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1. 发明公开

EP0688816A1 Low-color polymer 失效
标题翻译： Weniggefärbtes聚合物
公开(公告)号：EP0688816A1
公开(公告)日：1995-12-27
申请号：EP95303942.7
申请日：1995-06-08
申请人： ROHM AND HAAS COMPANY
发明人： Winkle, Mark Robert
IPC分类号： C08K3/32 , C08K5/49 , C08K5/17
CPC分类号： C08K3/32 , C08K5/49 , C09D5/024
摘要： Low-color polymer solutions, dispersions, emulsions and films containing iron compounds are provided. A method for reducing or eliminating the discoloration of polymer solutions, dispersions, emulsions and films due to iron-containing compounds is accomplished by additives at a level of from 10 to 5,000 ppm based on the polymer. These low-color polymers are particularly useful in coating applications, such as latex paints.
摘要翻译：提供了含有铁化合物的低色聚合物溶液，分散体，乳液和薄膜。用于减少或消除由于含铁化合物引起的聚合物溶液，分散体，乳液和膜的变色的方法通过基于聚合物的10至5,000ppm的添加剂来实现。这些低色聚合物在涂料应用中是特别有用的，例如乳胶漆。

2. 发明公开

EP0425142A2 Positive acting photoresist and method of producing same 失效
标题翻译：阳光明媚的Photolack und Verfahren zu dessen Herstellung。
公开(公告)号：EP0425142A2
公开(公告)日：1991-05-02
申请号：EP90311172.2
申请日：1990-10-11
申请人： ROHM AND HAAS COMPANY
发明人： Winkle, Mark Robert
IPC分类号： G03F7/004
CPC分类号： G03F7/0045
摘要： A positive-acting photoresist composition which produces crosslinked images and processes for using the photoresist composition are disclosed. The photoresist composition is prepared from a mixture containing a film-forming, polymer-containing, acid-hardening resin system, an acid or acid-generating material for crosslinking the acid-hardening resin system, and a photobase generating compound. The photoresist composition is applied to a substrate surface and selectively imagewise exposed through a photomask to actinic radiation. The actinic radiation causes the photobase generator to produce a base in the imagewise exposed portions of the photoresist film. The photochemically generated base neutralises the acid in the imagewise exposed areas of the photoresist film. The non-imagewise exposed portions of the photoresist film, not containing the photochemically generated base, are crosslinked by the catalytic action of the acid upon heating the film, and the imagewise exposed portions of the photoresist film are removed from the substrate by the action of a developer solution leaving a crosslinked positive image on the substrate.
摘要翻译：公开了产生交联图像的正性光致抗蚀剂组合物和使用光致抗蚀剂组合物的方法。光致抗蚀剂组合物由含有成膜剂，含聚合物的酸固化树脂体系，用于交联酸硬化树脂体系的酸或酸产生材料和产生光致碱的化合物的混合物制备。将光致抗蚀剂组合物施加到基材表面，并通过光掩模选择性地成像曝光至光化辐射。光化辐射导致光致产生器在光致抗蚀剂膜的成像曝光部分中产生基底。光化学产生的碱中和光致抗蚀剂膜的成像曝光区域中的酸。光致抗蚀剂膜的非成像曝光部分，不含光化学产生的基底，通过在加热膜时酸的催化作用而交联，并且光致抗蚀剂膜的成像曝光部分通过显影剂溶液在基底上留下交联的正像。

3. 发明授权

EP0176356B1 Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates 失效
标题翻译：光敏聚合物组合物，使用相同的电泳沉积方法，以及在成膜中在基材上的使用
公开(公告)号：EP0176356B1
公开(公告)日：1988-11-02
申请号：EP85306800.5
申请日：1985-09-25
申请人： ROHM AND HAAS COMPANY
发明人： Emmons, William David , Winkle, Mark Robert
IPC分类号： G03C1/68 , G03F7/16
CPC分类号： G03F7/027 , G03F7/164 , Y10S430/138

4. 发明授权

EP1502934B1 Coating compositions 无效
公开(公告)号：EP1502934B1
公开(公告)日：2006-05-10
申请号：EP04254516.0
申请日：2004-07-28
申请人： ROHM AND HAAS COMPANY
发明人： Griffith, William Bryan, Jr. , Winkle, Mark Robert
IPC分类号： C09D7/00 , C08F2/22
CPC分类号： C08K5/49 , C09D7/63 , C08L33/12
摘要： Aqueous polymer compositions are provided that are suitable as coatings when dry. The coatings formed from such compositions have desirably low level of yellowness, both when new and upon aging. Also provided are methods of making such compositions.

