C08G18/42 , C08G18/73 , C08G18/75 , C08F283/00 , B32B27/40 , B32B27/32
摘要： A stretchable film includes, in a stacked form: a polyurethane film containing a repeating unit having a fluorine atom; and a polyurethane film containing a repeating unit having a silicon atom. At least one surface of the stretchable film is made of the polyurethane film containing a repeating unit having a fluorine atom. Thus, provided are: a stretchable film having excellent stretchability and strength, with the film surface having excellent water repellency; and a method for forming the stretchable film.

2. 发明公开

EP3587473A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE 有权
公开(公告)号：EP3587473A1
公开(公告)日：2020-01-01
申请号：EP19182333.5
申请日：2019-06-25
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Hatakeyama, Jun , Iwabuchi, Motoaki , Hasegawa, Koji , Kuroda, Yasuyoshi
IPC分类号： C08G77/398 , C08L83/08 , H01B1/20 , A61B5/0408 , A61N1/04
摘要： The present invention provides a bio-electrode composition including a silicone bonded to a sulfonamide salt, wherein the sulfonamide salt is shown by the following general formula (1):

wherein R 1 represents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms optionally having an aromatic group, an ether group, or an ester group, or an arylene group having 6 to 10 carbon atoms; Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms and containing at least one fluorine atom; M + is an ion selected from a lithium ion, a sodium ion, a potassium ion, and a silver ion. This can form a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, and free from large lowering of the electric conductivity even though it is wetted with water or dried.

3. 发明公开

EP3360472A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER 有权
公开(公告)号：EP3360472A1
公开(公告)日：2018-08-15
申请号：EP18156224.0
申请日：2018-02-12
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Hatakeyama, Jun , Iwabuchi, Motoaki , Watanabe, Osamu , Fujiwara, Takayuki , Kuroda, Yasuyoshi
IPC分类号： A61B5/0408 , A61B5/0448 , A61B5/0478 , A61B5/0492 , C08F220/58 , C08F230/08 , C08L33/26 , C08L43/04 , C08F220/60
摘要： The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit "a" of a lithium salt, a sodium salt, a potassium salt, or an ammonium salt of sulfonamide including a partial structure represented by the following general formula (1) and a repeating unit "b" having a silicon atom, -R 1 -C(=O)-N - -SO 2 -Rf 1 M + (1).

4. 发明公开

EP2990871A2 PROCESS FOR MANUFACTURING RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：制造抗蚀剂组合物和图案化工艺的方法
公开(公告)号：EP2990871A2
公开(公告)日：2016-03-02
申请号：EP15000794.6
申请日：2015-03-17
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Ogihara, Tsutomu , Iwabuchi, Motoaki
IPC分类号： G03F7/16
CPC分类号： H01L21/32139 , B01D61/14 , C08G77/04 , C09D183/04 , G03F7/0397 , G03F7/0752 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/16 , G03F7/2041 , G03F7/325 , H01L21/0271 , H01L21/31116 , H01L21/31138 , H01L21/31144
摘要： This is to provide a process for manufacturing a resist composition which can prepare a resist composition lowered in coating defects, and
the manufacturing process is a process for manufacturing a resist composition to be used in a process for manufacturing a semiconductor apparatus, the process comprising the steps of:
cleaning a manufacturing apparatus for a resist composition with a cleaning solution;
analyzing the cleaning solution taken out from the manufacturing apparatus;
repeating the step of cleaning and the step of analyzing until a concentration of metal components contained in the cleaning solution becomes 5 ppb or less; and
manufacturing the resist composition by using the manufacturing apparatus after the step of repeating.
摘要翻译：这是为了提供一种能够制备降低涂布缺陷的抗蚀剂组合物的抗蚀剂组合物的工艺，并且该制造工艺是用于制造半导体装置的工艺中使用的抗蚀剂组合物的工艺，该工艺包括步骤：用清洁溶液清洁抗蚀剂组合物的制造设备; 分析从制造装置取出的清洗液; 重复清洁步骤和分析步骤直至清洁溶液中所含金属成分的浓度变为5ppb或更少; 以及在重复步骤之后通过使用制造设备制造抗蚀剂组合物。