5. 发明公开

EP1245587A1 Improved coating and coating composition 有权
标题翻译： ÜberzugundÜberzugszusammensetzung
公开(公告)号：EP1245587A1
公开(公告)日：2002-10-02
申请号：EP02252202.3
申请日：2002-03-27
申请人： ROHM AND HAAS COMPANY
发明人： Gore, Robert Howard , Langenmayr, Eric Jon , Lorah, Dennis Paul , Machleder, Warren Harvey , Neely, James Watson , Redlich, George Harvey , Schwartz, Curtis , Schindler, Frederick James , Beckley, Ronald Scott , Blankenship, Robert Mitchell , Brown, Albert Benner , Brown, James Tinney , Chiou, Shang-Jaw , El A'mma, Anton Georges , Fitzwater, Susan Jane , Slone, Robert Victor , Whitman, David William , Winkle, Mark Robert
IPC分类号： C08F2/16 , C09D157/00
CPC分类号： C08F2/16 , Y10S526/909 , Y10T428/254
摘要： Provided are improved coatings, polymeric dispersions, and polymeric composites, which include PNPs. Also provided are methods for forming improved coatings, polymeric dispersions, and polymeric composites, which include PNPs. The PNPs have polymerized units of at least one multi-ethylenically-unsaturated monomer have a mean diameter of from 1 to 50 nanometers. PNPs having polymerized units of at least one multi-ethylenically-unsaturated monomer and at least one surface-active monomer are also provided.
摘要翻译：提供改进的涂层，聚合物分散体和聚合复合材料，其包括PNP。还提供了形成改进的涂层，聚合物分散体和聚合物复合材料的方法，其包括PNP。 PNP具有至少一种多烯属不饱和单体的聚合单元，其平均直径为1至50纳米。还提供了具有至少一种多烯属不饱和单体和至少一种表面活性单体的聚合单元的PNP。

6. 发明公开

EP0425142A3 Positive acting photoresist and method of producing same 失效
标题翻译：积极作用光电子及其生产方法
公开(公告)号：EP0425142A3
公开(公告)日：1991-10-16
申请号：EP90311172.2
申请日：1990-10-11
申请人： ROHM AND HAAS COMPANY
发明人： Winkle, Mark Robert
IPC分类号： G03F7/004
CPC分类号： G03F7/0045
摘要： A positive-acting photoresist composition which produces crosslinked images and processes for using the photoresist composition are disclosed. The photoresist composition is prepared from a mixture containing a film-forming, polymer-containing, acid-hardening resin system, an acid or acid-generating material for crosslinking the acid-hardening resin system, and a photobase generating compound. The photoresist composition is applied to a substrate surface and selectively imagewise exposed through a photomask to actinic radiation. The actinic radiation causes the photobase generator to produce a base in the imagewise exposed portions of the photoresist film. The photochemically generated base neutralises the acid in the imagewise exposed areas of the photoresist film. The non-imagewise exposed portions of the photoresist film, not containing the photochemically generated base, are crosslinked by the catalytic action of the acid upon heating the film, and the imagewise exposed portions of the photoresist film are removed from the substrate by the action of a developer solution leaving a crosslinked positive image on the substrate.

8. 发明公开

EP1502934A1 Coating compositions 无效
标题翻译： Beschichtungszusammensetzungen
公开(公告)号：EP1502934A1
公开(公告)日：2005-02-02
申请号：EP04254516.0
申请日：2004-07-28
申请人： Rohm and Haas Company
发明人： Griffith, William Bryan, Jr. , Winkle, Mark Robert
IPC分类号： C09D7/00 , C08F2/22
CPC分类号： C08K5/49 , C09D7/63 , C08L33/12
摘要： Aqueous polymer compositions are provided that are suitable as coatings when dry. The coatings formed from such compositions have desirably low level of yellowness, both when new and upon aging. Also provided are methods of making such compositions.
摘要翻译：提供在干燥时适合作为涂层的水性聚合物组合物。由这种组合物形成的涂层具有期望的低的黄度，当新的和老化时。还提供了制备这种组合物的方法。

9. 发明授权

EP0476821B1 Reduction or elimination of film defects due to hydrogen evolution during cathodic electrodeposition 失效
标题翻译：减少或消除了阴极电沉积涂覆过程中所引起的氢输出的膜截断。
公开(公告)号：EP0476821B1
公开(公告)日：1995-05-03
申请号：EP91307198.1
申请日：1991-08-06
申请人： ROHM AND HAAS COMPANY
发明人： Winkle, Mark Robert
IPC分类号： C09D5/44
CPC分类号： C09D5/4492 , H05K3/0076 , H05K3/0079

10. 发明公开

EP0176356A3 Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates 失效
标题翻译：光敏聚合物组合物，使用相同的电泳沉积方法及其在成膜中的用途
公开(公告)号：EP0176356A3
公开(公告)日：1986-08-20
申请号：EP85306800
申请日：1985-09-25
申请人： ROHM AND HAAS COMPANY
发明人： Emmons, William David , Winkle, Mark Robert
IPC分类号： G03C01/68 , G03F07/16
CPC分类号： G03F7/027 , G03F7/164 , Y10S430/138
摘要： This invention is concerned with photosensitive polymer compositions useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications. The photosensitive polymer compositions comprise a crosslinkable photosensitive polymer composition, which comprises (a) photoinitiator, and (b) at least one polymer having one or more carrier groups per polymer molecule, and wherein the composition contains unsaturated groups so that it is capable, upon exposure to actinic radiation, of forming a film containing crosslinked polymer. The photosensitive polymer compositions, conveniently in the form of aqueous solutions or emulsions, are capable of being electrophoretically deposited as adherent, uniform, photosensitive films on conductive surfaces. Films formed from the photosensitive polymer compositions can be aqueous developable and resistant to strong inorganic acids and strong bases.

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