5. 发明公开

EP2843471A1 Method for producing a resist composition 有权
标题翻译：生产抗蚀剂组合物的方法
公开(公告)号：EP2843471A1
公开(公告)日：2015-03-04
申请号：EP14003007.3
申请日：2014-09-01
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Ogihara, Tsutomu , Biyajima, Yusuke , Iwabuchi, Motoaki
IPC分类号： G03F7/075 , G03F7/09 , G03F7/16
CPC分类号： G03F7/0757 , B01D61/14 , B01D61/145 , B01D61/147 , B01D61/18 , B01D61/22 , C08G77/04 , C08L83/04 , C09D183/06 , G03F7/0752 , G03F7/094 , G03F7/16
摘要： The present invention provides a method for producing a resist composition used in a process for producing a semiconductor apparatus, the method including the steps of:
cleaning an apparatus for producing the resist composition with a cleaning liquid;
applying the cleaning liquid on an evaluation substrate by spin-coating after removing the cleaning liquid from the apparatus for producing the resist composition;
repeating the step of cleaning and the step of applying until the change in the density of defects having a size of 100nm or more on the evaluation substrate between before and after the application of the cleaning liquid becomes 0.2/cm 2 or less; and
producing the resist composition by using the apparatus for producing the resist composition after the step of repeating.
There can be provided a method for producing a resist composition capable of producing a resist composition whose coating defects are reduced.
摘要翻译：本发明提供一种半导体装置的制造方法中使用的抗蚀剂组合物的制造方法，该制造方法包括以下工序：用清洗液对制造抗蚀剂组合物的装置进行清洗的工序; 从制造抗蚀剂组合物的装置中除去清洗液后，通过旋涂将清洗液涂布在评价基板上，重复清洁步骤和施加步骤，直到在施加清洁液之前和之后在评估基板上尺寸为100nm或更大的缺陷密度的变化变为0.2 / cm2或更小; 并且在重复步骤之后通过使用用于制造抗蚀剂组合物的设备来制造抗蚀剂组合物。可以提供一种制造抗蚀剂组合物的方法，所述抗蚀剂组合物能够制造涂层缺陷减少的抗蚀剂组合物。

6. 发明公开

EP0656363A1 Process for preparing a silane having a tertiary hydrocarbon group at the alpha position thereof 失效
标题翻译：一种制备含叔烃基在α位的硅烷处理。
公开(公告)号：EP0656363A1
公开(公告)日：1995-06-07
申请号：EP94119039.9
申请日：1994-12-02
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Shinohara, Toshio , Kudo, Muneo , Iwabuchi, Motoaki
IPC分类号： C07F7/12 , C07F7/08
CPC分类号： C07F7/122
摘要： The invention relates to a process for preparing a silane having a tertiary hydrocarbon group at the α position. The process comprises subjecting a Grignard reagent having a tertiary hydrocarbon group at the α position, e.g. a t-butylmagnesium halide or thexylmagnesium halide to reaction with chlorosilanes in the presence of a copper halide such as CuI, CuBr, CuCl or Li₂CuCl₃. By the process, the silanes having a tertiary hydrocarbon group at the α position can be obtained simply without use of any toxic substances as a catalyst.
摘要翻译：本发明涉及一种用于制备在α位具有叔烃基的硅烷的方法。该过程包括使格氏试剂在α位具有叔烃基，E.G. 叔丁基镁卤化物或卤化thexylmagnesium到反应用氯硅烷在卤化铜颜色的存在：例如CuI，溴化亚铜，氯化亚铜或Li2CuCl3。通过该方法，在具有α位具有叔烃基硅烷可以简单地获得，而不使用任何有毒物质作为催化剂。

7. 发明公开

EP0488759A1 Thexyl (C1-C4)alkyl dialkoxy silanes; methods of preparation; and uses thereof 失效
标题翻译：甲基 - （C 1 -C 4）烷基 - 二烷氧基硅烷，Verfahren zur Herstellung und deren Verwendung。
公开(公告)号：EP0488759A1
公开(公告)日：1992-06-03
申请号：EP91311071.4
申请日：1991-11-29
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Shinohara, Toshio , Iwabuchi, Motoaki , Kudo, Muneo
IPC分类号： C07F7/18 , C08F4/602
CPC分类号： C07F7/184
摘要： Thexyl (C₁-C₄) alkyl dialkoxy silanes are a class of novel organosilicon compounds, including thexyl methyl dimethoxy silane and thexyl n-butyl dimethoxy silane, and can be synthesized by several different routes. For example, thexyl methyl dimethoxy silane is prepared starting from methyl phenyl chlorosilane which is subjected to the hydrosilation reaction with 2,3-dimethyl-2-butene to introduce a thexyl group and the compound is converted by the reaction with hydrogen chloride into thexyl methyl dichlorosilane which is methoxylated by the reaction with methyl alcohol. Uses include water-repellant agents and additives for olefin polymerisation catalysts.
摘要翻译：甲基（C1-C4）烷基二烷氧基硅烷是一类新型有机硅化合物，包括甲基二甲氧基硅烷和甲基正丁基二甲氧基硅烷，可以通过几种不同的途径合成。例如，甲基二甲氧基硅烷由甲基苯基氯代硅烷制备，其与2,3-二甲基-2-丁烯进行硅氢化反应以引入羟基，并将该化合物与氯化氢反应转化为甲基通过与甲醇的反应甲氧基化的二氯硅烷。用途包括用于烯烃聚合催化剂的防水剂和添加剂。

8. 发明公开

EP3718471A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE 有权转让
公开(公告)号：EP3718471A1
公开(公告)日：2020-10-07
申请号：EP20166906.6
申请日：2020-03-30
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Hatakeyama, Jun , Iwabuchi, Motoaki
IPC分类号： A61B5/04 , A61B5/0408 , A61B5/024 , C09J9/02 , A61B5/053 , C08G75/00
摘要： A bio-electrode composition includes (A) an ionic material and (B) a lithium titanate powder. The component (A) is a polymer compound containing a repeating unit-a having a structure selected from an ammonium salt, a sodium salt, a potassium salt, and a silver salt of any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in the electric conductivity even when the bio-electrode is wetted with water or dried; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.

9. 发明公开

EP3360473A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING THE BIO-ELECTRODE 有权
公开(公告)号：EP3360473A1
公开(公告)日：2018-08-15
申请号：EP18156252.1
申请日：2018-02-12
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Hatakeyama, Jun , Fujiwara, Takayuki , Iwabuchi, Motoaki , Kuroda, Yasuyoshi
IPC分类号： A61B5/0408 , A61B5/0448 , A61B5/0478 , A61B5/0492 , C08F220/58 , C08L33/26
摘要： The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an ionic material and a resin, in which the ionic material is a lithium salt, a sodium salt, a potassium salt, a calcium salt, or an ammonium salt of sulphonamide represented by the following general formula (1).

[R 1 -C (=O)-N - -SO 2 -Rf 1 ] n M n+ (1)

10. 发明公开

EP3358572A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND 有权
公开(公告)号：EP3358572A1
公开(公告)日：2018-08-08
申请号：EP18155190.4
申请日：2018-02-05
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Hatakeyama, Jun , Watanabe, Osamu , Fujiwara, Takayuki , Iwabuchi, Motoaki , Kuroda, Yasuyoshi
IPC分类号： H01B1/12 , A61B5/0408
CPC分类号： C09J9/02 , A61B5/0245 , A61B5/0408 , A61L31/022 , A61L31/10 , A61L2420/02 , A61L2420/06 , C08F212/14 , C08F220/28 , C08F220/38 , C08F2220/282 , C08F2220/387 , C09J11/04 , C09J183/04 , H01B1/122 , H01B1/124
摘要： The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit "a" of a sodium salt, a potassium salt, or an ammonium salt including a partial structure represented by the following general formula (1) and a repeating unit "b" having a silicon atom.

-R 1 -SO 2 -N - -SO 2 -Rf 1 M + (1)

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